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Patent US4940651A successfully refreshed from Google Patents.
US4940651A
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Method for patterning cationic curable photoresist
Assignee: International Business Machines Corp
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Filing: 1988-12-30
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Granted: 1990-07-10
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Expires: 2008-12-30
Abstract
Abstract Cationic curable photoresists are patterned by exposing such to a laser beam in a pattern, followed by developing.
Inventors
- 👤 Lawrence M. Brown
- 👤 Jeffrey D. Gelorme
- 👤 Joseph P. Kuczynski
- 👤 William H. Lawrence
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 21:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2051; G03F7/2053; G03F7/004; G03F7/038; G03F7/0385; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0082; H05K3/22; H05K3/28; H05K3/285; H05K3/287; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
85 words
A method for patterning a photoresist which comprises: a. providing on a substrate an uncured film consisting essentially of a cationic curable photoresist and an onium slat photoinitiator; b. imagewise exposing said photoresist to a laser beam operated at wavelengths of about 333 nanometers to about 365 nanometers in a pattern to thereby cure portions of said photoresist by cationic polymerization; and c. developing said photoresist by contacting with a solvent to thereby remove the portions of the photoresist not exposed to said laser beam.
Claim 2
Independent Claim
85 words
A method for patterning a photoresist which comprises: a. providing on a substrate an uncured film consisting essentially of a cationic curable photoresist and an onium slat photoinitiator; b. imagewise exposing said photoresist to a laser beam operated at wavelengths of about 333 nanometers to about 365 nanometers in a pattern to thereby cure portions of said photoresist by cationic polymerization; and c. developing said photoresist by contacting with a solvent to thereby remove the portions of the photoresist not exposed to said laser beam.
Claim 3
Dependent Claim
12 words
The method of claim 1 wherein laser is an argon ion laser.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein said cationic curable photoresist includes an epoxy polymer.
Claim 5
Dependent Claim
30 words
The method of claim 1 wherein said cationic curable photoresist includes an epoxy selected from the group of epoxidized novolak polymers, polyepoxides from epichlorohydrin and bisphenol A, and mixtures thereof.
Claim 6
Dependent Claim
17 words
The method of claim 1 wherein said cationic curable photoresist includes an octanfunctional bisphenol A epoxy novolak.
Claim 7
Dependent Claim
22 words
The method of claim 1 wherein said film of cationic curable photoresist is provided on said substrate by laminating a dry film.
Claim 8
Dependent Claim
102 words
The method of claim 1 wherein said film of cationic curable photoresist contains: a. about 69% to about 79% by weight of an octafunctional bisphenol A epoxy novolak; b. about 15% to about 17% by weight of a difunctional cycloaliphatic epoxy; c. about 4% to about 6% by weight of a trifunctional epoxy; d. about 2.9% to about 6.9% by weight of a photoinitiator; e. 0% to about 0.15% by weight of a surfactant f. 0% to about 0.15% by weight of a fluorinated surfactant; the above amounts are based upon the total weight of the solids content of the photosensitive layer.
Claim 9
Dependent Claim
28 words
The method of claim 7 wherein b is represented by the fomula: ##STR13## c is represented by the formula: ##STR14## and d is represented by the formula: ##STR15##
Claim 10
Dependent Claim
21 words
The method of claim 1 wherein said solvent is selected from the group of gamma-butyrolactone, propylene carbonate, diglyme or mixtures thereof.
Claim 11
Dependent Claim
22 words
The method of claim 1 wherein said solvent is selected from the group of mixtures of 1,1,1-trichloroethane with propylene carbonate or gamma-butyrolactone.
Claim 12
Dependent Claim
10 words
The method of claim 1 wherein said solvent includes gamma-butyrolactone.
Claim 13
Dependent Claim
21 words
The method of claim 4 wherein said solvent is selected from the group of gamma-butyrolactone, propylene carbonate, diglyme or mixtures thereof.
Claim 14
Dependent Claim
22 words
The method of claim 4 wherein said solvent is selected from the group of mixtures of 1,1,1-trichloroethane with propylene carbonate or gamma-butyrolactone.
Claim 15
Dependent Claim
9 words
The method claim 4 wherein said solvent includes gamma-butyrolactone.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-07-09 | 1994-01-08 | 1994-07-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-07-09 | 1998-01-08 | 1998-07-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-07-09 | 2002-01-08 | 2002-07-10 | $7700.00 | Window Closed / Lapsed |