US4347654A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of fabricating a high-frequency bipolar transistor structure utilizing permeation-etching
Assignee: National Semiconductor Corp
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Filing: 1980-06-18
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Granted: 1982-09-07
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Expires: 2000-06-18
Abstract
Abstract A method of fabricating a high-frequency bipolar transistor structure wherein the emitter, higher impurity concentration base, and lower impurity concentration base regions are defined in a single masking operation. Permeation etching is used to etch regions of an oxide layer under a layer of resist which defines regions of the higher impurity concentration thereby simultaneously defining the emitter and lower impurity concentration base regions. The higher impurity concentration base regions are formed by ion implantation of impurities through the unetched oxide regions. The resist is then removed and the lower impurity concentration base and emitters are formed through the resulting opening in the oxide. This results in the self-aligning of the emitter regions with respect to the base regions.
Inventors
- 👤 Bert L. Allen
- 👤 Robert L. Wourms
- 👤 Daniel C. Hu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 08:54
CPC Classifications
H; H10; H10P; H10P30/00; H10P30/20; H10P30/22; H10D; H10D10/00; H10D10/01; H10D10/051; H10P14/00; H10P14/60; H10P14/68; H10P14/683; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P76/00; H10P76/40; Y; Y10; Y10S; Y10S148/00; Y10S148/084
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
258 words
A method of fabricating a bipolar structure having emitter, higher impurity concentration base and lower impurity concentration base regions comprising the steps of: forming a first masking layer of silicon dioxide on the surface of a semiconductor substrate of a first conductivity type; forming a second masking layer of negative photoresist over said first masking layer; forming openings in said second masking layer exposing regions of said first masking layer which lie over those regions of said semiconductor substrate where said higher impurity concentration base regions are to be located: removing said first masking layer material located between the remaining portions of said second masking layer and said semiconductor substrate, using permeation-etching wherein said remaining portions define the area of said removal of said first making layer; forming said higher impurity concentration base regions by introducing impurities of a second conductivity type through said first masking layer into said semiconductor substrate to a first depth, using said remaining portions of said second masking layer to define the location of said higher impurity concentration base regions; removing said remaining portions of said second masking layer material thereby exposing areas of said semiconductor substrate; forming said lower impurity concentration base regions by introducing impurities of said second conductivity type into said exposed areas of said semiconductor substrate to a second depth; forming said emitter regions by introducing impurities of said first conductivity type into said exposed areas of said semiconductor substrate to a third depth; and providing contacts to said higher impurity concentration base regions and to said emitter regions.
Claim 2
Independent Claim
258 words
A method of fabricating a bipolar structure having emitter, higher impurity concentration base and lower impurity concentration base regions comprising the steps of: forming a first masking layer of silicon dioxide on the surface of a semiconductor substrate of a first conductivity type; forming a second masking layer of negative photoresist over said first masking layer; forming openings in said second masking layer exposing regions of said first masking layer which lie over those regions of said semiconductor substrate where said higher impurity concentration base regions are to be located: removing said first masking layer material located between the remaining portions of said second masking layer and said semiconductor substrate, using permeation-etching wherein said remaining portions define the area of said removal of said first making layer; forming said higher impurity concentration base regions by introducing impurities of a second conductivity type through said first masking layer into said semiconductor substrate to a first depth, using said remaining portions of said second masking layer to define the location of said higher impurity concentration base regions; removing said remaining portions of said second masking layer material thereby exposing areas of said semiconductor substrate; forming said lower impurity concentration base regions by introducing impurities of said second conductivity type into said exposed areas of said semiconductor substrate to a second depth; forming said emitter regions by introducing impurities of said first conductivity type into said exposed areas of said semiconductor substrate to a third depth; and providing contacts to said higher impurity concentration base regions and to said emitter regions.
Claim 3
Dependent Claim
22 words
The method of claim 1 wherein said semiconductor substrate is an epitaxial layer of doped silicon located on a doped silicon substrate.
Claim 4
Dependent Claim
82 words
The method of claim 2 wherein said step of removing said first masking layer material located between said remaining portions of said second masking layer and said semiconductor substrate comprises: inactivating said exposed regions of said first masking layer by exposing to an ionized gas for a short time prior to removing said first masking layer located between said remaining portions of said second masking layer and said semiconductor substrate by etching with hydrogen fluoride gas permeated through said second masking layer.
Claim 5
Dependent Claim
33 words
The method of claim 3 wherein the step of forming said higher impurity concentration base regions comprises implanting impurities of said second conductivity type into said semiconductor substrate through said first masking layer.
Claim 6
Dependent Claim
16 words
The method of claim 4 wherein the impurities of said first conductivity type comprises N-type impurities.
Claim 7
Dependent Claim
15 words
The method of claim 5 wherein the impurity of said second conductivity type comprises boron.
Claim 8
Dependent Claim
25 words
The method of claim 1 wherein said first depth is greater than said second depth and said second depth is greater than said third depth.
Claim 9
Dependent Claim
125 words
In a method of fabricating a bipolar transistor structure having emitters formed using a first silicon dioxide mask, lower impurity concentration base and higher impurity concentration base regions on a semiconductor substrate wherein the higher impurity concentration base regions are formed by ion-implantation through a second localized negative photoresist mask such that no implant damage is caused to regions of said semiconductor substrate wherein said emitter is to be located, the improvement comprising: defining said emitter, said lower impurity concentration base and said higher impurity concentration base regions in a single masking operation in which said first mask is created from said second mask using permeation-etching to etch said first mask in those areas covered by said second mask, thereby forming a self-aligned transistor structure.
Claim 10
Dependent Claim
125 words
In a method of fabricating a bipolar transistor structure having emitters formed using a first silicon dioxide mask, lower impurity concentration base and higher impurity concentration base regions on a semiconductor substrate wherein the higher impurity concentration base regions are formed by ion-implantation through a second localized negative photoresist mask such that no implant damage is caused to regions of said semiconductor substrate wherein said emitter is to be located, the improvement comprising: defining said emitter, said lower impurity concentration base and said higher impurity concentration base regions in a single masking operation in which said first mask is created from said second mask using permeation-etching to etch said first mask in those areas covered by said second mask, thereby forming a self-aligned transistor structure.
Claim 11
Dependent Claim
16 words
The method of claim 8 wherein said higher impurity concentration base regions are formed by ion-implantation.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-09-06 | 1986-03-08 | 1986-09-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-09-06 | 1990-03-08 | 1990-09-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-09-06 | 1994-03-08 | 1994-09-07 | $7700.00 | Window Closed / Lapsed |