Organic stripping compositions and method for using same

Claim 2

An improved organic stripping composition capable of removing polymeric organic substances from aluminized silicon dioxide substrates without dulling or corrosion of the aluminum surface, whereon such polymeric substances are deposited as photoresist materials, comprising at least one organic sulfonic acid of the following formula: R-SO 3 H wherein R is an organic radical selected from the group consisting of alkyl containing 1 to 18 carbon atoms, monohydroxyalkyl containing 1 to 18 carbon atoms, aryl containing 6 to 10 carbon toms, monoalkylaryl wherein the alkyl group contains 1 to 14 carbon atoms, dialkylaryl wherein each alkyl group contains 1 to 4 carbon atoms, monohydroxyaryl containing 6 to 10 carbon atoms, monoalkylhydroxyaryl containing 7 to 11 carbon atoms and monochloro-hydroxyaryl containing 6 to 10 carbon atoms and at least one organic solvent, wherein the improvement comprises incorporating fluoride ion in an amount of about 5 to 250 ppm by weight of the composition.

Claim 3

The composition of claim 1 wherein the amount of fluoride ion is about 10 to 200 ppm.

Claim 4

The composition of claim 1 wherein the amount of fluoride ion is about 15 to 100 ppm.

Claim 5

The composition of claim 1 wherein fluoride ion is introduced into the composition by the addition of a fluoride-containing compound selected from the group consisting of hydrofluoric acid, ammonium fluoride, ammonium bifluoride and ammonium fluoroborate.

Claim 6

The composition of claim 4 wherein the fluoride-containing compound is hydrofluoric acid.

Claim 7

The composition of claim 1 wherein the organic sulfonic acid comprises a member selected from the group consisting of para-toluenesulfonic acid, cumenesulfonic acid, linear dodecylbenzenesulfonic acid, phenolsulfonic acid and mixtures thereof.

Claim 8

The composition of claim 1 wherein the organic solvent is selected from the group consisting of aromatic hydrocarbons containing 6 to 14 carbon atoms, aliphatic hydrocarbons containing 1 to 30 carbon atoms, monoalkyl-substituted aromatic hydrocarbons containing 7 to 20 carbon atoms, dialkyl-substituted aromatic hydrocarbons containing 8 to 20 carbon atoms, trialkyl-substituted aromatic hydrocrbons containing 9 to 20 carbon atoms, chlorinated aliphatic hydrocarbons containing 1 to 14 carbon atoms and 1 to 4 chlorine atoms, chlorinated olefinic hydrocarbons containing 1 to 14 carbon atoms and 1 to 4 chlorine atoms, chlorinated aromatic hydrocarbons containing 6 to 12 carbon atoms and 1 to 4 chlorine atoms, aliphatic ketones containing 3 to 10 carbon atoms, monoalkylethers of ethylene glycol containing 3 to 10 carbon atoms, formamide, N-alkyl lactams containing 6 to 12 carbon atoms, N,N-di-alkylalkanoylamides containing 3 to 10 carbon atoms, cyclic aliphatic sulfones containing 4 to 6 carbon atoms, carboxylic acids containing 1 to 4 carbon atoms, cresols containing 7 to 10 carbon atos, and hydroxybenzenes containing 2 to 3 hydroxy groups and mixtures thereof.

Claim 9

The composition of claim 1 wherein the organic solvent is selected from the group consisting of octylbenzene, decylbenzene, dodecylbenzene, perchloroethylene, ortho-dichlorobenzene and mixtures thereof.

Claim 10

The composition of claim 1 in which phenol is not present and the organic sulfonic acid comprises about 20 to 80 weight percent of the composition.

Claim 11

The composition of claim 1 in which phenol is present in an amount of about 5 to 50 weight percent of the composition and the organic sulfonic acid comprises about 10 to 80 weight percent of the composition.

Claim 12

The composition of claim 1 wherein the polymeric organic substance is a photoresist which comprises a polymer selected from the group consisting of polyisoprene, polyvinyl cinnamate and phenol-formaldehyde resins, and the inorganic substrate is silicon dioxide metallized with aluminum.

Claim 13

A method of stripping a polymeric organic substance from a metallized inorganic substrate comprising contacting the polymeric organic substance with the composition of claim 1 at a temperature of about 20° to about 180° C.

Claim 14

The method of claim 12 wherein said polymeric organic substance is a photoresist which comprises a polymer selected from the group consisting of polyisoprene, polyvinyl cinnamate and phenol-formaldehyde resins, and wherein the inorganic substrate is silicon dioxide metallized with aluminum.