US4592787A
Expired / Lapsed
US
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Composition useful for stripping photoresist polymers and method
Assignee: Dow Chemical Co
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Filing: 1984-11-05
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Granted: 1986-06-03
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Expires: 2004-11-05
Abstract
Abstract This invention is a composition suitable for stripping cross-linked photoresist polymer which comprises (a) a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monoethers of propylene glycol; (b) a C2-6 alkanol; (c) an alkanolamine; and (d) a base.
Inventors
- 👤 M. Anthony Johnson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 20:29
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/425
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
101 words
A composiion suitable for stripping cross-linked photoresist polymer which comprises (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C 2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; and (d) between about 1 and 14 percent by weight of a base wherein the base is an alkali metal hydroxide, alkaline earth metal hydroxide, ammonium hydroxide, alkali metal carbonate, alkaline earth metal carbonate or ammonium carbonate.
Claim 2
Dependent Claim
101 words
A composiion suitable for stripping cross-linked photoresist polymer which comprises (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C 2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; and (d) between about 1 and 14 percent by weight of a base wherein the base is an alkali metal hydroxide, alkaline earth metal hydroxide, ammonium hydroxide, alkali metal carbonate, alkaline earth metal carbonate or ammonium carbonate.
Claim 3
Dependent Claim
56 words
The composition of claim 1, wherein lower alkyl monoethers of propylene glycol correspond to the formula ##STR3## wherein R 1 is C 1-4 alkyl; R 2 is hydrogen or methyl; and n is an integer of 1 to 3, with the proviso that one R 2 in each unit is methyl and the other is hydrogen.
Claim 4
Dependent Claim
74 words
The composition of claim 1 which comprises (a) between about 40 and 55 percent by weight of a lower alkyl monoether of a propylene glycol or a mixture of lower alkyl ethers of propylene glycol; (b) between about 17 and 25 percent by weight of a C 2-6 alkanol; (c) between about 18 and 28 percent by weight of an alkanolamine; and (d) between about 2 and 6 percent by weight of a base.
Claim 5
Dependent Claim
28 words
The composition of claim 1 wherein the alkanolamine is monoethanolamine, monopropanolamine or monoisopropanolamine, and the base is an alkali metal hydroxide, alkaline earth hydroxide or an ammonium hydroxide.
Claim 6
Dependent Claim
19 words
The composition of claim 4 which comprises (a) propylene glycol methylether; (b) n-butanol; (c) monoisopropanolamine; and (d) ammonium hydroxide.
Claim 7
Dependent Claim
23 words
The composition of claim 4 which comprises (a) dipropylene glycol isopropylether; (b) propylene glycol isopropylether; (c) monoethanolamine; (d) n-butanol; and (e) ammonium hydroxide.
Claim 8
Dependent Claim
19 words
The composition of claim 4 which comprises (a) propylene glycol isopropylether; (b) n-butanol; (c) monoisopropanolamine; and (d) ammonium hydroxide.
Claim 9
Dependent Claim
20 words
The composition of claim 1 which further comprises between about 0.1 and 0.5 percent by weight of a nonionic surfactant.
Claim 10
Dependent Claim
37 words
An aqueous composition suitable for stripping cross-linking photoresist polymers which comprises (a) between about 15 and, 99 percent by volume of the composition of claim 1, and (2) between 1 and 85 percent by volume of water.
Claim 11
Dependent Claim
38 words
An aqueous composition suitable for stripping cross-linking photoresist polymers which comprises (1) between about 15 and 25 percent by volume of the composition of claim 1, and (2) between about 75 and 85 percent by volume of water.
Claim 12
Independent Claim
168 words
A method of stripping corss-linked photoresist polymer from a substrate which comprises contacting a substrate upon which a cross-linked photoresist polymer is adhered with a stripper composition comprising (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monoethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C 2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; and (d) between about 1 and 14 percent by weight of a base wherein the base is an alkali metal hydroxide, alkaline earth metal hydroxide, ammonium hydroxide, alkali metal carbonate, alkaline earth metal carbonate or ammonium carbonate; wherein the stripper composition has a pH of 9 or greater, at a temperature at which the stripper composition is a single phase, for a time sufficient to strip the cross-linked photoresist polymer from the substrate, under conditions such that the cross-linked photoresist polymer is stripped from the substrate.
Claim 13
Independent Claim
168 words
A method of stripping corss-linked photoresist polymer from a substrate which comprises contacting a substrate upon which a cross-linked photoresist polymer is adhered with a stripper composition comprising (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monoethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C 2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; and (d) between about 1 and 14 percent by weight of a base wherein the base is an alkali metal hydroxide, alkaline earth metal hydroxide, ammonium hydroxide, alkali metal carbonate, alkaline earth metal carbonate or ammonium carbonate; wherein the stripper composition has a pH of 9 or greater, at a temperature at which the stripper composition is a single phase, for a time sufficient to strip the cross-linked photoresist polymer from the substrate, under conditions such that the cross-linked photoresist polymer is stripped from the substrate.
Claim 14
Dependent Claim
59 words
The method of claim 11 wherein the lower alkyl monoethers of propylene glycols correspond to the formula ##STR4## wherein R 1 is C 1-4 alkyl; R 2 is hydrogen or methyl; and n is an integer of from 1 to 3, with the proviso that R 2 in each unit is methyl and the other R 2 is hydrogen.
Claim 15
Dependent Claim
23 words
The method of claim 14 wherein the stripper composition further comprises between about 0.1 and 0.5 percent by weight of a nonionic surfactant.
Claim 16
Dependent Claim
116 words
The method of claim 13 wherein the stripper composition comprises (1) between about 15 and 99 percent by volume of a composition which comprises (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol or a mixture of lower alkyl monoethers of propylene glycols; (b) between about 10 and 30 percent by weight of a C 2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; (d) between about 1 and 14 percent by weight of a base; and (e) between about 0.1 and 0.5 percent by weight of a nonionic surfactant, and (2) between about 1 and 85 percent by volume of water.
Claim 17
Dependent Claim
21 words
The method of claim 14 wherein the contacting is performed at a temperature of between about 20° C. and 50° C.
Claim 18
Dependent Claim
13 words
The method of claim 15 wherein the substrate is a printed circuit board.
Claim 19
Dependent Claim
17 words
The method of claim 15 wherein the substrate is immersed in a bath of the stripping composition.
Claim 20
Dependent Claim
14 words
The method of claim 15 wherein the stripping composition is sprayed on the substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-06-02 | 1989-12-02 | 1990-06-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-06-02 | 1993-12-02 | 1994-06-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-06-02 | 1997-12-02 | 1998-06-03 | $7700.00 | Window Closed / Lapsed |