US4729941A
Expired / Lapsed
US
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Photoresist processing solution with quaternary ammonium hydroxide
Assignee: Nisso Petrochemical Ind Co Ltd
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Filing: 1985-10-08
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Granted: 1988-03-08
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Expires: 2005-10-08
Abstract
Abstract A photoresist processing solution includes a 2-hydroxyethyl-(mono-or polyoxyethyl) trialkyl ammonium hydroxide and is used in a process for development of photoresists having a solubility in aqueous alkaline solution which is a function of exposure to light.
Inventors
- 👤 Kunio Itoh
- 👤 Kimio Watabe
- 👤 Masahiro Shiozaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 21:42
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322; G03F7/42; G03F7/422
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
98 words
A photoresist processing solution consisting essentially of: (a) a quaternary ammonium hydroxide of the formula I represented by the formula ##STR3## wherein R, R 1 and R 2 are the same and each is a methyl group; and n is a positive number of 1; and (b) a solvent in which compound (a) is dissolved in a concentration of from about 0.05 to 30 wt. %, such that said solution is suitable for developing or stripping a radiation-imaged photoresist coating, wherein said solvent is selected from the group consisting of water, a water-miscible organic solvent, and mixtures thereof.
Claim 2
Dependent Claim
98 words
A photoresist processing solution consisting essentially of: (a) a quaternary ammonium hydroxide of the formula I represented by the formula ##STR3## wherein R, R 1 and R 2 are the same and each is a methyl group; and n is a positive number of 1; and (b) a solvent in which compound (a) is dissolved in a concentration of from about 0.05 to 30 wt. %, such that said solution is suitable for developing or stripping a radiation-imaged photoresist coating, wherein said solvent is selected from the group consisting of water, a water-miscible organic solvent, and mixtures thereof.
Claim 3
Dependent Claim
36 words
The photoresist processing solution of claim 1 wherein said water-miscible organic solvent is selected from the group consisting of C 1 to C 4 -aliphatic alcohols, acetone, methyl ethyl ketone, N-methylpyrrolidone, dimethyl sulfoxide, N,N-dimethylformamide, and N,N-dimethylacetamide.
Claim 4
Dependent Claim
16 words
The photoresist processing solution of claim 2, wherein the water-miscible organic solvent is acetone or N-methylpyrrolidone.
Claim 5
Dependent Claim
12 words
The photoresist processing solution of claim 1, wherein the solvent is water.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-03-08 | 1991-09-07 | 1992-03-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-03-08 | 1995-09-07 | 1996-03-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-03-08 | 1999-09-07 | 2000-03-08 | $7700.00 | Window Closed / Lapsed |