Photosolubilizable compositions containing novolac phenolic resin

Claim 2

A radiation-sensitive composition comprising an alkali-soluble novolac phenolic resin and a radiation-sensitive onium salt, characterised in that the composition is photosolubilisable and that the onium salt is selected from the class consisting of iodonium, sulphonium, phosphonium, bromonium, chloronium, oxysulphoxonium, oxysulphonium, sulphoxonium, selenonium, telluronium and arsonium salts and the onium salt is present in an amount from 1 to 40% by weight of the total weight of phenolic resin and onium salt, the interaction of the phenolic resin and onium salt producing an aqueous solvent resistant composition to which is restored the alkali-solubility of the phenolic resin upon the photolytic decomposition of the onium salt, all the resin within said composition being without acetal or ketal groups necessary to photosolubilise the composition.

Claim 3

A composition as claimed in claim 1, characterised in that the resin is a resole resin and the onium salt is present in an amount from 5 to 40% by weight of the total weight of phenolic resin and onium salt.

Claim 4

A composition as claimed in claim 1 characterised in that the onium salt has one of the following formulae: ##STR29## in which: at least one of R 1 , R 2 and R 3 is an optionally substituted aromatic group, Q is a carbon-to-carbon bond or a linking group selected from ##STR30## in which R 4 and R 5 are independently selected from H, an alkyl group having from 1 to 4 carbon atoms, and an alkenyl group having from 2 to 4 carbon atoms, and R 6 is an aryl group having from 6 to 20 carbon atoms or an acyl group having from 2 to 20 carbon atoms; and X.sup.⊖ is an anion, ##STR31## in which: Ar 1 and Ar 2 independently represent aromatic groups which are optionally substituted and optionally linked together to include the iodine atom within a ring structure; and X.sup.⊖ represents an anion, ##STR32## in which R 1 to R 3 are as defined above, with the exception that each of R 1 to R 3 may represent optionally substituted aliphatic groups, ##STR33## in which R 1 to R 3 are as defined above, with the exception that each of R 1 to R 3 may represent optionally substituted aliphatic groups, ##STR34## in which R 1 to R 3 are as defined above, with the exception that each of R 1 to R 3 may represent optionally substituted aliphatic groups, and a polymer including the monomeric units of the formula: ##STR35## in which X.sup.⊖ is an anion.

Claim 5

A composition as claimed in claim 3, characterised in that the anion is selected from halide, H 2 SO 4 .sup.⊖, R 8 CO 2 .sup.⊖, in which R 8 represents an alkyl which may be substituted or not or phenyl group which may be substituted or not, and a halogen-containing complex ion.

Claim 6

A composition as claimed in claim 1 additionally comprising a spectral sensitiser in an amount up to 10% by weight of the total weight of phenolic resin, onium salt and spectral sensitiser.

Claim 7

A composition as claimed in claim 5, characterised in that the spectral sensitiser is selected from one of the following classes diphenylmethane, xanthene, acridine, methine and polymethine (including oxonol, cyanine and merocyanine) dye, thiazole, thiazine, azine, aminoketone, porphyrin, coloured aromatic polycyclic hydrocarbon, p-substituted aminostyryl compound, aminotriazyl methane, polyarylene, polyarylpolyene, 2,5-diphenylisobenzofuran, 2,5-diarylcyclopentadiene, diarylfuran, diarylthiofuran, diarylpyrrole, polyarylphenylene, coumarin and polyaryl-2-pyrazoline.

Claim 8

A composition as claimed in claim 5 characterised in that the spectral sensitiser has the formula: ##STR36## in which: R 7 represents an alkyl group of 1 to 6 carbon atoms, Y.sup.⊖ represents 4-perfluoroethylcyclohexylsulphonate or ClO 4 .sup.⊖, and p is 1 or 2.

Claim 9

A composition as claimed in claim 1 additionally comprising an amine in an amount up to 25% by weight of the total weight of phenolic resin, onium salt and amine.

Claim 10

A composition as claimed in claim 8, characterised in that the molar ratio of amine to onium salt is approximately 1:1.

Claim 11

A composition as claimed in claim 8 characterised in that the amine is tri-n-butylamine or bis(4-dimethylaminophenyl)methane.

Claim 12

A radiation-sensitive element comprising a layer of the composition of claim 1 coated on a substrate.

Claim 13

An element as claimed in claim 11, characterised in that the substrate is paper, aluminium, copper, copper-epoxy laminated board, polyester film or silica.

Claim 14

A radiation-sensitive composition comprising an alkali-soluble novolac phenolic resin and a radiation-sensitive onium salt, characterised in that the composition is photosolubilisable and in that the onium salt is selected from iodonium, sulphonium, phosphonium, bromonium, chloronium, oxysulphoxonium, oxysulphonium, sulphoxonium, selenonium, tellurium and arsonium salts, and in that the onium salt is present in an amount from 1 to 40% by weight of the total weight of phenolic resin and onium salt, all the resin within said composition being without actal or ketal groups necessary to photosolubilise the composition.

Claim 15

A radiation-sensitive composition comprising an alkali-soluble novolac phenolic resin and a radiation-sensitive onium salt, characterised in that the composition is photosolubilisable and in that the onium salt is selected from iodonium, sulphonium, phosphonium, bromonium, chloronium, oxysulphoxonium, oxysulphonium, sulphoxonium, selenonium, tellurium and arsonium salts, and in that the onium salt is present in an amount from 1 to 40% by weight of the total weight of phenolic resin and onium salt, all the resin within said composition being without actal or ketal groups necessary to photosolubilise the composition.

Claim 16

A radiation-sensitive composition comprising an alkali-soluble novolac phenolic resin and a radiation-sensitive onium salt, characterised in that the composition is photosolubilisable and that the onium salt is diphenyliodonium hexafluorophosphate and the onium salt is present in an amount from 1 to 40% by weight of the total weight of phenolic resin and onium salt, the interaction of the phenolic resin and onium salt producing an aqueous solvent resistant composition to which is restored the alkalisolubility of the phenolic resin upon the photolytic decomposition of the onium salt, all of the resins within said composition being without acetal or ketal groups necessary to photosolubilize the composition.

Claim 17

A radiation-sensitive composition comprising an alkali-soluble novolac phenolic resin and a radiation-sensitive onium salt, characterised in that the composition is photosolubilisable and that the onium salt is diphenyliodonium hexafluorophosphate and the onium salt is present in an amount from 1 to 40% by weight of the total weight of phenolic resin and onium salt, the interaction of the phenolic resin and onium salt producing an aqueous solvent resistant composition to which is restored the alkalisolubility of the phenolic resin upon the photolytic decomposition of the onium salt, all of the resins within said composition being without acetal or ketal groups necessary to photosolubilize the composition.