Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
53 words
A method of forming a microanemometer comprising the step of: selectively processing selected parts of a single semiconductor crystal to form a fluid flow sensing bridge with at least one semiconductor resistor, each semiconductor resistor in the sensing bridge being thermally and electrically isolated from every other semiconductor resistor in the sensing bridge.
Claim 2
Independent Claim
53 words
A method of forming a microanemometer comprising the step of: selectively processing selected parts of a single semiconductor crystal to form a fluid flow sensing bridge with at least one semiconductor resistor, each semiconductor resistor in the sensing bridge being thermally and electrically isolated from every other semiconductor resistor in the sensing bridge.
Claim 3
Dependent Claim
93 words
The method of claim 1 and further comprising the steps of: selectively etching top and bottom surfaces of the crystal to a desired shape with four external sides defining an outer rectangle, four inner sections defining an inner rectangle, four branches interconnecting corners of the inner and outer rectangles and a membrane spanning between the four sides beneath the inner sections, the sensing bridge being located on the inner rectangle; and oxidizing selected parts of the crystal to isolate the semiconductor resistors from other thermally conductive and electrically conductive parts of the crystal.
Claim 4
Dependent Claim
42 words
The method of claim 2 and further comprising the step of: depositing electrically conductive contact material on selected portions of the external sides, branches and inner sections, each resistor aligned along an inner section between and below parallel portions of conductive material.
Claim 5
Dependent Claim
26 words
The method of claim 2 wherein the crystal is etched to provide external sides thicker than the inner sections and inner sections thicker than the branches.
Claim 6
Dependent Claim
40 words
The method of claim 3 and further comprising the step of: electrically connecting the electrically conductive contact material to at least one external electrical component to measure fluid flow across a top surface of the crystal via the sensing bridge.
Claim 7
Dependent Claim
29 words
The method of claim 5 wherein the resistors and electrically conductive material reside substantially in a common plane and said electrical connecting step is performed beneath said common plane.
Claim 8
Dependent Claim
41 words
The method of claim 6 wherein the electrical connecting step further comprises the step of: etching through a bottom surface of the crystal to form at least one recess to provide electrical connection access to the bottom surfaces of the contacts.
Claim 9
Dependent Claim
24 words
The method of claim 7 and further comprising the step of: depositing conductive material into the recesses to facilitate electrical connection to the contacts.
Claim 10
Dependent Claim
36 words
The method of claim 2 and further comprising the step of: etching from a top of the crystal to undercut and remove selected thermally and electrically conductive parts of the crystal from under the respective branches.
Claim 11
Dependent Claim
45 words
The method of claim 9 wherein the undercutting etching step is performed for a sufficiently long time duration to also remove thermally and electrically conductive material from underneath corners of the inner rectangle, thereby to thermally and electrically isolate each resistor from the other resistors.
Claim 12
Dependent Claim
66 words
The method of claim 9 and wherein the undercutting etching step is performed with a first etchant and further comprising the step of: selectively etching a region of the top surface of the crystal with a second etchant to selectively remove thermally and electrically conductive parts of the crystal from underneath the corners of the inner rectangle to thermally and electrically isolate each of the resistors.
Claim 13
Dependent Claim
80 words
The method of claim 11 and further comprising the step of: diffusing, prior to the etching steps, an n + material into the regions of the crystal adjacent positions where the corners of the inner rectangle will eventually be located, the n + diffused regions of the crystal being particularly susceptible to etching by the second etchant, thereby to promote selective undercutting of the corners of the inner rectangle to thermally and electrically isolate each resistor from the other resistors.