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US5496436A Expired / Lapsed US ⏱️ 0.0 years remaining

Comb drive micromechanical tuning fork gyro fabrication method

Assignee: Charles Stark Draper Laboratory Inc
•
Filing: 1994-06-15
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Granted: 1996-03-05
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Expires: 2014-06-15
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Abstract

Abstract A microfabricated, tuning fork rate sensitive structure and drive electronics in which vibrational forces are communicated through a set of meshing drive and driven finger electrodes associated with each of two vibrating elements. The vibrating elements are supported in a rotatable assembly between first and second support electrodes which are in turn suspended by flexures for rotation about an axis passing through the flexures and through a point midway between the vibrating elements. Additional masses are formed onto the vibrating elements to improve overall sensor sensitivity. Sense electrodes for detecting capacitive changes between the support electrodes and the sense electrodes are positioned at each end of the support electrodes. Drive electronics are connected between the driven fingers of the vibrating elements and the drive electrode fingers which mesh with them to cause vibration. Excitation is provided between the support electrodes and the sense electrodes. Any change in signal resulting from rotation of the assembly and the resulting variation in capacitance between the support electrodes and the sense electrodes is sensed as a measure of inertial rate. A torque loop may be additionally formed using the sense electrodes in order to re-torque the assembly to a neutral position in a torque-to-balance loop.

Inventors

  • 👤 Jonathan J. Bernstein
  • 👤 Marc S. Weinberg

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 15:54
CPC Classifications
G; G01; G01C; G01C19/00; G01C19/56; G01C19/5719; G01P; G01P15/00; G01P15/02; G01P15/08; G01P15/0802; G01R; G01R33/00; G01R33/02; G01R33/028; G01R33/0286; H; H03; H03H; H03H9/00; H03H9/02; H03H9/02244; H03H9/02259; G01P2015/0805; G01P2015/0808; G01P2015/0811; G01P2015/0814; H03H9/02338; H03H2009/02346; H03H2009/02354; H03H2009/02488; H03H2009/02496

Claims Analysis

Total Claims: 16
Claim 1
Independent Claim 160 words
A method for fabricating a comb drive tuning fork structure adapted for inertial rate sensitivity comprising the steps of: providing a silicon substrate; forming in a surface of said substrate a plurality of sense electrodes electrically isolated from each other and electrically contactable through a surface portion of said substrate; supporting, over the surface of said substrate having said plurality of sense electrodes, by flexures for rotation about an axis through said flexures, an assembly of first and second vibratable elements supported at opposite ends by first and second support electrodes such that said vibratable elements extend either side of said axis of rotation and have, extending away therefrom, first and second sets of driven electrodes on one side and first and second respective masses on the other side; forming on said substrate first and second drive electrodes which mesh with said first and second driven electrodes of said vibratable elements and electrical contacts for said first and second flexures.
Claim 2
Independent Claim 160 words
A method for fabricating a comb drive tuning fork structure adapted for inertial rate sensitivity comprising the steps of: providing a silicon substrate; forming in a surface of said substrate a plurality of sense electrodes electrically isolated from each other and electrically contactable through a surface portion of said substrate; supporting, over the surface of said substrate having said plurality of sense electrodes, by flexures for rotation about an axis through said flexures, an assembly of first and second vibratable elements supported at opposite ends by first and second support electrodes such that said vibratable elements extend either side of said axis of rotation and have, extending away therefrom, first and second sets of driven electrodes on one side and first and second respective masses on the other side; forming on said substrate first and second drive electrodes which mesh with said first and second driven electrodes of said vibratable elements and electrical contacts for said first and second flexures.
Claim 3
Dependent Claim 56 words
The method of claim 1 wherein said supporting step includes the step of: growing a semiconductor layer over said plurality of sense electrodes; forming said assembly in a surface of said grown layer; and freeing said assembly from said grown layer leaving attachment thereto through said first and second flexures to allow rotation of said assembly.
Claim 4
Dependent Claim 18 words
The process of claim 2 wherein said growing step includes the step of epitaxially growing a silicon layer.
Claim 5
Dependent Claim 36 words
The process of claim 2 wherein said substrate forming step includes the step of producing etch resistant doped regions corresponding to said substrate and said first and second flexures in the surface of said grown layer.
Claim 6
Dependent Claim 24 words
The method of claim 2 wherein said freeing step includes the step of etching said grown layer except for regions defining said formed assembly.
Claim 7
Dependent Claim 22 words
The process of claim 4 wherein said etch resistant portion is created by diffusing boron into the surface of said grown layer.
Claim 8
Dependent Claim 30 words
The process of claim 1 wherein said supporting step includes the step of forming a bridge structure over the surface of silicon containing said plural sense electrodes as said assembly.
Claim 9
Dependent Claim 41 words
The process of claim 7 wherein said bridge forming step includes the step of forming the bridge structure of etch resistant polysilicon or silicon and the drive electrode forming step includes forming the drive electrodes of etch resistant polysilicon or silicon.
Claim 10
Dependent Claim 38 words
The process of claim 7 wherein both said drive electrode said bridge structure forming steps includes the steps of forming said bridge structure and drive electrodes of a metal selected from the group consisting of nickel and gold.
Claim 11
Dependent Claim 170 words
A process for forming a comb driven tuning fork structure for use in rate sensor applications comprising the steps of: providing a silicon substrate having a planar surface; forming in said planar surface a plurality of sense electrodes through an insulating layer aperture; providing a second silicon substrate having a planar surface into which is diffused an etch resistant diffusant; bonding said first and second silicon substrates planar surface to planar surface; forming in said diffusion layer an assembly comprising flexures extending to regions of said insulating layer of said first substrate and having vibratable elements supported by electrode elements spaced parallel to each other about a rotation axis passing through said flexures with said vibratable elements having on one respective sides thereof a mass and on opposite respective sides thereof a plurality of driven electrodes in first and second sets forming separated fingers; forming in said diffusion layer and physically separated from said assembly a plurality of drive electrodes comprising fingers fitting between the fingers of said driven electrodes.
Claim 12
Dependent Claim 170 words
A process for forming a comb driven tuning fork structure for use in rate sensor applications comprising the steps of: providing a silicon substrate having a planar surface; forming in said planar surface a plurality of sense electrodes through an insulating layer aperture; providing a second silicon substrate having a planar surface into which is diffused an etch resistant diffusant; bonding said first and second silicon substrates planar surface to planar surface; forming in said diffusion layer an assembly comprising flexures extending to regions of said insulating layer of said first substrate and having vibratable elements supported by electrode elements spaced parallel to each other about a rotation axis passing through said flexures with said vibratable elements having on one respective sides thereof a mass and on opposite respective sides thereof a plurality of driven electrodes in first and second sets forming separated fingers; forming in said diffusion layer and physically separated from said assembly a plurality of drive electrodes comprising fingers fitting between the fingers of said driven electrodes.
Claim 13
Dependent Claim 87 words
The process of claim 1 wherein said supporting step includes the steps of: providing a second silicon substrate having a planar surface with a layer of etch resistant diffusion therein; forming a dielectric layer over said first mentioned silicon substrate surrounding said plurality of sensor electrodes; bonding said diffusion layer to said dielectric layer of said second and first substrates respectively; said assembly being formed in said diffusion layer in portions overlying said plurality of sense electrodes by selective etching of said second silicon substrate diffusion layer.
Claim 14
Dependent Claim 26 words
The process of claims 10 or 11 further including the step of eliminating substantially all of said second semiconductor substrate in the region of said assembly.
Claim 15
Dependent Claim 18 words
The process of claim 12 further comprising the step of providing a metallized electrical contact to said assembly.
Claim 16
Dependent Claim 61 words
The process of claims 1 or 10 further including the step of forming at least one of said driven and drive electrode fingers by the steps of: forming electrically conducting regions in said assembly in the regions for said drive and driven electrodes; and dimensioning edges of said conductive regions by reactive ion etching to separate said drive and driven electrodes.

