US5567658A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for minimizing peeling at the surface of spin-on glasses
Assignee: Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Filing: 1994-09-01
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Granted: 1996-10-22
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Expires: 2014-09-01
Abstract
Abstract A gas discharge through nitrous oxide or nitrogen is used to remove polymeric deposits that form on the surface of a layer of a spin-on glass that was etched in an atmosphere of carbon-fluorine compounds. Removal of the polymeric deposit greatly improves adhesion to the spin-on glass layer of subsequently deposited layers. The removal is accomplished without increasing any tendency of the spin-on glass layer to absorb moisture.
Inventors
- 👤 Chin-Kun Wang
- 👤 Cheng-Cheng Chang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 14:48
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/02; C23C16/0227; C23C16/0236; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P50/286; H10P50/287
Claims Analysis
Total Claims: 32
Claim 1
Independent Claim
52 words
A method for treating the surface of a layer of a spin-on glass comprising: subjecting said layer to an etchback treatment in a gaseous atmosphere containing compounds of carbon and fluorine; and exposing the surface of said etched back spin-on glass layer to an RF glow discharge between two electrodes in gas.
Claim 2
Independent Claim
52 words
A method for treating the surface of a layer of a spin-on glass comprising: subjecting said layer to an etchback treatment in a gaseous atmosphere containing compounds of carbon and fluorine; and exposing the surface of said etched back spin-on glass layer to an RF glow discharge between two electrodes in gas.
Claim 3
Dependent Claim
31 words
The method of claim 1 wherein the period of time during which the surface of said spin-on glass layer is exposed to said glow discharge is from 15 to 45 seconds.
Claim 4
Dependent Claim
19 words
The method of claim 1 wherein the pressure during said glow discharge treatment is from 4.5 to 5.1 torr.
Claim 5
Dependent Claim
16 words
The method of claim 1 wherein the RF power level is between 250 and 350 watts.
Claim 6
Dependent Claim
27 words
The method of claim 1 wherein the temperature at which said spin-on glass is maintained during said glow discharge treatment is between 380° C. and 420° C.
Claim 7
Dependent Claim
17 words
The method of claim 1 wherein the spacing between the electrodes is between 590 and 620 mils.
Claim 8
Dependent Claim
28 words
The method of claim 1 wherein the rate of flow of said N 2 O gas is controlled to be between 1,000 and 2,200 cubic centimeters per minute.
Claim 9
Independent Claim
55 words
A method for treating the surface of a layer of a spin-on glass comprising: subjecting said layer to an etchback treatment in a gaseous atmosphere containing compounds of carbon and fluorine: and exposing the surface of said etched back spin-on glass layer to an RF glow discharge between two electrodes in N 2 O gas.
Claim 10
Independent Claim
55 words
A method for treating the surface of a layer of a spin-on glass comprising: subjecting said layer to an etchback treatment in a gaseous atmosphere containing compounds of carbon and fluorine: and exposing the surface of said etched back spin-on glass layer to an RF glow discharge between two electrodes in N 2 O gas.
Claim 11
Dependent Claim
31 words
The method of claim 8 wherein the period of time during which the surface of said spin-on glass layer is exposed to said glow discharge is from 15 to 45 seconds.
Claim 12
Dependent Claim
19 words
The method of claim 8 wherein the pressure during said glow discharge treatment is from 4.5 to 5.1 torr.
Claim 13
Dependent Claim
16 words
The method of claim 8 wherein the RF power level is between 250 and 350 watts.
Claim 14
Dependent Claim
27 words
The method of claim 8 wherein the temperature at which said spin-on glass is maintained during said glow discharge treatment is between 380° C. and 420° C.
Claim 15
Dependent Claim
17 words
The method of claim 8 wherein the spacing between the electrodes is between 590 and 620 mils.
Claim 16
Dependent Claim
28 words
The method of claim 8 wherein the rate of flow of said N 2 O gas is controlled to be between 1,000 and 2,200 cubic centimeters per minute.
