US5300972A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection exposure apparatus
Assignee: Renesas Electronics Corp
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Filing: 1993-02-05
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Granted: 1994-04-05
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Expires: 2013-02-05
Abstract
Abstract A projection exposure apparatus includes a light source, a condenser lens for condensing illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer, and a polarizer for converting the illumination light into linearly polarized light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light. It may also be arranged such that a single polarizer is not fixed in the optical path of the illumination light and a polarizer suited to an exposure process is selected from a plurality of polarizers and used. In that case, a device selectively positions one of a plurality of polarizers in the optical path of the illumination light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light.
Inventors
- 👤 Kazuya Kamon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 12:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70566; G03F7/70216; G03F7/7025
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
80 words
A projection exposure apparatus comprising: a light source for producing illumination light; a condenser lens for condensing the illumination light emanating from said light source onto a mask including a circuit pattern; a projection lens for condensing illumination light that has passed through the mask onto a surface of a wafer; and a polarizer for converting the illumination light into linearly polarized light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light.
Claim 2
Dependent Claim
80 words
A projection exposure apparatus comprising: a light source for producing illumination light; a condenser lens for condensing the illumination light emanating from said light source onto a mask including a circuit pattern; a projection lens for condensing illumination light that has passed through the mask onto a surface of a wafer; and a polarizer for converting the illumination light into linearly polarized light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light.
Claim 3
Dependent Claim
21 words
A projection exposure apparatus according to claim 1 wherein said polarizer is disposed between said light source and said condenser lens.
Claim 4
Dependent Claim
28 words
A projection exposure apparatus according to claim 1 including a stop disposed between said light source and said condenser lens wherein said polarizer is disposed at said stop.
Claim 5
Dependent Claim
28 words
A projection exposure apparatus according to claim 1 wherein said polarizer is a pellicle film of the mask on a side of the mask toward said condenser lens.
Claim 6
Dependent Claim
28 words
A projection exposure apparatus according to claim 1 wherein said polarizer is a pellicle film of the mask on a side of the mask toward said projection lens.
Claim 7
Dependent Claim
21 words
A projection exposure apparatus according to claim 1 comprising an aperture member disposed between said light source and said condenser lens.
Claim 8
Dependent Claim
113 words
A projection exposure apparatus comprising: a light source for producing illumination light; a condenser lens for condensing the illumination light emanating from said light source onto a mask including a circuit pattern; a projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer; a plurality of polarizers for respectively converting the illumination light into linearly polarized light, said polarizers producing correspondingly different directions of plane polarized light; and a device for selectively positioning one of said plurality of polarizers in an optical path of the illumination light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light.
Claim 9
Dependent Claim
113 words
A projection exposure apparatus comprising: a light source for producing illumination light; a condenser lens for condensing the illumination light emanating from said light source onto a mask including a circuit pattern; a projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer; a plurality of polarizers for respectively converting the illumination light into linearly polarized light, said polarizers producing correspondingly different directions of plane polarized light; and a device for selectively positioning one of said plurality of polarizers in an optical path of the illumination light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light.
Claim 10
Dependent Claim
30 words
A projection exposure apparatus according to claim 7 wherein said device includes a rotatable disk-like substrate having a plurality of open portions, said polarizers being mounted in respective open portions.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-04-04 | 1997-10-04 | 1998-04-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-04-04 | 2001-10-04 | 2002-04-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-04-04 | 2005-10-04 | 2006-04-05 | $7700.00 | Window Closed / Lapsed |