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US4355094A Expired / Lapsed US ⏱️ 0.0 years remaining

Positive radiation sensitive resist terpolymers

Assignee: Intersil Corp
•
Filing: 1981-03-16
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Granted: 1982-10-19
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Expires: 2001-03-16
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Abstract

Abstract This invention relates to novel terpolymers of 3-methylcyclopentene, an omega alkynoic acid and sulfur dioxide. Positive radiation sensitive films prepared from the subject terpolymers adhere well to the substrate, demonstrate resistance to cracking and erosion during development and possess excellent edge definition.

Inventors

  • 👤 Thomas R. Pampalone
  • 👤 Kurt B. Kilichowski

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 16:41
CPC Classifications
C; C08; C08G; C08G75/00; C08G75/20; C08G75/205; C08G75/22; G; G03; G03F; G03F7/00; G03F7/004; G03F7/039

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 96 words
A method of forming a patterned layer on a substrate comprising: (a) coating the subject with a composition comprising a terpolymer comprising an organic monomer component and sulfur dioxide in a 1:1 molar ratio, said monomer component being comprised of 3-methylcyclopentene, and an omega alkynoic acid represented by the formula CH.tbd.C--(CH.sub.2).sub.n --COOH wherein n is an integer from 1 to 20, and a suitable solvent therefor; (b) drying said coating to form a positive recording medium; (c) irradiating selected portions of said medium and (d) developing the irradiated portions of said medium with a suitable developer.
Claim 2
Independent Claim 96 words
A method of forming a patterned layer on a substrate comprising: (a) coating the subject with a composition comprising a terpolymer comprising an organic monomer component and sulfur dioxide in a 1:1 molar ratio, said monomer component being comprised of 3-methylcyclopentene, and an omega alkynoic acid represented by the formula CH.tbd.C--(CH.sub.2).sub.n --COOH wherein n is an integer from 1 to 20, and a suitable solvent therefor; (b) drying said coating to form a positive recording medium; (c) irradiating selected portions of said medium and (d) developing the irradiated portions of said medium with a suitable developer.
Claim 3
Dependent Claim 26 words
The method in accordance with claim 1, wherein said composition contains from about 1 percent by weight to about 20 percent by weight of said terpolymer.
Claim 4
Dependent Claim 26 words
The method in accordance with claim 2, wherein said composition contains from about 6 percent by weight to about 10 percent by weight of said terpolymer.
Claim 5
Dependent Claim 14 words
The method in accordance with claim 1, wherein said solvent is 2-methoxyethylacetate or cyclopentanone.
Claim 6
Dependent Claim 19 words
A method in accordance with claim 1, wherein said medium is irradiated with a source of modulated electron beam.
Claim 7
Dependent Claim 16 words
A method in accordance with claim 1, wherein said development exposes corresponding portions of the substrate.
Claim 8
Dependent Claim 17 words
A method in accordance with claim 6 additionally including etching the exposed substrate with a suitable etchant.
Claim 9
Dependent Claim 65 words
A positive recording medium comprising a substrate and a radiation sensitive film applied to a surface of the substrate, said film comprised of a terpolymer comprising an organic monomer component and sulfur dioxide in a 1:1 molar ratio, said monomer component being comprised of 3-methylcyclopentene, and an omega alkynoic acid represented by the formula CH.tbd.C--(CH.sub.2).sub.n --COOH wherein n is an integer from 1 to 20.
Claim 10
Dependent Claim 65 words
A positive recording medium comprising a substrate and a radiation sensitive film applied to a surface of the substrate, said film comprised of a terpolymer comprising an organic monomer component and sulfur dioxide in a 1:1 molar ratio, said monomer component being comprised of 3-methylcyclopentene, and an omega alkynoic acid represented by the formula CH.tbd.C--(CH.sub.2).sub.n --COOH wherein n is an integer from 1 to 20.

References Cited (Backward Citations)

CA519503A Cited
CA610354A Cited
GB515196A Cited
US3898350A Cited
US3935332A Cited
US3935331A Cited
US4153741A Cited
US4097618A Cited
US4263385A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1985-10-18 1986-04-19 1986-10-19 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1989-10-18 1990-04-19 1990-10-19 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1993-10-18 1994-04-19 1994-10-19 $7700.00 Window Closed / Lapsed

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