Method of manufacturing a semiconductor device by ion implantation through an ion-sensitive resist

Claim 1

A method of manufacturing a semiconductor device consisting essentially of the steps of (a) providing a semiconductor body, (b) providing an ion sensitive resist layer on a major surface of said semiconductor body, (c) implanting a beam of ions into a region of said semiconductor body through said layer of ion sensitive resist, said step of implanting being carried out by deflecting said beam across said major surface of said semiconductor body in a pattern corresponding to a deflection pattern, said beam of ions being of sufficient energy to be implanted into said semiconductor body in said pattern corresponding to said deflection pattern, wherein said implanting step further exposes at least a portion of said layer to said beam of ions at an area overlying said region simultaneously with said step of implanting into said region to thereby sensitize said portion of said layer in said pattern corresponding to said deflection pattern, (d) thereafter removing non-exposed areas of said layer by developing said ion-sensitive resist, and (e) using said ion exposed area overlying said region as a mask during subsequent processing.

Claim 2

A method of manufacturing a semiconductor device consisting essentially of the steps of (a) providing a semiconductor body, (b) providing an ion sensitive resist layer on a major surface of said semiconductor body, (c) implanting a beam of ions into a region of said semiconductor body through said layer of ion sensitive resist, said step of implanting being carried out by deflecting said beam across said major surface of said semiconductor body in a pattern corresponding to a deflection pattern, said beam of ions being of sufficient energy to be implanted into said semiconductor body in said pattern corresponding to said deflection pattern, wherein said implanting step further exposes at least a portion of said layer to said beam of ions at an area overlying said region simultaneously with said step of implanting into said region to thereby sensitize said portion of said layer in said pattern corresponding to said deflection pattern, (d) thereafter removing non-exposed areas of said layer by developing said ion-sensitive resist, and (e) using said ion exposed area overlying said region as a mask during subsequent processing.

Claim 4

A method according to claims 1 or 2, wherein said beam of ions is deflected in an annular or a grid-like pattern across said major surface.

Claim 5

A method of manufacturing a semiconductor device comprising the steps of (a) providing a semiconductor body, (b) providing an ion sensitive resist layer on a major surface of said semiconductor body, (c) implanting a beam of ions into a region of said semiconductor body through said layer of ion sensitive resist, said step of implanting being carried out by deflecting said beam across said major surface of said semiconductor body in a pattern corresponding to a deflection pattern, said beam of ions being of sufficient energy to be implanted into said semiconductor body, wherein said implanting step further exposes at least a portion of said layer to said beam of ions at an area overlying said region simultaneously with said step of implanting into said region to thereby sensitize said portion of said layer in said pattern corresponding to a deflection pattern, (d) thereafter removing non-exposed areas of said layer by developing said ion-sensitive resist, and (e) using said ion exposed area overlying said region as a mask during subsequent processing, wherein said beam of ions includes ions of a dopant of one conductivity type, said region being formed of said one conductivity type, and wherein said mask formed by said ion exposed area of said layer as provided in step (c) at least partly defines a lateral extent of another region of opposite conductivity type, said another region of opposite conductivity type being formed in said semiconductor body adjacent said region of said one conductivity type at a different time than said region of one conductivity type, wherein an insulating layer is formed between said layer of ion-sensitive resist and said major surface of said semiconductor body, wherein said beam of ions of said one conductivity type also penetrate said insulating layer, and wherein said ion exposed area of said layer is used as said mask during an etching step to remove said insulating layer below said non-exposed areas of said layer, said removed insulating layer creating a window to said semiconductor body, said window being subsequently used to introduce dopant of said opposite conductivity type to form said another region.

