US5458735A
Expired / Lapsed
US
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Process for the production of electroluminescent silicon structures
Assignee: Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung eV
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Filing: 1992-07-20
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Granted: 1995-10-17
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Expires: 2012-07-20
Abstract
Abstract A process for the production of electroluminescent silicon structures, including: placing a silicon wafer in an acid bath; anodizing the silicon wafer in the acid bath using the apparatus of FIG. 2; illuminating the anode side of the silicon wafer during at least part of the time the silicon wafer is being placed in the acid bath and is being anodized; causing at least some areas of the monocrystalline silicon of the silicon wafer to be converted into a microporous silicon layer; and forming two contacts by means of which a voltage can be applied to the microporous silicon layer.
Inventors
- 👤 Axel Richter
- 👤 Peter Steiner
- 👤 Walter Lang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 15:45
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/83; H10H20/832; H10H20/833; C; C25; C25D; C25D11/00; C25D11/02; C25D11/32; H10H20/01; H10H20/011; H10H20/014; H10H20/81; H10H20/822; H10H20/826; H10H20/8264; H10P; H10P50/00; Y; Y10; Y10S; Y10S438/00; Y10S438/96
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
104 words
A process for the production of electroluminescent silicon structures, comprising the following process steps: placing a monocrystalline silicon wafer in an acid bath; anodizing the silicon wafer in said acid bath; illuminating the anode side of said silicon wafer during at least part of the time the silicon wafer is being placed in the acid bath and is being anodized, thus causing at least some areas of the monocrystalline silicon of the silicon wafer to be converted into a microporous silicon layer; and forming a first and a second contact by means of which a voltage can be applied to the microporous silicon layer.
Claim 2
Dependent Claim
104 words
A process for the production of electroluminescent silicon structures, comprising the following process steps: placing a monocrystalline silicon wafer in an acid bath; anodizing the silicon wafer in said acid bath; illuminating the anode side of said silicon wafer during at least part of the time the silicon wafer is being placed in the acid bath and is being anodized, thus causing at least some areas of the monocrystalline silicon of the silicon wafer to be converted into a microporous silicon layer; and forming a first and a second contact by means of which a voltage can be applied to the microporous silicon layer.
Claim 3
Dependent Claim
24 words
A process according to claim 1, wherein the anodizing is carried out with a current density of from 2 to 500 mA/cm 2 .
Claim 4
Dependent Claim
29 words
A process according to claim 1, wherein the acid bath comprises 2 to 50 percent by weight of hydrofluoric acid and that the residual thereof is ethanol and water.
Claim 5
Dependent Claim
13 words
A process according to claim 1, wherein the silicon wafer is n doped.
Claim 6
Dependent Claim
27 words
A process according to claim 4, wherein the doping of the silicon wafer is chosen such that the resistivity thereof is between 1 and 10 Ohm cm.
Claim 7
Dependent Claim
24 words
A process according to claim 1, wherein the illumination is effected by means of a mercury lamp or a halogen lamp or a laser.
Claim 8
Dependent Claim
118 words
A process according to claim 1, comprising the following initial process steps carried out before the silicon wafer is placed in the acid bath: producing a silicon oxide layer which serves as an implantation mask; structuring the silicon oxide layer; implanting dopants with the same conductivity type as the silicon wafer; driving in the dopants in a drive-in diffusion process; depositing a nitride layer in a full-area deposition mode; applying a chromium-gold metallic coating; structuring the chromium-gold metallic coating; depositing an additional nitride layer; applying and structuring a photoresist; etching away the nitride layer in a subsequently active area of the silicon wafer as well as in an area of the chromium-gold metallic coating; and removing the photoresist.
Claim 9
Dependent Claim
42 words
A process according to claim 1, further comprising an additional process step of additionally implanting dopants having a conductivity type opposite to the conductivity type of the silicon wafer so as to create a p-n junction in the subsequently porous silicon layer.
Claim 10
Dependent Claim
33 words
A process according to claim 1, wherein the process step of forming the second contact includes the forming of an ohmic contact at the side of the silicon wafer opposite the anode side.
Claim 11
Dependent Claim
22 words
A process according to claim 1, wherein the process step of forming the first contact includes the application of a gold contact.
Claim 12
Dependent Claim
17 words
A process according to claim 10, wherein the gold contact has a thickness of approximately 120 nm.
Claim 13
Dependent Claim
24 words
A process according to claim 1, wherein the process step of forming the first contact includes the application of an indium tin oxide layer.
Claim 14
Dependent Claim
19 words
A process according to claim 12, wherein the indium tin oxide layer has a thickness of approximately 200 nm.
Claim 15
Dependent Claim
52 words
A process according to claim 1, wherein the process step of forming the contacts comprises the following steps: applying an at least partially light-transmitting first contact to the microporous silicon layer; and forming a second contact for establishing a contact with an area of the silicon wafer below the microporous silicon layer.
Claim 16
Dependent Claim
22 words
A process according to claim 1, wherein the anodization region of the silicon wafer is delimited laterally by an acid-resistant masking layer.
Claim 17
Dependent Claim
13 words
A process according to claim 15, wherein the acid-resistant masking layer is light-proof.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-10-16 | 1999-04-17 | 1999-10-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-10-16 | 2003-04-17 | 2003-10-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-10-16 | 2007-04-17 | 2007-10-17 | $7700.00 | Window Closed / Lapsed |