US4801519A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing a pattern with negative-type photosensitive composition
Assignee: Hitachi Ltd
•
Filing: 1987-04-13
•
Granted: 1989-01-31
•
Expires: 2007-04-13
Abstract
Abstract A developing solution comprising at least two compounds selected from choline and quaternary ammonium salts is suitable for developing a negative-type photosensitive resin composition with exposure to a smaller light amount.
Inventors
- 👤 Shigeru Koibuchi
- 👤 Asao Isobe
- 👤 Daisuke Makino
- 👤 Yutaka Takeda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 05:05
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
101 words
A process for producing a pattern with a negative-type photosensitive composition which comprises coating a negative-type photosensitive composition on a semiconductor substrate; drying the coating to provide a photosensitive film; subjecting the film to small light exposure to effect curing of selected portions thereof; and developing the film by contacting with a developing solution which comprises at least two compounds selected from the group consisting of a compound of the formula: (CH.sub.3).sub.3 (CH.sub.2 CH.sub.2 OH)NOH and compounds of the formula: (C.sub.n H.sub.2n+1).sub.4 NX (I) wherein X is OH, Cl, I or Br; and n is an integer of 1 to 5.
Claim 2
Dependent Claim
101 words
A process for producing a pattern with a negative-type photosensitive composition which comprises coating a negative-type photosensitive composition on a semiconductor substrate; drying the coating to provide a photosensitive film; subjecting the film to small light exposure to effect curing of selected portions thereof; and developing the film by contacting with a developing solution which comprises at least two compounds selected from the group consisting of a compound of the formula: (CH.sub.3).sub.3 (CH.sub.2 CH.sub.2 OH)NOH and compounds of the formula: (C.sub.n H.sub.2n+1).sub.4 NX (I) wherein X is OH, Cl, I or Br; and n is an integer of 1 to 5.
Claim 3
Dependent Claim
44 words
A process according to claim 1, wherein the exposure time required for curing one-half of the coating film with said developing solution is 1/3 or less and preferably 1/4 or less the time required by another developing solution containing only one of said compounds.
Claim 4
Dependent Claim
55 words
A process according to claim 1, wherein said at least two compounds comprise a first compound and a second compound, said first compound having a smaller molecular weight than the second compound, and wherein the weight ratio of said first compound to said second compound is in the range of 1:1 to 1:1×10 -4 .
Claim 5
Dependent Claim
23 words
A process according to claim 1, wherein said developing solution further comprises a solvent selected from the group consisting of water and alcohol.
Claim 6
Dependent Claim
21 words
A process according to claim 1, wherein said at least two compounds are a combination of tetramethylammonium hydroxide and tetrapentylammonium chloride.
Claim 7
Dependent Claim
20 words
A process according to claim 1, wherein said at least two compounds are a combination of choline and tetrapentylammonium chloride.
Claim 8
Dependent Claim
26 words
A process according to claim 4, wherein said at least two compounds are dissolved in said solvent at a concentration of 10% by weight or less.
Claim 9
Dependent Claim
17 words
A process according to claim 4, wherein said developing solution further comprises surface active agents and stabilizers.
Claim 10
Dependent Claim
29 words
A process according to claim 1, wherein said negative-type photosensitive composition comprises a polymer component soluble in aqueous alkali solutions and a photopolymerization initiator comprising an aromatic azide compound.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-01-31 | 1992-08-01 | 1993-01-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-01-31 | 1996-08-01 | 1997-01-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-01-31 | 2000-08-01 | 2001-01-31 | $7700.00 | Window Closed / Lapsed |