US5185235A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Remover solution for photoresist
Assignee: Tokyo Ohka Kogyo Co Ltd
•
Filing: 1990-03-30
•
Granted: 1993-02-09
•
Expires: 2010-03-30
Abstract
Abstract The remover solution of the invention comprises (A) from 35 to 80% by weight of an alcoholic solvent such as ethylene glycol monoethyl ether, (B) from 10 to 40% by weight of an organic solvent which is a halogenated hydrocarbon solvent, e.g., 1,2-dichlorobenzene and methylene chloride, an ether solvent, e.g., tetrahydrofuran, or an aromatic solvent, e.g., benzene and xylene, and (C) from 0.1 to 25% by weight of a quaternay ammonium compound such as tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide. Different from conventional remover solutions which only can swell cured photoresist compositions, the inventive remover solution has a power to completely dissolve a cured photoresist layer to give a quite satisfactory result in the removing works of patterned photoresist layers in the manufacture of semiconductor devices.
Inventors
- 👤 Hiromitsu Sato
- 👤 Kenji Tazawa
- 👤 Toshimi Aoyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 00:06
CPC Classifications
C; C09; C09D; C09D9/00; C09D9/005; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
152 words
A remover solution for photoresist which consists essentially of, in admixture: (A) an aliphatic alcoholic solvent selected from the group consisting of methyl alcohol, ethyl alcohol, propyl alcohol, 3-methyl-3-methoxy butyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether and dipropylene glycol monomethyl ether in a weight fraction in the range from 35% to 80%; (B) an organic solvent selected from the group consisting of halogenated hydrocarbon solvents, unhydroxylated ether solvents selected from the group consisting of dioxane, tetrahydrofuran, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol diethyl ether and diethylene glycol dibutyl ether, and unhalogenated aromatic solvents in a weight fraction in the range from 10% to 40%; and (C) a quaternary ammonium salt in a weight fraction in the range from 0.1% to 25%.
Claim 2
Dependent Claim
152 words
A remover solution for photoresist which consists essentially of, in admixture: (A) an aliphatic alcoholic solvent selected from the group consisting of methyl alcohol, ethyl alcohol, propyl alcohol, 3-methyl-3-methoxy butyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether and dipropylene glycol monomethyl ether in a weight fraction in the range from 35% to 80%; (B) an organic solvent selected from the group consisting of halogenated hydrocarbon solvents, unhydroxylated ether solvents selected from the group consisting of dioxane, tetrahydrofuran, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, tetraethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol diethyl ether and diethylene glycol dibutyl ether, and unhalogenated aromatic solvents in a weight fraction in the range from 10% to 40%; and (C) a quaternary ammonium salt in a weight fraction in the range from 0.1% to 25%.
Claim 3
Dependent Claim
39 words
The remover solution as claimed in claim 1 wherein the quaternary ammonium salt as the component (C) is selected from the group consisting of tetramethyl ammonium hydroxide, trimethyl hydroxyethyl ammonium hydroxide, tetra(hydroxyethyl) ammonium hydroxide and methyl tri(hydroxyethyl) ammonium hydroxide.
Claim 4
Dependent Claim
37 words
The remover solution as claimed in claim 1 wherein the halogenated hydrocarbon solvent as the component (B) is selected from the group consisting of 1,2-dichlorobenzene, tetrachloroethylene, trichloroethylene, methylene chloride, 1,1,1-trichloroethane, chlorobenzene, 1,2,4-trichlorobenzene, bromobenzene, 1,2-dibromobenzene, p-chlorotoluene and m-chlorotoluene.
Claim 5
Dependent Claim
57 words
The remover solution as claimed in claim 1 wherein the unhalogenated aromatic solvent as the component (B) is selected from the group consisting of benzyl alcohol, xylene, benzene, toluene, ethyl benzene, p-cresol, amyl benzene, naphthalene and a mixture of tri- and tetramethyl benzenes, alkyl toluenes, branched alkyl benzenes, cymene, diethyl benzene, naphthalene and mono- and dimethyl naphthalenes.
Claim 6
Dependent Claim
57 words
A process comprising applying a photopolymerizable photoresist material onto a substrate: exposing the photopolymerizable material to actinic rays through a mask, whereby to produce a desired pattern in said material; developing said material, whereby forming a patterned photoresist layer; and then removing the patterned photoresist layer by treating such with the remover solution claimed in claim 1.
Claim 7
Dependent Claim
17 words
The method as claim in claim 5 wherein the remover solution is as claimed in claim 2.
Claim 8
Dependent Claim
17 words
The method as claimed in claim 5 wherein the remover solution is as claimed in claim 3.
Claim 9
Dependent Claim
17 words
The method as claimed in claim 5 wherein the remover solution is as claimed in claim 4.
References Cited (Backward Citations)
US4239661A
Cited
US4187191A
Cited
US4396703A
Cited
US4395348A
Cited
US4592787A
Cited
US4801519A
Cited
WO1987005314A1
Cited
US4744834A
Cited
US4904571A
Cited
JPH0350838A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-02-09 | 1996-08-10 | 1997-02-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-02-09 | 2000-08-10 | 2001-02-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-02-09 | 2004-08-10 | 2005-02-09 | $7700.00 | Window Closed / Lapsed |