US4844832A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Containing an arylsulfonic acid, a phenol and a naphalenic solvent
Assignee: Tokyo Ohka Kogyo Co Ltd
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Filing: 1988-02-03
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Granted: 1989-07-04
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Expires: 2008-02-03
Abstract
Abstract The remover solution for photoresist layers comprises: (a) from 30 to 70% by weight of an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70 DEG C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid. The remover solution is effective for a variety of photoresist compositions with less problems in respect to the workers' health and danger of fire and explosion than conventional remover solutions.
Inventors
- 👤 Masakazu Kobayashi
- 👤 Shingo Asaumi
- 👤 Akira Yokota
- 👤 Hisashi Nakane
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 18:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426; C; C09; C09D; C09D9/00; C09D9/005
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
80 words
A remover solution for photoresist consisting of: (a) from 30 to 70% by weight or an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70° C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid.
Claim 2
Dependent Claim
80 words
A remover solution for photoresist consisting of: (a) from 30 to 70% by weight or an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70° C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid.
Claim 3
Dependent Claim
33 words
The remover solution as claimed in claim 1 wherein the phenolic compound is selected from the group consisting of phenol, catechol and alkyl phenols having 10 to 20 carbon atoms in a molecule.
Claim 4
Dependent Claim
26 words
The remover solution as claimed in claim 2 wherein the alkyl phenol is selected from the group consisting of 4-tert-butyl phenol, 4-tert-butyl catechol and nonyl phenols.
Claim 5
Dependent Claim
35 words
The remover solution as claimed in claim 1 wherein the arylsulfonic acid is selected from the group consisting of benzene sulfonic acid and alkylbenzene sulfonic acids having 7 to 20 carbon atoms in a molecule.
Claim 6
Dependent Claim
17 words
The remover solution as claimed in claim 4 wherein the alkylbenzene sulfonic acid is dodecylbenzene sulfonic acid.
Claim 7
Dependent Claim
42 words
The remover solution as claimed in claim 1 wherein the amounts of the components (a), (b) and (c) are in the ranges from 50 to 65% by weight, from 10 to 20% by weight and from 15 to 30% by weight, respectively.
Claim 8
Independent Claim
95 words
A method for removing a photoresist layer on a substrate surface which comprises dipping the substrate in a remover solution consisting of: (a) from 30 to 70% by weight of an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70° C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid.
Claim 9
Independent Claim
95 words
A method for removing a photoresist layer on a substrate surface which comprises dipping the substrate in a remover solution consisting of: (a) from 30 to 70% by weight of an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70° C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-07-03 | 1993-01-02 | 1993-07-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-07-03 | 1997-01-02 | 1997-07-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-07-03 | 2001-01-02 | 2001-07-04 | $7700.00 | Window Closed / Lapsed |