US3582401A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photosensitive resist remover compositions and methods
Assignee: Mallinckrodt Chemical Works
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Filing: 1967-11-15
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Granted: 1971-06-01
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Expires: 1987-11-15
Abstract
Abstract COMPOSITIONS FOR REMOVING PHOTOSENSITIVE RESISTS FROM SILICON OR ALUMIMUN SUBSTRATES IN PHOTOLITHOGRAPHIC APPLICATION CONTAIN AN ARYLSULFONIC ACID (TOLUENESULFONIC ACID, XYLENESULFONIC ACID), A PHENOL(PHENOL,CRESOL, CHLOROPHENOL) EITHER ALONE OR WITH UP TO 75% BY WEIGHT OF THE TOTAL COMPOSITION OF A HALOGENATED DILUENT, (O-DICHLOROBENZENE, TETRACHLOROETHYLENE). AN ARYLSULFONIC ACID/ PHENOL RATIO OF ABOUT 1, WITH ABOUT 50% DIULENT, IS PREFERRED.
Inventors
- 👤 John J Berilla
- 👤 John H Birk
- 👤 John A Caughlan
- 👤 Richard H Lalumondier
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 17:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-05-31 | 1974-11-30 | 1975-06-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-05-31 | 1978-11-30 | 1979-06-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-05-31 | 1982-11-30 | 1983-06-01 | $7700.00 | Window Closed / Lapsed |