Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use

Claim 2

In a photosensitive composition comprising a hydroxylated aromatic polyamide polymer normally having a large number of free hydroxyl groups and a high degree of solubility in aqueous alkaline developer solvents, the improvement which comprises such a polymer in which less than about 50% of the hydroxyl groups of said polymer are reacted with a naphthoquinone - (1.2) - diazide - sulfonyl chloride photosensitizer to bind the photosensitizer to the polymer and form a unitary photosensitive polyamide polymer having a predetermined low degree of solubility in aqueous alkaline developer solvents in unexposed areas, providing reduced dark film loss and increased resolution, a predetermined degree of photosensitivity, and a predetermined moderate degree of solubility in alkaline developer solvents in areas exposure to ultraviolet radiation, wherein said hydroxylated, polymer comprises a hydroxylated polyamide which, prior to reaction with the said photosensitizer, has the general structure: ##STR8## wherein X is S, SO 2 , direct link, phenyl, ##STR9## and R is --CF, or phenyl, and n is a number sufficiently high to provide an inherent viscosity of at least about 0.2 as measured from a 0.5 wt % solution in dimethylacetamide at 25° C., and said reaction product thereof has the general structure: ##STR10## where X, R and n are as defined above, and the ratio of a to b ranges between 3:1 and 5:1.

Claim 3

A photosensitive composition according to claim 1 in which said hydroxylated polyamide comprises a plurality of fluorinated alkyl linking groups whereby said polymer has high thermal resistance properties.

Claim 4

A process for producing unitary photosensitive compositions comprising hydroxylated aromatic polyamides having a predetermined low degree of solubility in aqueous alkaline developer solvents in unexposed areas providing reduced dark film less and increased resolution, a predetermined degree of photosensitivity and a predetermined moderate degree of solubility in alkaline developer solvents in areas exposed to ultraviolet radiation, which comprises reacting a non-photosensitive hydroxylated aromatic polyamide polymer normally having a large number of free hydroxyl groups and a high degree of solubility in alkaline developer solvents with a predetermined amount of a naphthoquinone - (1.2) - diazide - sulfonyl chloride photosensitizer in order to bind the photosensitizer to less than about 50% of the hydroxyl groups present in the polyamide polymer and render the polymer photosensitive, and less soluble in aqueous alkaline developer solvents in unexposed areas after exposure to ultraviolet radiation, thereby providing reduced dark film less and increased resolution, wherein said hydroxylated polymer comprises a hydroxylated polaymide which, prior to reaction with the said photosensitizer, has the general structure: ##STR11## wherein X is S, SO 2 , direct link, phenyl, ##STR12## and R is CF 3 or phenyl, and n is a number sufficiently high to provide an inherent viscosity of at least about 0.2 as measured from a 0.5 wt % solution in dimethylacetamide at 25° C., and said reaction product thereof has the general structure: ##STR13## wherein X, R and n are as defined herein above, and the ratio of a to b ranges between 3:1 and 5:1.

Claim 5

A process for producing unitary photosensitive compositions comprising hydroxylated aromatic polyamides having a predetermined low degree of solubility in aqueous alkaline developer solvents in unexposed areas providing reduced dark film less and increased resolution, a predetermined degree of photosensitivity and a predetermined moderate degree of solubility in alkaline developer solvents in areas exposed to ultraviolet radiation, which comprises reacting a non-photosensitive hydroxylated aromatic polyamide polymer normally having a large number of free hydroxyl groups and a high degree of solubility in alkaline developer solvents with a predetermined amount of a naphthoquinone - (1.2) - diazide - sulfonyl chloride photosensitizer in order to bind the photosensitizer to less than about 50% of the hydroxyl groups present in the polyamide polymer and render the polymer photosensitive, and less soluble in aqueous alkaline developer solvents in unexposed areas after exposure to ultraviolet radiation, thereby providing reduced dark film less and increased resolution, wherein said hydroxylated polymer comprises a hydroxylated polaymide which, prior to reaction with the said photosensitizer, has the general structure: ##STR11## wherein X is S, SO 2 , direct link, phenyl, ##STR12## and R is CF 3 or phenyl, and n is a number sufficiently high to provide an inherent viscosity of at least about 0.2 as measured from a 0.5 wt % solution in dimethylacetamide at 25° C., and said reaction product thereof has the general structure: ##STR13## wherein X, R and n are as defined herein above, and the ratio of a to b ranges between 3:1 and 5:1.

Claim 6

A process according to claim 3 in which said hydroxylated polyamide comprises a plurality of fluorinated alkyl linking groups whereby said polymer has high thermal resistance properties.