Patent US2607097A successfully refreshed from Google Patents.
US5367358A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection exposing apparatus and projection exposing method
Assignee: Renesas Electronics Corp
•
Filing: 1993-10-08
•
Granted: 1994-11-22
•
Expires: 2013-10-08
Abstract
Abstract A projection exposing apparatus has a second photo-mask disposed on a blind for determining a region to be exposed to deformed light beams, the circuit pattern of the second photo-mask being the same as or arranged to correspond to the circuit pattern of a first photo-mask to be projected onto a substrate The deformed irradiation light beams are applied to the second photo-mask circuit pattern to image diffracted light beams on the substrate and project the circuit pattern.
Inventors
- 👤 Kazuya Kamon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70216; G03F7/70241; G03F7/70283
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
158 words
A projection exposing apparatus comprising: a light source for producing light beams as a first light surface; a first aperture for shaping light beams supplied from said light source to form a second light source surface for producing deformed irradiation; a blind having an aperture for determining an exposure region of the light beams supplied from said second light source surface; a second aperture for shaping the light beams supplied from said second light source surface to form a third light source surface; a first photo-mask having a circuit pattern for irradiation with the light beams supplied from said third light source surface; a projection optical system for imaging onto a substrate to be exposed to light diffracted light beams passed through said first photo-mask to project the circuit pattern of said first photo-mask; and a second photo-mask having a pattern corresponding to the circuit pattern of said first photo-mask and disposed in the aperture of said blind.
Claim 2
Dependent Claim
158 words
A projection exposing apparatus comprising: a light source for producing light beams as a first light surface; a first aperture for shaping light beams supplied from said light source to form a second light source surface for producing deformed irradiation; a blind having an aperture for determining an exposure region of the light beams supplied from said second light source surface; a second aperture for shaping the light beams supplied from said second light source surface to form a third light source surface; a first photo-mask having a circuit pattern for irradiation with the light beams supplied from said third light source surface; a projection optical system for imaging onto a substrate to be exposed to light diffracted light beams passed through said first photo-mask to project the circuit pattern of said first photo-mask; and a second photo-mask having a pattern corresponding to the circuit pattern of said first photo-mask and disposed in the aperture of said blind.
Claim 3
Dependent Claim
29 words
The projection exposing apparatus as claimed in claim 1 wherein said second photo-mask has a circuit pattern which is the same as said circuit pattern of said first photo-mask.
Claim 4
Dependent Claim
52 words
The projection exposing apparatus as claimed in claim 1 wherein said second photo-mask has a circuit pattern, the circuit pattern of said second photo-mask having elements disposed at the same positions as corresponding elements of the circuit pattern of said first photo-mask and the dimension of each of the patterns being different.
Claim 5
Dependent Claim
23 words
The projection exposing apparatus as claimed in claim 1 wherein said first photo-mask and said second photo-mask respectively are Levenson phase shift masks.
Claim 6
Dependent Claim
22 words
The projection exposing apparatus as claimed claim 1 wherein said first photo-mask and said second photo-mask respectively are sub-shifter phase shift masks.
Claim 7
Dependent Claim
23 words
The projection exposing apparatus as claimed claim 1 wherein said first photo-mask and said second photo-mask respectively are shifter light-shielding phase shift masks.
Claim 8
Dependent Claim
23 words
The projection exposing apparatus as claimed in claim 1 wherein said first photo-mask and said second photo-mask respectively are self-alignment phase shift masks.
Claim 9
Dependent Claim
23 words
The projection exposing apparatus as claimed in claim 1 wherein said first photo-mask and said second photo-mask respectively are half-tone phase shift masks.
Claim 10
Dependent Claim
127 words
A projection exposing apparatus comprising: a light source for producing light beams as a first light surface; an aperture for shaping light beams supplied from said light source to form a second light source surface for producing deformed irradiation; a blind for determining an exposure region of light beams supplied from said second light source surface; a photo-mask having a circuit pattern and irradiated with the light beams supplied from said third light source surface; a first projection optical system for shaping diffracted light beams supplied from said photo-mask for irradiating said photo-mask with the diffracted light beams that have been shaped; and a second projection optical system for imaging light beams diffracted by said photo-mask onto a substrate to project the circuit pattern of said photo-mask.
