US4221674A
Expired / Lapsed
US
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Organic sulfonic acid stripping composition and method with nitrile and fluoride metal corrosion inhibitor system
Assignee: Hmc Patents Holding Co Inc
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Filing: 1979-03-09
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Granted: 1980-09-09
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Expires: 1999-03-09
Abstract
Abstract Improved organic stripping compositions useful in removing polymeric organic substances, such as photoresist, from metal substrates which comprise one or more organic sulfonic acids, one or more organic solvents and, optionally phenol. The inhibitors system includes 5 to 300 ppm by weight of fluoride per weight of composition and between about 0.01 and about 5 weight percent of a nitrile compound such as acetonitrile or malononitrile.
Inventors
- 👤 John E. Vander Mey
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 17:31
CPC Classifications
C; C11; C11D; C11D1/00; C11D1/02; C11D1/12; C11D1/22; C09; C09D; C09D9/00; C11D3/00; C11D3/0005; C11D3/0073; C11D3/02; C11D3/04; C11D3/046; C11D3/16; C11D3/26; C11D3/34; C11D3/3418; C23; C23G; C23G5/00; C23G5/02
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
167 words
An improved organic stripping composition for removing polymeric organic substances from metallized inorganic substrates comprising at least one organic sulfonic acid of the formula R--SO 3 H where R is an organic radical selected from the group consisting of alkyl containing 1 to 18 carbon atoms, monohydroxyalkyl containing 1 to 18 carbon atoms, aryl containing 6 to 10 carbon atoms, monoalkylaryl wherein the alkyl group contains 1 to 14 carbon atoms, dialkylaryl wherein each alkyl group contains 1 to 4 carbon atoms, monohydroxyaryl containing 6 to 10 carbon atoms, monoalkyl-hydroxyaryl containing 7 to 11 carbon atoms and monochloro-hydroxyaryl containing 6 to 10 carbon atoms, optionally at least one organic solvent and an inhibitor system including about 5 to about 300 ppm by weight of fluoride by weight of composition, the improvement wherein the inhibitor system also includes about 0.01 to about 5% percent by weight of composition of a nitrile compound of the formula H--R--CN or of the formula NC--R--CN, where R is alkylene, arylene or alkylarylene.
Claim 2
Dependent Claim
167 words
An improved organic stripping composition for removing polymeric organic substances from metallized inorganic substrates comprising at least one organic sulfonic acid of the formula R--SO 3 H where R is an organic radical selected from the group consisting of alkyl containing 1 to 18 carbon atoms, monohydroxyalkyl containing 1 to 18 carbon atoms, aryl containing 6 to 10 carbon atoms, monoalkylaryl wherein the alkyl group contains 1 to 14 carbon atoms, dialkylaryl wherein each alkyl group contains 1 to 4 carbon atoms, monohydroxyaryl containing 6 to 10 carbon atoms, monoalkyl-hydroxyaryl containing 7 to 11 carbon atoms and monochloro-hydroxyaryl containing 6 to 10 carbon atoms, optionally at least one organic solvent and an inhibitor system including about 5 to about 300 ppm by weight of fluoride by weight of composition, the improvement wherein the inhibitor system also includes about 0.01 to about 5% percent by weight of composition of a nitrile compound of the formula H--R--CN or of the formula NC--R--CN, where R is alkylene, arylene or alkylarylene.
Claim 3
Dependent Claim
17 words
The stripping composition of claim 1 comprising between about 0.05 and about 1 weight percent nitrile compound.
Claim 4
Dependent Claim
17 words
The stripping composition of claim 2 comprising between about 0.1 and about 0.3 weight percent nitrile compound.
Claim 5
Dependent Claim
17 words
The stripping composition of claim 1 containing between about 0.01 and about 0.5 weight percent nitrile compound.
Claim 6
Dependent Claim
17 words
The stripping composition of claim 4 containing between about 0.05 and about 0.3 weight percent nitrile compound.
Claim 7
Dependent Claim
11 words
The composition of claim 1 wherein said nitrile compound is acetonitrile.
Claim 8
Dependent Claim
12 words
The stripping composition of claim 1 wherein said nitrile compound is malonitrile.
Claim 9
Dependent Claim
11 words
The composition of claim 1 wherein said nitrile compound is adiponitrile.
Claim 10
Dependent Claim
11 words
The stripping composition of claim 1 being free of phenolic compounds.
Claim 11
Dependent Claim
14 words
The stripping composition of claim 9 wherein said organic solvent includes chlorinated hydrocarbon compounds.
Claim 12
Dependent Claim
12 words
The stripping composition of claim 9 being free of chlorinated hydrocarbon compounds.
Claim 13
Dependent Claim
43 words
The stripping composition of claim 1 wherein said sulfonic acid includes, as the predominant stripping agent, at least one sulfonic acid selected from the group consisting of benzene sulfonic acid, toluene sulfonic acid, cumene sulfonic acid, decylbenzene sulfonic acid and dodecylbenzene sulfonic acid.
Claim 14
Independent Claim
45 words
A method of stripping a polymeric organic substance from a metallized inorganic substrate comprising contacting the polymeric organic substance with the stripping composition of any of claims 2, 4, 6, 7, 8, 9 or 11 at a temperature of about 20° to about 180° C.
Claim 15
Dependent Claim
40 words
The method of claim 13 wherein said polymeric organic substance is a photoresist which comprises a polymer selected from the group consisting of polyisoprene, polyvinylcinnamate and phenol-formaldehyde resins, and wherein the inorganic substrate is silicon with a silicon dioxide coating.
Claim 16
Dependent Claim
38 words
A method of stripping a polymeric organic substance selected from the group consisting of polyisoprene, polyvinylcinnamate and phenol formaldehyde resins from a metallized inorganic substrate comprising contacting the polymeric organic substance with the stripping composition of claim 1.
Claim 17
Dependent Claim
16 words
The method of claim 15 wherein the inorganic substrate is covered with a pattern of aluminum.
Claim 18
Dependent Claim
16 words
The method of claim 15 wherein the inorganic substrate is covered with a pattern of titanium.
Claim 19
Dependent Claim
28 words
The method of claim 15 wherein the polymeric organic substance is a phenol-formaldehyde resin and the stripping composition contains between about 0.01 and about 0.5 weight percent nitrile.
Claim 20
Dependent Claim
19 words
The method of claim 18 wherein the stripping composition contains between about 0.05 and about 0.3 weight percent nitrile.
Claim 21
Dependent Claim
27 words
The method of claim 18 wherein the polymeric organic substance has been baked on the substrate at a temperature between about 120° C. and about 180° C.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-09-09 | 1984-03-10 | 1984-09-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-09-09 | 1988-03-10 | 1988-09-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-09-09 | 1992-03-10 | 1992-09-09 | $7700.00 | Window Closed / Lapsed |