Claim 17
Independent Claim
78 words
A method for manufacturing an integrated circuit comprising: providing a silicon substrate with layers of conductive and insulating material, etched into patterns; planarizing said integrated circuit by means of a layer of a spin-on glass; etching back said layer of spin-on glass so as to just remove it from the surface of said conductive material and; exposing the surface of said etched-back spin-on glass layer to a glow discharge between two electrodes in nitrous oxide (N 2 O).
Claim 18
Independent Claim
78 words
A method for manufacturing an integrated circuit comprising: providing a silicon substrate with layers of conductive and insulating material, etched into patterns; planarizing said integrated circuit by means of a layer of a spin-on glass; etching back said layer of spin-on glass so as to just remove it from the surface of said conductive material and; exposing the surface of said etched-back spin-on glass layer to a glow discharge between two electrodes in nitrous oxide (N 2 O).
Claim 19
Dependent Claim
31 words
The method of claim 15 wherein the period of time during which the surface of said spin-on glass layer is exposed to said glow discharge is from 15 to 45 seconds.
Claim 20
Dependent Claim
19 words
The method of claim 15 wherein the pressure during said glow discharge treatment is from 4.5 to 5.1 torr.
Claim 21
Dependent Claim
16 words
The method of claim 15 wherein the RF power level is between 250 and 350 watts.
Claim 22
Dependent Claim
27 words
The method of claim 15 wherein the temperature at which said spin-on glass is maintained during said glow discharge treatment is between 380° C. and 420° C.
Claim 23
Dependent Claim
17 words
The method of claim 15 wherein the spacing between the electrodes is between 590 and 620 mils.
Claim 24
Dependent Claim
28 words
The method of claim 15 wherein the rate of flow of said N 2 O gas is controlled to be between 1,000 and 2,200 cubic centimeters per minute.
Claim 25
Independent Claim
77 words
A method for manufacturing an integrated circuit comprising: providing a silicon substrate with layers of conductive and insulating material, etched into patterns; planarizing said integrated circuit by means of a layer of a spin-on glass; etching back said layer of spin-on glass so as to just remove it from the surface of said conductive material and; exposing the surface of said etched-back spin-on glass layer to a glow discharge between two electrodes in N 2 O gas.
Claim 26
Independent Claim
77 words
A method for manufacturing an integrated circuit comprising: providing a silicon substrate with layers of conductive and insulating material, etched into patterns; planarizing said integrated circuit by means of a layer of a spin-on glass; etching back said layer of spin-on glass so as to just remove it from the surface of said conductive material and; exposing the surface of said etched-back spin-on glass layer to a glow discharge between two electrodes in N 2 O gas.
Claim 27
Dependent Claim
31 words
The method of claim 22 wherein the period of time during which the surface of said spin-on glass layer is exposed to said glow discharge is from 15 to 45 seconds.
Claim 28
Dependent Claim
19 words
The method of claim 22 wherein the pressure during said glow discharge treatment is from 4.5 to 5.1 torr.
Claim 29
Dependent Claim
16 words
The method of claim 22 wherein the RF power level is between 250 and 350 watts.
Claim 30
Dependent Claim
27 words
The method of claim 22 wherein the temperature at which said spin-on glass is maintained during said glow discharge treatment is between 380° C. and 420° C.
Claim 31
Dependent Claim
17 words
The method of claim 22 wherein the spacing between the electrodes is between 590 and 620 mils.
Claim 32
Dependent Claim
28 words
The method of claim 22 wherein the rate of flow of said N 2 O gas is controlled to be between 1,000 and 2,200 cubic centimeters per minute.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-10-22 | 2000-04-22 | 2000-10-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-10-22 | 2004-04-22 | 2004-10-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-10-22 | 2008-04-22 | 2008-10-22 | $7700.00 | Window Closed / Lapsed |