US4283482A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry Lithographic Process
Assignee: Ulvac Inc
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Filing: 1980-03-25
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Granted: 1981-08-11
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Expires: 2000-03-25
Abstract
Abstract A plasma-polymerized film formed on the surface of a substrate is found to be suitable for subsequent use in electron-beam lithography and the film exposed to a beam of electrons is then developed to provide it with the predetermined pattern. These steps of plasma polymerization, electron-beam exposure and development can be consecutively carried out in vapor phase within a unified vacuum apparatus.
Inventors
- 👤 Shuzo Hattori
- 👤 Shinzo Morita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:19
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/16; G03F7/167
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
112 words
A dry lithographic process comprising the consecutive steps of: (i) introducing at least one ethylenically unsaturated monomer compound in the vapor form into a vacuum vessel where said monomer compound is, at least in part, excited in a plasma atmosphere and deposited onto the surface of a substrate located in the vacuum vessel to form a plasma-polymerized film on said substrate, (ii) exposing the film thus formed on the substrate to a controlled beam of electrons in conformity to the predetermined pattern to degrade the polymer in the exposed part of the film, and (iii) removing the degraded part of the polymer from the film by development in vapor phase etching atmosphere.
Claim 2
Dependent Claim
112 words
A dry lithographic process comprising the consecutive steps of: (i) introducing at least one ethylenically unsaturated monomer compound in the vapor form into a vacuum vessel where said monomer compound is, at least in part, excited in a plasma atmosphere and deposited onto the surface of a substrate located in the vacuum vessel to form a plasma-polymerized film on said substrate, (ii) exposing the film thus formed on the substrate to a controlled beam of electrons in conformity to the predetermined pattern to degrade the polymer in the exposed part of the film, and (iii) removing the degraded part of the polymer from the film by development in vapor phase etching atmosphere.
Claim 3
Dependent Claim
17 words
A process according to claim 1 in which the monomer compound is ethylene or especially methyl methacrylate.
Claim 4
Dependent Claim
22 words
A process according to claim 1 in which the monomer compound is introduced into the afterglow region of a flowing inert gas.
Claim 5
Dependent Claim
32 words
A process according to claim 1 in which the beam of electrons is applied to the plasma-polymerized film in conformity to the predetermined pattern which has been memorized by an electronic computer.
Claim 6
Dependent Claim
20 words
A process according to claim 1 in which the development is effected in the discharge condition with gaseous carbon tetrachloride.
Claim 7
Dependent Claim
62 words
A process according to claim 1 which is carried out in an apparatus of the type comprising a single vacuum vessel which is divided by partition walls into three compartments adapted to be individually evacuated and in which there is provided a movable substrate-supporting member which carries the substrate successively from the first compartment to the second and then the third compartments.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1984-08-10 | 1985-02-09 | 1985-08-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1988-08-10 | 1989-02-09 | 1989-08-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1992-08-10 | 1993-02-09 | 1993-08-11 | $7700.00 | Window Closed / Lapsed |