US5311249A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection exposure apparatus
Assignee: Renesas Electronics Corp
•
Filing: 1993-02-08
•
Granted: 1994-05-10
•
Expires: 2013-02-08
Abstract
Abstract A projection exposure apparatus includes a light source, a condenser lens for illuminating an illumination light emanating from the light source onto a mask on which a circuit pattern has been formed, a projection lens for condensing the illumination light which has passed through the mask onto a surface of a wafer, and an aperture member disposed between the light source and the condenser lens and having both a transmission area for shaping the light emanating from the light source and a light blocking area formed at a central portion of the transmission area. An outer diameter of the transmission area of the aperture member is set such that a ratio σ of an outer diameter of an effective light source to a diameter of a pupil of the projection lens is 0.6±0.3, while a light blocking rate of the light blocking area is set to 60±35%.
Inventors
- 👤 Kazuya Kamon
- 👤 Teruo Miyamoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 02:18
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70091; G03F7/701
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
158 words
A projection exposure apparatus comprising: a light source for producing illumination light; a condenser lens for condensing the illumination light emanating from said light source onto a mask including a circuit pattern; a projection lens having a pupil with a diameter, said projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer; and an aperture member disposed between said light source and said condenser lens and having a transmission area with an outer diameter for shaping the light emanating from said light source and a light blocking area at a central portion of said transmission area, the outer diameter of said transmission area of said aperture member being set such that a ratio σ of an outer diameter of an effective light source to the diameter of the pupil of said projection lens is 0.6±0.3 while a ratio of said light blocking area to the transmission area is 60±35%.
Claim 2
Dependent Claim
158 words
A projection exposure apparatus comprising: a light source for producing illumination light; a condenser lens for condensing the illumination light emanating from said light source onto a mask including a circuit pattern; a projection lens having a pupil with a diameter, said projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer; and an aperture member disposed between said light source and said condenser lens and having a transmission area with an outer diameter for shaping the light emanating from said light source and a light blocking area at a central portion of said transmission area, the outer diameter of said transmission area of said aperture member being set such that a ratio σ of an outer diameter of an effective light source to the diameter of the pupil of said projection lens is 0.6±0.3 while a ratio of said light blocking area to the transmission area is 60±35%.
Claim 3
Dependent Claim
56 words
A projection exposure apparatus according to claim 1 wherein said aperture member includes an annular frame having a circular central open portion, a transparent member covering the open portion of said annular frame, and a circular light blocking member disposed on said transparent member at a central portion of the open portion of said annular frame.
Claim 4
Dependent Claim
27 words
A projection exposure apparatus according to claim 2 wherein said annular frame and said light blocking member are a metallic material and said transparent member is glass.
Claim 5
Dependent Claim
53 words
A projection exposure apparatus according to claim 1 comprising a plurality of aperture members having different ratios σ and different light blocking ratios of the light blocking areas to the transmission area and a device for selectively locating one of said plurality of aperture members in an optical path of the illumination light.
Claim 6
Dependent Claim
30 words
A projection exposure apparatus according to claim 4 wherein said device has a rotatable disk-like substrate including a plurality of open portions, said polarizers being mounted in respective open portions.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-05-09 | 1997-11-08 | 1998-05-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-09 | 2001-11-08 | 2002-05-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-09 | 2005-11-08 | 2006-05-10 | $7700.00 | Window Closed / Lapsed |