References Cited (Backward Citations)

US3053095A Cited
US3251231A Cited
US3370458A Cited
US3696429A Cited
US3913035A Cited
US4044305A Cited
US4468584A Cited
US4155257A Cited
US4122448A Cited
US4144764A Cited
US4234666A Cited
US4321500A Cited
US4336718A Cited
US4342227A Cited
US4499778A Cited
US4381672A Cited
US4447753A Cited
US4502042A Cited
US4406992A Cited
US4484382A Cited
US4483194A Cited
US4495499A Cited
US4414852A Cited
US4654663A Cited
US4411741A Cited
US4665605A Cited
US4592242A Cited
US4478076A Cited
US4478077A Cited
US4651564A Cited
US4621925A Cited
US4596158A Cited
US4522072A Cited
US4490772A Cited
US4619001A Cited
US4590801A Cited
US4585083A Cited
US4628283A Cited
US4783237A Cited
US4600934A Cited
US4653326A Cited
US4524619A Cited
US4538461A Cited
USRE33479E Cited
US4899587A Cited
USRE32931E Cited
US4598585A Cited
US4699006A Cited
US4671112A Cited
US4629957A Cited
US4674180A Cited
US4680606A Cited
US4674331A Cited
US4644793A Cited
US4706374A Cited
US4674319A Cited
US4705659A Cited
US4735506A Cited
US4764244A Cited
US4639690A Cited
US4744249A Cited
US4744248A Cited
US4679434A Cited
US4750364A Cited
US4792676A Cited
GB2183040B Cited
US4761743A Cited
US4736629A Cited
US4747312A Cited
US4712439A Cited
US4670092A Cited
US4869107A Cited
US4776924A Cited
US4743789A Cited
US4727752A Cited
US4884446A Cited
US4834538A Cited
US4805456A Cited
US4851080A Cited
US4898032A Cited
US4789803A Cited
US4916520A Cited
US4808948A Cited
US5216490A Cited
US5195371A Cited
US5060039A Cited
US5016072A Cited
US4890812A Cited
US4900971A Cited
US4929860A Cited
US4882933A Cited
US4922756A Cited
US4855544A Cited
US5001383A Cited
US4893509A Cited
US5025346A Cited
US4901586A Cited
US5045152A Cited
US5038613A Cited
US4981359A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-03-05 1999-09-04 2000-03-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-03-05 2003-09-04 2004-03-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-03-05 2007-09-04 2008-03-05 $7700.00 Window Closed / Lapsed

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