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US5138407A Expired / Lapsed US ⏱️ 0.0 years remaining

Transistor made of 3-5 group semiconductor materials on a silicon substrate

Assignee: Thales SA
•
Filing: 1990-12-05
•
Granted: 1992-08-11
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Expires: 2010-12-05
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Abstract

Abstract The present invention concerns a transistor of semiconductor materials of the 3-5 group on silicon of the type comprising a silicon substrate, at least one layer of semi-insulating 3-5 material and several doped layers of 3-5 group semiconductor material in which is defined at least one conducting channel equipped with a gate metallization, each channel being situated between two access regions alternately known as source and drain, each source and drain regions with a metallization, one of the two access regions to a channel being electrically and thermally connected to the silicon substrate. In accordance with the invention, the transistor comprises between the silicon substrate and the semi-insulating layer of 3-5 group semiconductor material, at least one buffer layer of intrinsic silicon.

Inventors

  • 👤 Jean-Pierre Hirtz
  • 👤 Marie-Noelle Charasse
  • 👤 Thierry Pacou
  • 👤 Alain Bosella
  • 👤 Pierre Briere

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 19:44
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/80; H10D62/83; H10D62/82; H10D64/00; H10D64/20; H10D64/23; H10D64/251; H10D64/60; H10D64/62; H10W; H10W15/00; H10W15/01; H10W40/00; H10W40/10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/32; H10P14/3202; H10P14/3204; H10P14/3211; H10P14/3214; H10P14/3221; H10P14/3242; H10P14/3244; H10P14/3248; H10P14/34; H10P14/3402; H10P14/3414; H10P14/3418; H10P14/3421

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 95 words
A transistor comprising a silicon substrate, at least one layer of semi-insulating 3-5 group material and several doped layers of 3-5 group semiconductor material through which is defined at least one conducting channel equipped with a gate metallization, each channel being situated between two access regions known alternately as source and drain, each with a metallization, one of the two regions of access to a channel being electrically and thermally connected to the silicon substrate, between the silicon substrate and the semi-insulating layer of 3-5 group material, at least one buffer layer of intrinsic silicon.
Claim 2
Dependent Claim 95 words
A transistor comprising a silicon substrate, at least one layer of semi-insulating 3-5 group material and several doped layers of 3-5 group semiconductor material through which is defined at least one conducting channel equipped with a gate metallization, each channel being situated between two access regions known alternately as source and drain, each with a metallization, one of the two regions of access to a channel being electrically and thermally connected to the silicon substrate, between the silicon substrate and the semi-insulating layer of 3-5 group material, at least one buffer layer of intrinsic silicon.
Claim 3
Dependent Claim 18 words
The transistor according to claim 1, wherein the buffer layer of silicon is at least 10 μm thick.
Claim 4
Dependent Claim 19 words
The transistor according to claim 2, wherein the layer of semi-insulating 3-5 group material is about 4 μm thick.
Claim 5
Dependent Claim 21 words
The transistor according to claim 1, wherein the substrate is selected from the group consisting of N+ and P+ doped silicon.
Claim 6
Dependent Claim 54 words
The transistor according to claim 1, wherein the connection between one of the access regions and the silicon substrate is formed by a metal core which crosses the layers of 3-5 group semiconductor material and intrinsic silicon and makes an ohmic contact on the substrate at the interface with the layer of intrinsic silicon.
Claim 7
Dependent Claim 38 words
The transistor according to claim 1, wherein the 3-5 group semiconductor materials are selected from the group consisting of binary compositions of Ga, As, Al, In and P, and ternary compositions of Ga, As, Al, In and P.
Claim 8
Dependent Claim 96 words
A transistor having 3-5 group semiconductor material on silicon comprising a silicon substrate, at least one layer of semi-insulating 3-5 group material and several doped layers of 3-5 group semiconductor material with at least one conducting channel having a gate metallization, each channel being situated between source and drain regions, each source and drain region, with a metallization, one of said source and drain regions being electrically and thermally connected to the silicon substrate and having between the silicon substrate and the semi-insulating layer of 3-5 group material, at least one buffer layer of intrinsic silicon.
Claim 9
Dependent Claim 96 words
A transistor having 3-5 group semiconductor material on silicon comprising a silicon substrate, at least one layer of semi-insulating 3-5 group material and several doped layers of 3-5 group semiconductor material with at least one conducting channel having a gate metallization, each channel being situated between source and drain regions, each source and drain region, with a metallization, one of said source and drain regions being electrically and thermally connected to the silicon substrate and having between the silicon substrate and the semi-insulating layer of 3-5 group material, at least one buffer layer of intrinsic silicon.

References Cited (Backward Citations)

FR2026315A1 Cited
FR2207401A1 Cited
FR2464562A1 Cited
JPS62189761A Cited
US4774205A Cited
US4896194A Cited
US4845044A Cited
US4914053A Cited
US4826784A Cited
US4952527A Cited
US5016065A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-08-11 1996-02-10 1996-08-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-08-11 2000-02-10 2000-08-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-08-11 2004-02-10 2004-08-11 $7700.00 Window Closed / Lapsed

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