Cantilever semiconductor device

Claim 2

An integrated semiconductor device, comprising: a semiconductor body having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <100> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; and thin film dielectric member means comprising a static electric element, the member means having a predetermined configuration suspended over the depression, the predetermined configuration being oriented at a non-zero angle to the <100> direction, the member means being connected to the first surface so that the predetermined configuration is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration, the depression, the opening, and the member means providing substantial physical and thermal isolation between the element and the semiconductor body.

Claim 3

An integrated semiconductor device, comprising: a semiconductor body having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <110> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; and thin film dielectric member means comprising a thermal-to-electric transducing element, the member means having a predetermined configuration suspended over the depression, the predetermined configuration being oriented at a non-zero angle to the <110> direction, the member means being connected to the first surface so that the predetermined configuration is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration, the depression, the opening, and the member means providing substantial physical and thermal isolation between the element and the semiconductor body.

Claim 4

An integrated semiconductor device, comprising: a semiconductor body having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <110> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; and thin film dielectric member means comprising a thermal-to-electric transducing element, the member means having a predetermined configuration suspended over the depression, the predetermined configuration being oriented at a non-zero angle to the <110> direction, the member means being connected to the first surface so that the predetermined configuration is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration, the depression, the opening, and the member means providing substantial physical and thermal isolation between the element and the semiconductor body.

Claim 5

A flow sensor, comprising: a semiconductor having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <100> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; and thin film dielectric member means comprising resistive element means, the member means having a predetermined configuration suspended over the depression, the predetermined configuration being oriented at a non-zero angle to the [110] direction, the member means being connected to the first surface so that the predetermined configuration is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration, the depression, the opening, and the member means providing substantial physical and thermal isolation between the resistive element means and the semiconductor body; the resistive element means when provided with current becoming heated, there being a predetermined relationship between the resistance and the temperature of the resistive element means, the resistive element means being adapted to provide a signal related to the rate of air flowing over the member means; whereby air flowing over the member means will cause the resistive element means to cool in predetermined relation to the rate of air flow, thus causing a change in resistance and providing a measurement of air flow rate.

Claim 6

A flow sensor, comprising: a semiconductor having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <100> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; and thin film dielectric member means comprising resistive element means, the member means having a predetermined configuration suspended over the depression, the predetermined configuration being oriented at a non-zero angle to the [110] direction, the member means being connected to the first surface so that the predetermined configuration is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration, the depression, the opening, and the member means providing substantial physical and thermal isolation between the resistive element means and the semiconductor body; the resistive element means when provided with current becoming heated, there being a predetermined relationship between the resistance and the temperature of the resistive element means, the resistive element means being adapted to provide a signal related to the rate of air flowing over the member means; whereby air flowing over the member means will cause the resistive element means to cool in predetermined relation to the rate of air flow, thus causing a change in resistance and providing a measurement of air flow rate.

Claim 7

The apparatus of claim 1, 2 or 3 wherein the predetermined configuration comprises a substantially straight edge which is oriented at the non-zero angle.

Claim 8

The apparatus of claim 4 wherein the non-zero angle is substantially 45 degrees, whereby the member means will be undercut with maximum efficiency.

Claim 9

The apparatus of claim 1, 2 or 3 wherein the predetermined configuration has an axis which is oriented at the non-zero angle.

Claim 10

The apparatus of claim 6 wherein the non-zero angle is substantially 45 degrees, whereby the member means will be undercut with maximum efficiency.

Claim 11

The apparatus of claim 1, 2 or 3 wherein the non-zero angle is substantially 45 degrees, whereby the member means will be undercut with maximum efficiency.

Claim 12

The apparatus of claim 1, 2 or 3 wherein the predetermined configuration has an area greater than approximately 10×10 -6 square inch.

Claim 13

The apparatus of claim 1, 2 or 3 wherein the member means has a thickness in the range of approximately 0.8 microns to approximately 1.2 microns.

Claim 14

The apparatus of claim 1, 2 or 3 wherein the depression has a depth as measured between the member means and the semiconductor body in the range of approximately 0.001 inch to approximately 0.010 inch.

Claim 15

The apparatus of claim 1 wherein the static electric element comprises a thermal-to-electric transducing element.

Claim 16

The apparatus of claim 12 wherein the thermal-to-electric transducing element comprises resistive element means.