Claim 11
Dependent Claim
127 words
A projection exposing apparatus comprising: a light source for producing light beams as a first light surface; an aperture for shaping light beams supplied from said light source to form a second light source surface for producing deformed irradiation; a blind for determining an exposure region of light beams supplied from said second light source surface; a photo-mask having a circuit pattern and irradiated with the light beams supplied from said third light source surface; a first projection optical system for shaping diffracted light beams supplied from said photo-mask for irradiating said photo-mask with the diffracted light beams that have been shaped; and a second projection optical system for imaging light beams diffracted by said photo-mask onto a substrate to project the circuit pattern of said photo-mask.
Claim 12
Dependent Claim
17 words
The projection exposing apparatus according to claim 9 wherein said photo-mask is a Levenson phase shift mask.
Claim 13
Dependent Claim
17 words
The projection exposing apparatus according to claim 9 wherein said photo-mask is a sub-shifter phase shift mask.
Claim 14
Dependent Claim
18 words
The projection exposing apparatus according to claim 9 wherein said photo-mask is a shifter light-shielding phase shift mask.
Claim 15
Dependent Claim
17 words
The projection exposing apparatus according to claim 9 wherein said photo-mask is a self-alignment phase shift mask.
Claim 16
Dependent Claim
17 words
The projection exposing apparatus according to claim 9 wherein said photo-mask is a half-tone phase shift mask.
Claim 17
Dependent Claim
112 words
A projection exposing method comprising the steps of: shaping irradiation light beams supplied from a source to form a second light source surface for generating deformed irradiation; irradiating, with irradiation light beams supplied from said second light source surface, a second photo-mask having a pattern corresponding to a circuit pattern of a first photo-mask and disposed on a blind surface; shaping said irradiation light beams shaped by said second photo-mask to form a third light source; irradiating said first photo-mask with irradiation light beams supplied from said third light source surface; and imaging diffracted light beams passed from said first photo-mask onto a substrate to project the circuit pattern of said photo-mask.
Claim 18
Dependent Claim
112 words
A projection exposing method comprising the steps of: shaping irradiation light beams supplied from a source to form a second light source surface for generating deformed irradiation; irradiating, with irradiation light beams supplied from said second light source surface, a second photo-mask having a pattern corresponding to a circuit pattern of a first photo-mask and disposed on a blind surface; shaping said irradiation light beams shaped by said second photo-mask to form a third light source; irradiating said first photo-mask with irradiation light beams supplied from said third light source surface; and imaging diffracted light beams passed from said first photo-mask onto a substrate to project the circuit pattern of said photo-mask.
Claim 19
Dependent Claim
28 words
The projection exposing method according to claim 15 including using a photo-mask having a circuit pattern that is the same as the circuit pattern of said first photo-mask.
Claim 20
Dependent Claim
52 words
The projection exposing method according to claim 15 including using a photo-mask having a circuit pattern including elements disposed at the same positions as but having different dimensions from corresponding elements of the circuit pattern of said first photo-mask to adjust the amount of exposure of each portion of said first photo-mask.
Claim 21
Dependent Claim
88 words
A projection exposing method comprising the steps of: shaping irradiation light beams supplied from a light source to form a second light source surface for generating deformed irradiation; irradiating, with irradiation light beams supplied from said second light source surface, a photo-mask having a circuit pattern; shaping diffracted light beams passed through said photo-mask and again irradiating said photo-mask with said diffracted light beams that have been shaped; and imaging light beams again diffracted by said photo-mask onto a substrate to project the circuit pattern of said photo-mask.
Claim 22
Dependent Claim
88 words
A projection exposing method comprising the steps of: shaping irradiation light beams supplied from a light source to form a second light source surface for generating deformed irradiation; irradiating, with irradiation light beams supplied from said second light source surface, a photo-mask having a circuit pattern; shaping diffracted light beams passed through said photo-mask and again irradiating said photo-mask with said diffracted light beams that have been shaped; and imaging light beams again diffracted by said photo-mask onto a substrate to project the circuit pattern of said photo-mask.
References Cited (Backward Citations)
US5160962A
Cited
US5253040A
Cited
US5144362A
Cited
US5251067A
Cited
US5264898A
Cited
US5287142A
Cited
US5300972A
Cited
US5311249A
Cited
US5300971A
Cited
US5300967A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-11-21 | 1998-05-23 | 1998-11-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-11-21 | 2002-05-23 | 2002-11-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-11-21 | 2006-05-23 | 2006-11-22 | $7700.00 | Window Closed / Lapsed |