US5143814A — Positive photoresist compositions with o-quinone …

Claim 1

Independent Claim 70 words

A positive photoresist composition consisting essentially of, in admixture, from about 15% to about 99% by weight, based on the solid parts of said composition, of at least one novolak resin, about 1% to about 85% by weight, based on the solid parts of said composition, of at least one o-quinone diazide photosensitizer, and a sufficient amount of propylene glycol alkyl ether acetate to increase the photospeed of said composition.

Claim 2

Dependent Claim 70 words

A positive photoresist composition consisting essentially of, in admixture, from about 15% to about 99% by weight, based on the solid parts of said composition, of at least one novolak resin, about 1% to about 85% by weight, based on the solid parts of said composition, of at least one o-quinone diazide photosensitizer, and a sufficient amount of propylene glycol alkyl ether acetate to increase the photospeed of said composition.

Claim 3

Dependent Claim 16 words

The positive photoresist composition of claim 1 wherein said acetate is propylene glycol methyl ether acetate.

Claim 4

Dependent Claim 34 words

The positive photoresist composition of claim 2 wherein said o-quinone diazide photosensitizer is present in an amount of from about 10% to about 50% by weight, based on the solid parts of said composition.

Claim 5

Dependent Claim 33 words

The positive photoresist composition of claim 3 wherein said novolak resin is present in an amount of from about 50% to about 90% by weight, based on the solid parts of said composition.

Claim 6

Dependent Claim 61 words

The positive photoresist composition of claim 4 wherein said novolak resin is present in an amount of from about 65% to about 85% by weight, based on the solid parts of said composition, and wherein said o-quinone diazide photosensitizer is present in an amount of from about 15% to about 35% by weight, based on the solid parts of said composition.

Claim 7

Dependent Claim 29 words

The positive photoresist composition of claim 1 further comprising one or more additives selected from the group consisting of colorants, anti-striation agents, plasticizers, adhesion promoters, speed enhancers, and surfactants.

Claim 8

Dependent Claim 23 words

The positive photoresist composition of claim 1 wherein the amount of propylene glycol alkyl ether acetate present does not substantially effect development contrast.

Claim 9

Dependent Claim 16 words

The positive photoresist composition of claim 7 wherein said acetate is propylene glycol methyl ether acetate.

Claim 10

Dependent Claim 21 words

A photosensitive element which consists essentially of a substrate and the positive photoresist composition of claim 1 disposed on said substrate.

Claim 11

Dependent Claim 37 words

The element of claim 9 wherein said substrate comprises one or more components selected from the group consisting of silicon, aluminum, polymeric resins, silicon dioxide, doped silicon dioxide, silicon nitride, tantalum, copper, polysilicon, ceramics and aluminum/copper mixtures.

Claim 12

Dependent Claim 78 words

A photosensitive solution suitable for application to a substrate to form a positive photoresist, which consists essentially of at least one novolak resin, at least one o-quinone diazide photosensitizer in an amount sufficient to act as a dissolution rate inhibitor with respect to said resin, and a propylene glycol alkyl ether acetate in an amount sufficient to act as a solvent for said resin and photosensitizer and to facilitate application of said resin and photosensitizer to said substrate.

Claim 13

Dependent Claim 78 words

A photosensitive solution suitable for application to a substrate to form a positive photoresist, which consists essentially of at least one novolak resin, at least one o-quinone diazide photosensitizer in an amount sufficient to act as a dissolution rate inhibitor with respect to said resin, and a propylene glycol alkyl ether acetate in an amount sufficient to act as a solvent for said resin and photosensitizer and to facilitate application of said resin and photosensitizer to said substrate.

Claim 14

Dependent Claim 14 words

The solution of claim 11 wherein said acetate is propylene glycol methyl ether acetate.

Claim 15

Dependent Claim 87 words

A photosensitive solution suitable for application to a substrate to form a positive photoresist consisting essentially of, in admixture, from about 15% to about 99% by weight, based on the solid parts of said solution, of at least one novolak resin, about 1% to about 85% by weight, based on the solid parts of said solution, of at least one o-quinone diazide photosensitizer, and from about 40% to about 90% by weight, based on the overall weight of the solution, of a propylene glycol alkyl ether acetate.

Claim 16

Dependent Claim 87 words

A photosensitive solution suitable for application to a substrate to form a positive photoresist consisting essentially of, in admixture, from about 15% to about 99% by weight, based on the solid parts of said solution, of at least one novolak resin, about 1% to about 85% by weight, based on the solid parts of said solution, of at least one o-quinone diazide photosensitizer, and from about 40% to about 90% by weight, based on the overall weight of the solution, of a propylene glycol alkyl ether acetate.

Claim 17

Dependent Claim 14 words

The solution of claim 13 wherein said acetate is propylene glycol methyl ether acetate.

Claim 18

Dependent Claim 32 words

The solution of claim 14 wherein said o-quinone diazide photosensitizer is present in an amount of from about 10% to about 50% by weight, based on the solid parts of said solution.

Claim 19

Dependent Claim 31 words

The solution of claim 15 wherein said novolak resin is present in an amount of from about 50% to about 90% by weight, based on the solid parts of said solution.

Claim 20

Dependent Claim 59 words

The solution of claim 16 wherein said novolak resin is present in an amount of from about 65% to about 85% by weight, based on the solid parts of said solution, and wherein said o-quinone diazide photosensitizer is present in an amount of from about 15% to about 35% by weight, based on the solid parts of said solution.

Claim 21

Dependent Claim 30 words

The solution of claim 15 wherein said acetate is present in an amount of from about 65% to about 70% by weight, based on the overall weight of the solution.

Claim 22

Dependent Claim 30 words

The solution of claim 13 wherein said acetate is present in an amount of from about 60% to about 83% by weight, based on the overall weight of the solution.

Claim 23

Dependent Claim 27 words

The solution of claim 13 further comprising one or more additives selected from the group consisting of colorants, anti-striation agents, plasticizers, adhesion promoters, speed enhancers, and surfactants.

Claim 24

Dependent Claim 10 words

A substrate coated with the photosensitive solution of claim 13.

Claim 25

Dependent Claim 38 words

The coated substrate of claim 21 wherein said substrate comprises one or more components selected from the group consisting of silicon, aluminum, polymeric resins, silicon dioxide, doped silicon dioxide, silicon nitride, tantalum, copper, polysilicon, ceramics and aluminum/copper mixtures.

Claim 26

Dependent Claim 60 words

A photosensitive positive working composition suitable for use as a photoresist, which consists essentially of, in admixture, at least one novolak resin, at least one o-quinone diazide photosensitizer and a solvent which consists essentially of a sufficient amount of a propylene glycol alkyl ether acetate to increase the effective photospeed of the composition without a substantial effect on development contrast.

Claim 27

Dependent Claim 60 words

A photosensitive positive working composition suitable for use as a photoresist, which consists essentially of, in admixture, at least one novolak resin, at least one o-quinone diazide photosensitizer and a solvent which consists essentially of a sufficient amount of a propylene glycol alkyl ether acetate to increase the effective photospeed of the composition without a substantial effect on development contrast.

Claim 28

Dependent Claim 18 words

The photosensitive positive working composition of claim 23 wherein said acetate component is propylene glycol methyl ether acetate.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1995-09-01	1996-03-02	1996-09-01	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	1999-09-01	2000-03-02	2000-09-01	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2003-09-01	2004-03-02	2004-09-01	$7700.00	Window Closed / Lapsed

Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate

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