Integrated circuit chip supported by a handle wafer and provided with means to maintain the handle wafer potential at a desired level

Claim 2

An integrated-circuit (IC) chip of the type including a first semiconductive section with a number of device regions laterally disposed throughout the section; a layer of insulating material underlying said first semiconductive section; a second semiconductive section underlying said insulating layer and serving as a handle wafer to support said insulating layer and said device regions; said first semiconductive section being formed with a plurality of first trenches between at least certain of said device regions and extending from the chip surface down through said first semiconductive section to said layer of insulating material; said first trenches being filled with electrical insulating material which at the bottom of the trench is contiguous to and in contact with said insulating layer thereby to form electrical insulating material surrounding at least one of said device regions; an additional trench formed in said chip and arranged to extend down through said first semiconductive section and also through said underlying layer of insulation so that its lower extremity penetrates to the region of said second semiconductive region at a depth beneath the lowest regions of said first trenches; electrically conductive material filling said additional trench and at its lower extremity being engaged with and establishing electrical connection to the material of said second semiconductive section serving as said handle wafer; metallization means above said additional trench and in contact therewith to establish electrical connection thereto; and means electrically connected to said metallization means to apply a controlling potential through said additional trench to fix the potential of said handle wafer to avoid improper operation of said device regions of the IC chip and to prevent accumulation of damaging electrostatic charges in the handle wafer.

Claim 3

An IC chip as claimed in claim 1, including dopant in a region of said second semiconductor section which lies beneath the lower end of said additional trench, thereby to enhance the conductivity of the electrical connection of said conductive filling in said additional trench between said metallization means and said second semiconductive section.

Claim 4

An integrated-circuit (IC) chip of the type including a first semiconductive section with a number of device regions laterally disposed throughout the section; a layer of insulating material underlying said first semiconductive section; a second semiconductive section underlying said insulating layer and serving as a handle wafer to support said insulating layer and said device regions; said first semiconductive section being formed with a plurality of first trenches between at least certain of said device regions and extending from the chip surface down through said first semiconductive section to said layer of insulating material; said first trenches being filled with electrical insulating material which at the bottom of the trench is contiguous to and in contact with said insulating layer thereby to form electrical insulating material surrounding at least one of said device regions; an additional trench formed in said chip and arranged to extend down through said first semiconductive section and also through said underlying layer of insulation so that its lower extremity penetrates to the region of said second semiconductive region; electrically conductive material filling said additional trench and at its lower extremity being engaged with and establishing electrical connection to the material of said second semiconductive section serving as said handle wafer; said electrically conductive material being engaged on the side surfaces of said additional trench with the device regions adjacent said side surfaces and having electrical continuity therewith so that said adjacent device regions enhance the conductivity of the path through said additional trench to said handle wafer; metallization means above said additional trench and in contact therewith to establish electrical connection thereto; and means electrically connected to said metallization means to apply a controlling potential through said additional trench to fix the potential of said handle wafer to avoid improper operation of said device regions of the IC chip and to prevent accumulation of damaging electrostatic charges in the handle wafer.

Claim 5

An integrated-circuit (IC) chip of the type including a first semiconductive section with a number of device regions laterally disposed throughout the section; a layer of insulating material underlying said first semiconductive section; a second semiconductive section underlying said insulating layer and serving as a handle wafer to support said insulating layer and said device regions; said first semiconductive section being formed with a plurality of first trenches between at least certain of said device regions and extending from the chip surface down through said first semiconductive section to said layer of insulating material; said first trenches being filled with electrical insulating material which at the bottom of the trench is contiguous to and in contact with said insulating layer thereby to form electrical insulating material surrounding at least one of said device regions; an additional trench formed in said chip and arranged to extend down through said first semiconductive section and also through said underlying layer of insulation so that its lower extremity penetrates to the region of said second semiconductive region; electrically conductive material filling said additional trench and at its lower extremity being engaged with and establishing electrical connection to the material of said second semiconductive section serving as said handle wafer; said electrically conductive material being engaged on the side surfaces of said additional trench with the device regions adjacent said side surfaces and having electrical continuity therewith so that said adjacent device regions enhance the conductivity of the path through said additional trench to said handle wafer; metallization means above said additional trench and in contact therewith to establish electrical connection thereto; and means electrically connected to said metallization means to apply a controlling potential through said additional trench to fix the potential of said handle wafer to avoid improper operation of said device regions of the IC chip and to prevent accumulation of damaging electrostatic charges in the handle wafer.

Claim 6

An IC chip as claimed in claim 3, wherein said metallization means extends out laterally over the horizontal side surfaces of said adjacent device regions; and contact implant diffusions formed in the portions of said adjacent device regions which are beneath said metallization means.