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US5266509A
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Fabrication method for a floating-gate field-effect transistor structure
Assignee: Philips North America LLC
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Filing: 1993-03-05
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Granted: 1993-11-30
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Expires: 2013-03-05
Abstract
Abstract A stacked floating-gate field-effect transistor ("FET") structure suitable for memory cells in a nonvolatile memory is fabricated according to a process in which a floating-gate layer is formed on a semiconductor substrate (30), oxide (42) is formed along the sidewalls (35) of the floating gate (18) extending in the channel-length direction, and an oxide-nitride-oxide ("ONO") composite layer (44) is formed along the top of the structure, including the floating gate and the sidewall oxide. The ONO composite layer and the sidewall oxide act as an isolation dielectric between the floating gate and a control gate (20) formed on top of the ONO layer.
Inventors
- 👤 Tey-Yi J. Chen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 15:17
CPC Classifications
H; H10; H10B; H10B41/00; H10B41/10; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0411; H10D64/00; H10D64/01; H10D64/031; H10D64/035; H10D64/60; H10D64/66; H10D64/68; H10D64/681; H10B69/00
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
120 words
A method for manufacturing a floating-gate field-effect transistor in which a channel separates a source and a drain in a semiconductor substrate so as to establish a channel-length direction, the method comprising the steps of: forming a floating-gate layer over a gate dielectric layer situated along the substrate, the floating-gate layer having a top surface and a pair of opposing first sidewalls that extend in the channel-length direction; forming a pair of sidewall oxide layers respectively along the first sidewalls of the floating-gate layer; subsequently separately forming a composite oxide-nitride-oxide ("ONO") layer along the sidewall oxide layers and along the top surface of the floating-gate layer; forming a control gate over the ONO layer; and forming the source and drain.
Claim 2
Independent Claim
120 words
A method for manufacturing a floating-gate field-effect transistor in which a channel separates a source and a drain in a semiconductor substrate so as to establish a channel-length direction, the method comprising the steps of: forming a floating-gate layer over a gate dielectric layer situated along the substrate, the floating-gate layer having a top surface and a pair of opposing first sidewalls that extend in the channel-length direction; forming a pair of sidewall oxide layers respectively along the first sidewalls of the floating-gate layer; subsequently separately forming a composite oxide-nitride-oxide ("ONO") layer along the sidewall oxide layers and along the top surface of the floating-gate layer; forming a control gate over the ONO layer; and forming the source and drain.
Claim 3
Dependent Claim
27 words
A method as in claim 1 wherein the step of forming the sidewall oxide layers entails thermally growing oxide along the first sidewalls of the floating-gate layer.
Claim 4
Dependent Claim
24 words
A method as in claim 2 wherein the step of thermally growing oxide is performed at a temperature no greater than approximately 950° C.
Claim 5
Dependent Claim
52 words
A method as in claim 2 further including the steps of: providing a nitride layer over the top surface of the floating gate layer, but not along its first sidewalls, prior to the step of thermally growing oxide; and removing the nitride layer prior to the step of forming the ONO layer.
Claim 6
Dependent Claim
36 words
A method as in claim 4 further including the step of providing a pad oxide layer along the top surface of the floating-gate layer below the nitride layer prior to the step of thermally growing oxide.
Claim 7
Dependent Claim
25 words
A method as in claim 5 further including the step of removing the pad oxide layer prior to the step of forming the ONO layer.
Claim 8
Independent Claim
59 words
A method as in claim i wherein the step of forming the ONO layer comprises the steps of: thermally growing a lower oxide layer along the sidewall oxide layers and along the top surface of the floating gate layer; depositing a nitride layer on the lower oxide layer; and thermally growing an upper oxide layer along the nitride layer.
Claim 9
Dependent Claim
31 words
A method as in claim 7 wherein the steps of growing the lower and upper oxide layers are respectively performed at temperatures no greater than approximately 1100° C. and 1000° C.
Claim 10
Dependent Claim
36 words
A method as in claim 8 wherein the step of forming the sidewall oxide layers entails thermally growing oxide along the first sidewalls of the floating-gate layer at a temperature no greater than approximately 950° C.
Claim 11
Dependent Claim
27 words
A method as in claim 7 wherein the semiconductor substrate, the oxide layers, and the nitride layer respectively consist principally of silicon, silicon oxide, and silicon nitride.
Claim 12
Dependent Claim
48 words
A method as in claim 7 wherein the total average thickness of oxide sandwiched between the nitride layer and either first sidewall of the floating-gate layer is greater than the total average thickness of oxide sandwiched between the nitride layer and the top surface of the floating-gate layer.
Claim 13
Dependent Claim
50 words
A method as in claim 1 further including, prior to the step of forming the sidewall oxide layers, the step of introducing a semiconductor impurity of the same conductivity type as the source and drain into the portion of the region for the source not covered by the floating-gate layer.
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| 3.5 Years (Year 4) | 1996-11-29 | 1997-05-31 | 1997-11-30 | $2000.00 | Window Closed / Lapsed |
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