Claim 6

A method of manufacturing a semiconductor device comprising the steps of (a) providing a semiconductor body, (b) providing an ion sensitive resist layer on a major surface of said semiconductor body, (c) implanting a beam of ions into a region of said semiconductor body through said layer of ion sensitive resist, said step of implanting being carried out by deflecting said beam across said major surface of said semiconductor body in a pattern corresponding to a deflection pattern, said beam of ions being of sufficient energy to be implanted into said semiconductor body, wherein said implanting step further exposes at least a portion of said layer to said beam of ions at an area overlying said region simultaneously with said step of implanting into said region to thereby sensitize said portion of said layer in said pattern corresponding to a deflection pattern, (d) thereafter removing non-exposed areas of said layer by developing said ion-sensitive resist, and (e) using said ion exposed area overlying said region as a mask during subsequent processing, wherein said beam of ions includes ions of a dopant of one conductivity type, said region being formed of said one conductivity type, and wherein said mask formed by said ion exposed area of said layer as provided in step (c) at least partly defines a lateral extent of another region of opposite conductivity type, said another region of opposite conductivity type being formed in said semiconductor body adjacent said region of said one conductivity type at a different time than said region of one conductivity type, wherein an insulating layer is formed between said layer of ion-sensitive resist and said major surface of said semiconductor body, wherein said beam of ions of said one conductivity type also penetrate said insulating layer, and wherein said ion exposed area of said layer is used as said mask during an etching step to remove said insulating layer below said non-exposed areas of said layer, said removed insulating layer creating a window to said semiconductor body, said window being subsequently used to introduce dopant of said opposite conductivity type to form said another region.

Claim 10

A method of manufacturing a semiconductor device comprising the steps of (a) providing a semiconductor body, (b) providing an ion sensitive resist layer on a major surface of said semiconductor body, (c) implanting a beam of ions into a region of said semiconductor body through said layer of ion sensitive resist, said step of implanting being carried out by deflecting said beam across said major surface of said semiconductor body in a pattern corresponding to a deflection pattern, said beam of ions being of sufficient energy to be implanted into said semiconductor body, wherein said implanting step further exposes at least a portion of said layer to said beam of ions at an area overlying said region simultaneously with said step of implanting into said region to thereby sensitize said portion of said layer in said pattern corresponding to a deflection pattern, (d) thereafter removing non-exposed areas of said layer by developing said ion-sensitive resist, and (e) using said ion exposed area overlying said region as a mask during subsequent processing, wherein said beam of ions includes ions of a dopant of one conductivity type, said region being formed of said one conductivity type, and wherein said mask formed by said ion exposed area of said layer as provided in step (c) at least partly defines a lateral extent of another region of opposite conductivity type, said another region of opposite conductivity type being formed in said semiconductor body adjacent said region of said one conductivity type at a different time than said region of one conductivity type, wherein a bipolar transistor is formed by providing an emitter zone in said another region of said opposite conductivity type, and wherein said region of said one conductivity type forms a highly doped base zone laterally surrounding said emitter zone.

Claim 11

A method of manufacturing a semiconductor device comprising the steps of (a) providing a semiconductor body, (b) providing an ion sensitive resist layer on a major surface of said semiconductor body, (c) implanting a beam of ions into a region of said semiconductor body through said layer of ion sensitive resist, said step of implanting being carried out by deflecting said beam across said major surface of said semiconductor body in a pattern corresponding to a deflection pattern, said beam of ions being of sufficient energy to be implanted into said semiconductor body, wherein said implanting step further exposes at least a portion of said layer to said beam of ions at an area overlying said region simultaneously with said step of implanting into said region to thereby sensitize said portion of said layer in said pattern corresponding to a deflection pattern, (d) thereafter removing non-exposed areas of said layer by developing said ion-sensitive resist, and (e) using said ion exposed area overlying said region as a mask during subsequent processing, wherein said beam of ions includes ions of a dopant of one conductivity type, said region being formed of said one conductivity type, and wherein said mask formed by said ion exposed area of said layer as provided in step (c) at least partly defines a lateral extent of another region of opposite conductivity type, said another region of opposite conductivity type being formed in said semiconductor body adjacent said region of said one conductivity type at a different time than said region of one conductivity type, wherein a bipolar transistor is formed by providing an emitter zone in said another region of said opposite conductivity type, and wherein said region of said one conductivity type forms a highly doped base zone laterally surrounding said emitter zone.