DRAM device having a memory cell array of a divided bit line type

Claim 2

A DRAM device comprising a memory cell array which includes a plurality of memory cells for storing memory information in a minimum unit on a main surface of a semiconductor substrate of a first conductivity type; said device comprising: said memory cells, each of which includes one transfer gate transistor (14) and one capacitor (3); said transfer gate transistors, each of which includes a gate electrode (20a) including a part of a word line (20a) extending on a main surface of said semiconductor substrate (7) with an insulator layer (14) therebetween, and first and second impurity regions (11 and 13) of a second conductivity type which are formed in said semiconductor substrate with a predetermined space from each other and are self-aligned to said gate electrode; said capacitors, each of which is connected to said second impurity region (11) in said transfer gate transistor, and has a portion extending over the gate electrode; said transfer gate transistors arranged in such a manner that each said first impurity region is commonly used by the four transfer gate transistors which have said second impurity regions symmetrically and uniformly disposed around the first impurity region; said word lines which are arranged perpendicularly to the adjacent word lines and are continuous to the transfer gate transistors, respectively; and bit lines (24, 25) connected to said first impurity regions, each of which is commonly used by said four transfer gate transistors, and extending in an oblique direction with respect to said word lines.

Claim 3

A device according to claim 1, wherein said capacitors (3) have portions extended over insulator layers (15) formed on said word lines (20a).

Claim 4

A device according to claim 1, wherein trenches (8) are formed in regions of said second impurity regions (11), and said capacitors have portions including a first electrode layer (6) formed inside said trenches, a dielectric layer (10) formed on a surface of said first electrode layer and a second electrode layer (18) formed on a surface of said dielectric layer.

Claim 5

A device according to claim 3, wherein said first electrode layer of said capacitor includes a polycrystal silicon layer formed on an inner surface of said trench.

Claim 6

A DRAM device comprising a memory cell array which includes a plurality of memory cells for storing memory information in a minimum unit on a main surface of a semiconductor substrate of a first conductivity type; said device comprising: said memory cells, each of which includes one transfer gate transistor (4) and one capacitor (3); said transfer gate transistors, each of which includes a gate electrode (20a) including a part of a word line (20a) and extending on a main surface of said semiconductor substrate (7) with an insulator layer (14) therebetween, and first and second impurity regions (13 and 11) of a second conductivity type which are formed in said semiconductor substrate with a predetermined space from each other and are self-aligned to said gate electrode; said capacitors, each of which is connected to said second impurity region (11) in said transfer gate transistor, and has a portion extending over the gate electrode; said memory cell array (50) including a first region (50a) and a second region (50b) divided from each other; amplifier means (53) arranged adjacent to said memory cell array; a pair of bit lines (24 and 25) connected to said amplifier means and extending in the same direction from said amplifier means into said memory cell array; one (24) of said pair of bit lines including a first conductive layer (24b) which extends through said first region (50a) and said second region (50b) in said memory cell array, and a second conductive layer (24a) which is formed in said first region, has an end connected to said first conductive layer and is connected to said first impurity regions of said transfer gate transistors in said memory cells arranged in said first region; and the other (25) of said pair of bit lines including a third conductive layer (25b) which extends through said first region (50a) and said second region (50b) in said memory cell array, and a fourth conductive layer (25a) which is formed in said second region, has an end connected to said third conductive layer and is connected to said first impurity regions of said transfer gate transistors in said memory cells arranged in said second region.

Claim 7

A DRAM device comprising a memory cell array which includes a plurality of memory cells for storing memory information in a minimum unit on a main surface of a semiconductor substrate of a first conductivity type; said device comprising: said memory cells, each of which includes one transfer gate transistor (4) and one capacitor (3); said transfer gate transistors, each of which includes a gate electrode (20a) including a part of a word line (20a) and extending on a main surface of said semiconductor substrate (7) with an insulator layer (14) therebetween, and first and second impurity regions (13 and 11) of a second conductivity type which are formed in said semiconductor substrate with a predetermined space from each other and are self-aligned to said gate electrode; said capacitors, each of which is connected to said second impurity region (11) in said transfer gate transistor, and has a portion extending over the gate electrode; said memory cell array (50) including a first region (50a) and a second region (50b) divided from each other; amplifier means (53) arranged adjacent to said memory cell array; a pair of bit lines (24 and 25) connected to said amplifier means and extending in the same direction from said amplifier means into said memory cell array; one (24) of said pair of bit lines including a first conductive layer (24b) which extends through said first region (50a) and said second region (50b) in said memory cell array, and a second conductive layer (24a) which is formed in said first region, has an end connected to said first conductive layer and is connected to said first impurity regions of said transfer gate transistors in said memory cells arranged in said first region; and the other (25) of said pair of bit lines including a third conductive layer (25b) which extends through said first region (50a) and said second region (50b) in said memory cell array, and a fourth conductive layer (25a) which is formed in said second region, has an end connected to said third conductive layer and is connected to said first impurity regions of said transfer gate transistors in said memory cells arranged in said second region.

Claim 8

A device according to claim 5, wherein a pair of said bit lines (24 and 25) extend parallel to each other, and said first conductive layer (24b) of said one bit line (24) and said third conductive layer (25b) of said other bit line (25) are crossed each other at a boundary region between said first region (50a) and said second region (50b) in said memory cell array.

Claim 9

A device according to claim 5, wherein said memory cell array (1) has a rectangular planar region, said word lines extend in a direction obliquely crossing said bit lines, and said word lines are connected to memory cell selector means (51a and 51b) arranged along a side of said memory cell array other than a side adjacent to said amplifier means.