US4093461A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive working thermally stable photoresist composition, article and method of using
Assignee: Shipley Co Inc
•
Filing: 1975-07-18
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Granted: 1978-06-06
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Expires: 1995-07-18
Abstract
Abstract A positive working, thermally stable photoresist, comprising a light-sensitive orthoquinone diazide or naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine, and a support carrying a layer of said photoresist. After exposure, the image is developed in the layer with an alkaline aqueous developer and is unaffected by heating to 500 DEG C, thus allowing the use of the photoresist layer for plasma and sputter-etching as well as ion implantation.
Inventors
- 👤 Frank J. Loprest
- 👤 Eugene F. McInerney
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 02:07
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233
Claims Analysis
Total Claims: 25
Claim 1
Independent Claim
32 words
A positive working photoresist composition, comprising a mixture of a light-sensitive orthoquinone diazide or ortho naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine.
Claim 2
Dependent Claim
32 words
A positive working photoresist composition, comprising a mixture of a light-sensitive orthoquinone diazide or ortho naphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine.
Claim 3
Dependent Claim
22 words
The photoresist composition according to claim 1, wherein said polyamic acid condensation product is the condensation product of pyromellitic dianhydride and 4,4'-amino-diphenylether.
Claim 4
Dependent Claim
23 words
The photoresist composition according to claim 1, wherein the weight ratio of polyamic acid to diazide is from about 1:20 to about 10:1.
Claim 5
Dependent Claim
13 words
The photoresist composition according to claim 1, wherein said diazide is N-dehydroabietyl-6(5H)-diazo-5(6H)-oxo-1-naphthalene sulfonamide.
Claim 6
Dependent Claim
19 words
The photoresist composition according to claim 1, wherein said diazide and said polyamic acid are solution an organic solvent.
Claim 7
Dependent Claim
37 words
A photosensitive material, comprising a mixture of a support having coated thereon a layer comprising a light-sensitive orthoquinone diazide or orthonaphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine.
Claim 8
Dependent Claim
37 words
A photosensitive material, comprising a mixture of a support having coated thereon a layer comprising a light-sensitive orthoquinone diazide or orthonaphthoquinone diazide and a polyamic acid condensation product of an aromatic dianhydride and an aromatic di-primary amine.
Claim 9
Dependent Claim
21 words
The article according to claim 6, wherein said polyamic acid condensation product is the condensation product of pyromellitic dianhydride and 4,4'-amino-diphenylether.
Claim 10
Dependent Claim
22 words
The article according to claim 6, wherein the weight ratio of polyamic acid to diazide is from about 1:20 to about 10:1.
Claim 11
Dependent Claim
12 words
The article according to claim 6, wherein said diazide is N-dehydroabietyl-6(5H)-diazo-5(6H)-oxo-1-naphthalene sulfonamide.
Claim 12
Dependent Claim
11 words
The article according to claim 6, wherein said support is glass.
Claim 13
Dependent Claim
13 words
The article according to claim 6, wherein said support is a metallic plate.
Claim 14
Dependent Claim
13 words
The article according to claim 6, wherein said support is a semiconductor wafer.
Claim 15
Dependent Claim
46 words
A method of forming a thermally stable positive photoresist image, which comprises imagewise exposing to actinic light the photosensitive material according to claim 6, and developing a positive relief image by treating the exposed layer with an alkaline aqueous developer thereby removing the imagewise exposed areas.
Claim 16
Dependent Claim
37 words
The method according to claim 13, wherein the layer is heated after development to a temperature of at least about 200° C to convert the polyamic acid condensation product in the developed image to the polyimide form.
Claim 17
Dependent Claim
29 words
The method according to claim 14, wherein the layer is given an overall exposure to actinic light after development and before heating to decompose diazide in the developed image.
Claim 18
Dependent Claim
18 words
The method according to claim 13, wherein the developer is an alkaline aqueous solution of an organic base.
Claim 19
Dependent Claim
12 words
The method according to claim 16, wherein the organic base is diethylethanolamine.
Claim 20
Dependent Claim
21 words
The method according to claim 13, wherein said polyamic acid condensation product is the condensation product of pyromellitic dianhydride and 4,4'-aminodiphenylether.
Claim 21
Dependent Claim
22 words
The method according to claim 13, wherein the weight ratio of polyamic acid to diazide is from about 1:20 to about 10:1.
Claim 22
Dependent Claim
12 words
The method according to claim 13, wherein said diazide is N-dehydroabietyl-6(5H)-diazo-5(6H)-oxo-1-naphthalene sulfonamide.
Claim 23
Dependent Claim
11 words
The method according to claim 13, wherein said support is glass.
Claim 24
Dependent Claim
13 words
The method according to claim 13, wherein said support is a metallic plate.
Claim 25
Dependent Claim
13 words
The method according to claim 13, wherein said support is a semiconductor wafer.
References Cited (Backward Citations)
US3050389A
Cited
US3126281A
Cited
US3179634A
Cited
US3495979A
Cited
US3551154A
Cited
US3802885A
Cited
US3637384A
Cited
US3623870A
Cited
US3712814A
Cited
US3759711A
Cited
US3732105A
Cited
US3833436A
Cited
US3871930A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-06-05 | 1981-12-05 | 1982-06-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-06-05 | 1985-12-05 | 1986-06-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-06-05 | 1989-12-05 | 1990-06-06 | $7700.00 | Window Closed / Lapsed |