US5439780A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Energy sensitive materials and methods for their use
Assignee: AT&T Inc
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Filing: 1992-04-29
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Granted: 1995-08-08
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Expires: 2012-04-29
Abstract
Abstract A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phase and show excellent promise for use such as resists in the fabrication of electronic and optical devices.
Inventors
- 👤 Ajey M. Joshi
- 👤 Timothy W. Weidman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 09:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/36; G03F7/004; G03F7/075; G03F7/0754; G03F7/16; G03F7/167
Claims Analysis
Total Claims: 28
Claim 1
Independent Claim
65 words
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material comprises a silicon polymer represented by the base unit: R.sub.x SiH.sub.y where 0.2<x<1.5, 0.2<y<1.5 and R is an organic substituent resulting in said material being insoluble.
Claim 2
Dependent Claim
65 words
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material comprises a silicon polymer represented by the base unit: R.sub.x SiH.sub.y where 0.2<x<1.5, 0.2<y<1.5 and R is an organic substituent resulting in said material being insoluble.
Claim 3
Dependent Claim
15 words
The process of claim 1 wherein said exposure is performed in the presence of oxygen.
Claim 4
Dependent Claim
15 words
The process of claim 2 wherein said exposure comprises a blanket exposure of said material.
Claim 5
Dependent Claim
12 words
The process of claim 1 wherein said radiation comprises an electron beam.
Claim 6
Dependent Claim
14 words
The process of claim 1 wherein said radiation comprises ultraviolet or deep ultraviolet radiation.
Claim 7
Dependent Claim
16 words
The process of claim 1 wherein said organic substituent comprises an alkyl or an aryl substituent.
Claim 8
Dependent Claim
17 words
The process of claim 1 including the step of transferring said pattern to said substrate by etching.
Claim 9
Dependent Claim
13 words
The process of claim 7 wherein said etching comprises a plasma based etching.
Claim 10
Dependent Claim
18 words
The process of claim 8 wherein said plasma is employed both for said developing and for said etching.
Claim 11
Dependent Claim
21 words
The process of claim 1 wherein said forming and said developing is performed without subjecting said substrate to the ambient environment.
Claim 12
Dependent Claim
72 words
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material is formed by discharge in a precursor gas such that said material comprises a compound represented by the base unit R x SiH y where 0.2x<1.5, 0.2<y<1.5 and R is an organic substituent.
Claim 13
Dependent Claim
72 words
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material is formed by discharge in a precursor gas such that said material comprises a compound represented by the base unit R x SiH y where 0.2x<1.5, 0.2<y<1.5 and R is an organic substituent.
Claim 14
Dependent Claim
15 words
The process of claim 11 wherein said exposure is performed in the presence of oxygen.
Claim 15
Dependent Claim
15 words
The process of claim 12 wherein said exposure comprises a blanket exposure of said material.
Claim 16
Dependent Claim
14 words
The process of claim 11 wherein said radiation comprises ultraviolet or deep ultraviolet light.
Claim 17
Dependent Claim
16 words
The process of claim 11 wherein said organic substituent comprises an alkyl or an aryl substituent.
Claim 18
Dependent Claim
17 words
The process of claim 11 including the step of transferring said pattern to said substrate by etching.
Claim 19
Dependent Claim
13 words
The process of claim 16 wherein said etching comprises a plasma based etching.
Claim 20
Dependent Claim
18 words
The process of claim 8 wherein said plasma is employed both for said developing and for said etching.
Claim 21
Dependent Claim
61 words
A process for fabricating an article comprising the step of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material is formed by discharge in a precursor comprising a compound represented by the formula RSiH 3 wherein R is an organic substituent.
Claim 22
Dependent Claim
61 words
A process for fabricating an article comprising the step of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material is formed by discharge in a precursor comprising a compound represented by the formula RSiH 3 wherein R is an organic substituent.
Claim 23
Dependent Claim
15 words
The process of claim 19 wherein said organic substituent comprises an alkyl or aryl substituent.
Claim 24
Dependent Claim
21 words
The process of claim 19 wherein said forming and said developing is performed without subjecting said substrate to the ambient environment.
Claim 25
Dependent Claim
57 words
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern, developing said pattern and transferring said pattern to said substrate characterized in that said development and said transferring is performed without exposing said substrate to the ambient.
Claim 26
Dependent Claim
57 words
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern, developing said pattern and transferring said pattern to said substrate characterized in that said development and said transferring is performed without exposing said substrate to the ambient.
Claim 27
Dependent Claim
21 words
The process of claim 1 wherein said body comprises a device and wherein said layer forms a region of said device.
Claim 28
Dependent Claim
21 words
The process of claim 11 wherein said body comprises a device and wherein said layer forms a region of said device.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-08-07 | 1999-02-06 | 1999-08-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-08-07 | 2003-02-06 | 2003-08-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-08-07 | 2007-02-06 | 2007-08-08 | $7700.00 | Window Closed / Lapsed |