Claim 17

The apparatus of claim 2 wherein the thermal-to-electric transducing element comprises resistive element means.

Claim 18

The apparatus of claim 13 or 14 wherein the resistive element means comprises a permalloy element.

Claim 19

The apparatus of claim 15 wherein the permalloy element has a thickness in the range of approximately 800 angstroms to approximately 1600 angstroms.

Claim 20

The apparatus of claim 16 wherein the permalloy element has a composition of approximately 80 percent nickel and approximately 20 percent iron.

Claim 21

The apparatus of claim 17 wherein the permalloy element has a resistance in the range of approximately 500 ohms to approximately 2000 ohms at 25° C.

Claim 22

The apparatus of claim 18 wherein the member means comprises a dielectric encapsulating the permalloy element.

Claim 23

The apparatus of claim 19 wherein the dielectric comprises silicon nitride.

Claim 24

The apparatus of claim 15 wherein the permalloy element has a composition of approximately 80 percent nickel and approximately 20 percent iron.

Claim 25

The apparatus of claim 21 wherein the permalloy element has a resistance in the range of approximately 500 ohms to approximately 2000 ohms at 25° C.

Claim 26

The apparatus of claim 22 wherein the member means comprises a dielectric encapsulating the permalloy element.

Claim 27

The apparatus of claim 19 wherein the dielectric comprises silicon nitride.

Claim 28

The apparatus of claim 15 wherein the permalloy element has a resistance in the range of approximately 500 ohms to approximately 2000 ohms at 25° C.

Claim 29

The apparatus of claim 25 wherein the member means comprises a dielectric encapsulating the permalloy element.

Claim 30

The apparatus of claim 26 wherein the dielectric comprises silicon nitride.

Claim 31

The apparatus of claim 15 wherein the member means comprises a dielectric encapsulating the permalloy element.

Claim 32

The apparatus of claim 28 wherein the dielectric comprises silicon nitride.

Claim 33

The apparatus of claim 1, 2 or 3 wherein the semiconductor body comprises an integrated circuit operating in conjunction with the element.

Claim 34

The apparatus of claim 1, 2, or 3 wherein: the semiconductor body comprises (100) silicon having a (100) plane and a <110> direction; the first surface of the semiconductor body is substantially parallel to the (100) plane; and the predetermined configuration is oriented at a non-zero angle to the <110> direction.

Claim 35

A flow sensor, comprising: a semiconductor body having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <110> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; first thin film dielectric member means comprising first resistive element means, the first member means having a predetermined configuration suspended over the depression, the predetermined configuration of the first member means being oriented at a non-zero angle to the <110> direction, the first member means being connected to the first surface so that the predetermined configuration of the first member means is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration of the first member means, the depression, the opening, and the first member means providing substantial physical and thermal isolation between the first resistive element means and the semiconductor body; second thin film dielectric member means comprising second resistive element means, the second member means having a predetermined configuration suspended over the depression, the predetermined configuration of the second member means being oriented at a non-zero angle to the [100] direction, the second member means being connected to the first surface so that the predetermined configuration of the second member means is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration of the second member means, the depression, the opening, and the second member means providing substantial physical and thermal isolation between the second resistive element means and the semiconductor body; the resistive element means when provided with current becoming heated, there being a predetermined relationship between the resistance of each resistive element means and the temperature of the respective resistive element means; the first resistive element means being adapted to provide a first signal related to the resistance of the first resistive means, the second resistive element means being adapted to provide a second signal related to the resistance of the second resistive element means, the two signals having a predetermined relationship to the rate of air flow when air flows over the member means from the first member means to the second member means; whereby the first and second signals may be offset so that at a predetermined rate of flow the difference between the first and second signals has a predetermined value.

