System for vapor deposition of thin films

Claim 1

Apparatus for the vapor deposition of a layer of material on substrate bodies comprising: a generally vertically oriented support table adapted for rotation about a horizontal axis; means for rotating said support table; a plurality of elongated horizontally oriented mandrels rotatably supported in an annular array on said support table; means for rotating each of said mandrels about a longitudinal axis thereof; each of said mandrels adapted for receiving, supporting, and rotating therewith a plurality of substrate bodies; means for vaporizing a predetermined quantity of material which is to be deposited upon said substrate bodies; heating means including an electrode mounted and adjustably positioned adjacent the annular path of travel of said mandrels and extending substantially coextensively with the elongated mandrels, means for applying an electric potential between said electrode and said subStrate support bodies for establishing a glow discharge between said electrode and said substrate support bodies for forming an interface barrier layer on said support bodies; and means providing an evacuated enclosure for said heating means, mandrels, and the substrate bodies supported thereon.