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Apparatus for plasma deposition

Assignee: California Institute of Technology
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Filing: 1993-01-13
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Granted: 1995-07-25
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Expires: 2013-01-13
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Abstract

Abstract The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.

Inventors

  • 👤 Gordon L. Cann
  • 👤 Cecil B. Shepard, Jr.
  • 👤 Frank X. McKevitt

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 18:51
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/27; C23C16/44; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4584; C23C16/50; C23C16/513

Claims Analysis

Total Claims: 21
Claim 1
Independent Claim 69 words
Apparatus for depositing a substance, comprising: means for producing a plasma beam containing the constituents of said substance; and a target substrate on which said substance is to be deposited, said substrate having a surface in the path of said beam, said substrate having at least one aperture through said surface, such that a portion of said beam passes through said target substrate at said at least one aperture.
Claim 2
Dependent Claim 69 words
Apparatus for depositing a substance, comprising: means for producing a plasma beam containing the constituents of said substance; and a target substrate on which said substance is to be deposited, said substrate having a surface in the path of said beam, said substrate having at least one aperture through said surface, such that a portion of said beam passes through said target substrate at said at least one aperture.
Claim 3
Dependent Claim 17 words
Apparatus as defined by claim 1, wherein said at least one aperture comprises a plurality of apertures.
Claim 4
Dependent Claim 15 words
Apparatus as defined by claim 2, further comprising at least one groove in said substrate.
Claim 5
Dependent Claim 19 words
Apparatus as defined by claim 3, wherein said at least one groove has a minimum depth of 2 mm.
Claim 6
Dependent Claim 24 words
Apparatus as defined by claim 4, wherein said at least one groove comprises a pattern of several grooves having minimum depths of 2 mm.
Claim 7
Dependent Claim 17 words
Apparatus as defined by claim 3, wherein at least some of said grooves terminate at said apertures.
Claim 8
Dependent Claim 15 words
Apparatus as defined by claim 1, wherein said at least one aperture comprises several apertures.
Claim 9
Dependent Claim 87 words
Apparatus for depositing a substance, comprising: means for producing a plasma beam containing the constituents of said substance, said beam having an axis and an envelope; and a plurality of target substrates on which said substance is to be deposited, said substrates having surfaces generally along the envelope of the beam such that constituents in the peripheral region of said beam are applied to said surfaces, said substrates being spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.
Claim 10
Dependent Claim 87 words
Apparatus for depositing a substance, comprising: means for producing a plasma beam containing the constituents of said substance, said beam having an axis and an envelope; and a plurality of target substrates on which said substance is to be deposited, said substrates having surfaces generally along the envelope of the beam such that constituents in the peripheral region of said beam are applied to said surfaces, said substrates being spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.
Claim 11
Dependent Claim 30 words
Apparatus as defined by claim 8, wherein said beam has a generally cylindrical elongated shape, and wherein said substrate surfaces are generally parallel to the longitudinal axis of said beam.
Claim 12
Dependent Claim 70 words
Apparatus for depositing synthetic diamond, comprising: means for producing a plasma beam containing a carbonaceous gas and hydrogen gas; and a target substrate on which synthetic diamond is to be deposited, said substrate having a surface in the path of said beam, said substrate having at least one aperture through said surface, such that a portion of said beam passes through said target substrate at said at least one aperture.
Claim 13
Dependent Claim 70 words
Apparatus for depositing synthetic diamond, comprising: means for producing a plasma beam containing a carbonaceous gas and hydrogen gas; and a target substrate on which synthetic diamond is to be deposited, said substrate having a surface in the path of said beam, said substrate having at least one aperture through said surface, such that a portion of said beam passes through said target substrate at said at least one aperture.
Claim 14
Dependent Claim 17 words
Apparatus as defined by claim 10, wherein said at least one aperture comprises a plurality of apertures.
Claim 15
Dependent Claim 15 words
Apparatus as defined by claim 11, further comprising at least one groove in said substrate.
Claim 16
Dependent Claim 19 words
Apparatus as defined by claim 12, wherein said at least one groove has a minimum depth of 2 mm.
Claim 17
Dependent Claim 24 words
Apparatus as defined by claim 13, wherein said at least one groove comprises a pattern of several grooves having minimum depths of 2 mm.
Claim 18
Dependent Claim 17 words
Apparatus as defined by claim 14, wherein at least some of said grooves terminate at said apertures.
Claim 19
Dependent Claim 88 words
Apparatus for depositing synthetic diamond, comprising: means for producing a plasma beam containing a carbonaceous gas and hydrogen gas, said beam having an axis and an envelope; and a plurality of target substrates on which said beam is to be deposited, said substrates having surfaces generally along the envelope of the beam such that constituents in the peripheral region of said beam are applied to said surfaces, said substrates being spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.
Claim 20
Dependent Claim 88 words
Apparatus for depositing synthetic diamond, comprising: means for producing a plasma beam containing a carbonaceous gas and hydrogen gas, said beam having an axis and an envelope; and a plurality of target substrates on which said beam is to be deposited, said substrates having surfaces generally along the envelope of the beam such that constituents in the peripheral region of said beam are applied to said surfaces, said substrates being spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.
Claim 21
Dependent Claim 30 words
Apparatus as defined by claim 16, wherein said beam has a generally cylindrical elongated shape, and wherein said substrate surfaces are generally parallel to the longitudinal axis of said beam.

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Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-07-24 1999-01-23 1999-07-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-07-24 2003-01-23 2003-07-25 $3760.00 Window Closed / Lapsed
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