Claim 36

A flow sensor, comprising: a semiconductor body having a depression formed by an anisotropic etch applied to a first surface of the body, the semiconductor body comprising (100) silicon having a (100) plane and a <110> direction, the first surface of the semiconductor body being substantially parallel to the (100) plane; first thin film dielectric member means comprising first resistive element means, the first member means having a predetermined configuration suspended over the depression, the predetermined configuration of the first member means being oriented at a non-zero angle to the <110> direction, the first member means being connected to the first surface so that the predetermined configuration of the first member means is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration of the first member means, the depression, the opening, and the first member means providing substantial physical and thermal isolation between the first resistive element means and the semiconductor body; second thin film dielectric member means comprising second resistive element means, the second member means having a predetermined configuration suspended over the depression, the predetermined configuration of the second member means being oriented at a non-zero angle to the [100] direction, the second member means being connected to the first surface so that the predetermined configuration of the second member means is cantilevered over the depression, the depression opening to the first surface around at least a portion of the predetermined configuration of the second member means, the depression, the opening, and the second member means providing substantial physical and thermal isolation between the second resistive element means and the semiconductor body; the resistive element means when provided with current becoming heated, there being a predetermined relationship between the resistance of each resistive element means and the temperature of the respective resistive element means; the first resistive element means being adapted to provide a first signal related to the resistance of the first resistive means, the second resistive element means being adapted to provide a second signal related to the resistance of the second resistive element means, the two signals having a predetermined relationship to the rate of air flow when air flows over the member means from the first member means to the second member means; whereby the first and second signals may be offset so that at a predetermined rate of flow the difference between the first and second signals has a predetermined value.

Claim 37

The apparatus of claim 32 wherein each predetermined configuration comprises a substantially straight edge which is oriented at the non-zero angle.

Claim 38

The apparatus of claim 33 wherein the non-zero angle is substantially 45 degrees, whereby each member means will be undercut with maximum efficiency.

Claim 39

The apparatus of claim 32 wherein each predetermined configuration has an axis which is oriented at the non-zero angle.

Claim 40

The apparatus of claim 35 wherein the non-zero angle is substantially 45 degrees, whereby each member means will be undercut with maximum efficiency.

Claim 41

The apparatus of claim 32 wherein the non-zero angle is substantially 45 degrees, whereby each member means will be undercut with maximum efficiency.

Claim 42

The apparatus of claim 32 wherein each predetermined configuration has an area greater than approximately 10×10 -6 square inch.

Claim 43

The apparatus of claim 32 wherein each member means has a thickness in the range of approximately 0.8 microns to approximately 1.2 microns.

Claim 44

The apparatus of claim 32 wherein the depression has a depth as measured between each member means and the semiconductor body in the range of approximately 0.001 inch to approximately 0.010 inch.

Claim 45

The apparatus of claim 32 wherein each resistive element means comprises a permalloy element.

Claim 46

The apparatus of claim 41 wherein each permalloy element has a thickness in the range of approximately 800 angstroms to approximately 1600 angstroms.

Claim 47

The apparatus of claim 42 wherein each permalloy element has a composition of approximately 80 percent nickel and approximately 20 percent iron.

Claim 48

The apparatus of claim 43 when each permalloy element has a resistance in the range of approximately 500 ohms to approximately 2000 ohms at 25° C.

Claim 49

The apparatus of claim 44 wherein each member means comprises a dielectric encapsulating the respective permalloy element.

Claim 50

The apparatus of claim 45 wherein the dielectric comprises silicon nitride.

Claim 51

The apparatus of claim 41 wherein each permalloy element has a composition of approximately 80 percent nickel and approximately 20 percent iron.

Claim 52

The apparatus of claim 47 wherein each permalloy element has a resistance in the range of approximately 500 ohms to approximately 2000 ohms at 25° C.

Claim 53

The apparatus of claim 48 wherein each member means comprises a dielectric encapsulating the respective permalloy element.

Claim 54

The apparatus of claim 49 wherein the dielectric comprises silicon nitride.

Claim 55

The apparatus of claim 41 wherein each permalloy element has a resistance in the range of approximately 500 ohms to approximately 2000 ohms at 25° C.

Claim 56

The apparatus of claim 51 wherein each member means comprises a dielectric encapsulating the respective permalloy element.

Claim 57

The apparatus of claim 52 wherein the dielectric comprises silicon nitride.

Claim 58

The apparatus of claim 41 wherein each member means comprises a dielectric encapsulating the respective permalloy element.

Claim 59

The apparatus of claim 54 wherein the dielectric comprises silicon nitride.

Claim 60

The apparatus of claim 32 wherein the first and second member means are substantially identical, the first and second member means comprising substantially identical first and second resistive element means.

Claim 61

The apparatus of claim 32 wherein the first and second resistive element means comprises a circuit for offsetting the first and second signals.

Claim 62

The apparatus of claim 57 wherein the circuit is integrated on the semiconductor body.

Claim 63

The apparatus of claim 32, 57, or 58 wherein the difference between the first and second signals is substantially zero at a substantially zero flow rate.