US4097618A
Expired / Lapsed
US
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Method of transferring a surface relief pattern from a poly(1-methyl-1-cyclopropene sulfone) layer to a non-metallic inorganic layer
Assignee: RCA Corp
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Filing: 1977-03-09
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Granted: 1978-06-27
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Expires: 1997-03-09
Abstract
Abstract This invention relates to a method of transferring a surface relief pattern to a non-metallic inorganic layer wherein a surface relief pattern is formed in a wet poly(1-methyl-1-cyclopropene sulfone) layer and is then sputter etched into the non-metallic inorganic layer from the wet layer.
Inventors
- 👤 Eugene Samuel Poliniak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 17:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P50/73
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
92 words
A method for forming a surface relief pattern in a non-metallic inorganic layer which comprises: a. dissolving poly(1-methyl-1-cyclopropene sulfone) in a solvent; b. applying the resultant solution to the non-metallic inorganic layer to form a wet poly(1-methyl-1-cyclopropene sulfone) layer on the non-metallic inorganic layer; c. exposing the wet layer to a modulated beam of electrons; d. developing the exposed wet layer to form a surface relief pattern; e. bombarding the developed surface with sufficient ions to substantially remove the wet layer and form the surface relief pattern in the non-metallic inorganic layer.
Claim 2
Independent Claim
92 words
A method for forming a surface relief pattern in a non-metallic inorganic layer which comprises: a. dissolving poly(1-methyl-1-cyclopropene sulfone) in a solvent; b. applying the resultant solution to the non-metallic inorganic layer to form a wet poly(1-methyl-1-cyclopropene sulfone) layer on the non-metallic inorganic layer; c. exposing the wet layer to a modulated beam of electrons; d. developing the exposed wet layer to form a surface relief pattern; e. bombarding the developed surface with sufficient ions to substantially remove the wet layer and form the surface relief pattern in the non-metallic inorganic layer.
Claim 3
Dependent Claim
16 words
A method according to claim 1 wherein the non-metallic inorganic layer is an oxide of silicon.
Claim 4
Dependent Claim
15 words
A method according to claim 1 wherein the non-metallic inorganic layer is SiO 2 .
Claim 5
Dependent Claim
20 words
A method according to claim 1 wherein the wet polymer layer is from about 0.3 to about 1.0 micron thick.
Claim 6
Dependent Claim
15 words
A method according to claim 1 wherein the non-metallic inorganic layer is on a substrate.
Claim 7
Dependent Claim
16 words
A method according to claim 5 wherein the non-metallic inorganic layer is about 9000 angstroms thick.
Claim 8
Dependent Claim
11 words
A method according to claim 5 wherein the substrate is silicon.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-06-26 | 1981-12-26 | 1982-06-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-06-26 | 1985-12-26 | 1986-06-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-06-26 | 1989-12-26 | 1990-06-27 | $7700.00 | Window Closed / Lapsed |