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US4692398A
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Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
Assignee: Clariant Finance BVI Ltd
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Filing: 1985-10-28
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Granted: 1987-09-08
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Expires: 2005-10-28
Abstract
Abstract The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.
Inventors
- 👤 Dana Durham
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 09:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/004; G03F7/022; G03F7/0226; G03F7/075; G03F7/0751
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
105 words
A method of treating a photoresist coating on a substrate, which photoresist comprises a resin selected from the group consisting of novolaks and paravinyl phenols, and at least one o-quinone diazide photosensitizer, which method comprises contacting said photoresist coating for sufficient time to strip, thin, clean or promote adhesion of the coating with a mixture which comprises from about 3 to about 50% by weight of the mixture of a hexa-alkyl disilazane and from about 50 to about 97% by weight of the mixture of a solvent composition which comprises both a propylene glycol mono alkyl ether and a propylene glycol mono alkyl ether acetate.
Claim 2
Independent Claim
105 words
A method of treating a photoresist coating on a substrate, which photoresist comprises a resin selected from the group consisting of novolaks and paravinyl phenols, and at least one o-quinone diazide photosensitizer, which method comprises contacting said photoresist coating for sufficient time to strip, thin, clean or promote adhesion of the coating with a mixture which comprises from about 3 to about 50% by weight of the mixture of a hexa-alkyl disilazane and from about 50 to about 97% by weight of the mixture of a solvent composition which comprises both a propylene glycol mono alkyl ether and a propylene glycol mono alkyl ether acetate.
Claim 3
Dependent Claim
13 words
The method of claim 1 wherein said ether is propylene glycol mono-methyl ether.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein said acetate is propylene glycol mono-methyl ether acetate.
Claim 5
Independent Claim
99 words
A method for stripping a photoresist coating from a substrate, which photoresist comprises a resin selected from the group consisting of novolaks and paravinyl phenols, and at least one o-quinone diazide, said method comprising contacting said photoresist coating with a stripping composition for sufficient time to strip photoresist coating from the substrate which comprises from about 3 to about 50% by weight of the composition of a hexa-alkyl disilazane and from about 50 to about 97% by weight of the composition of a solvent composition comprises both a propylene glycol mono-alkyl ether and a propylene glycol mono-alkyl ether acetate.
Claim 6
Independent Claim
99 words
A method for stripping a photoresist coating from a substrate, which photoresist comprises a resin selected from the group consisting of novolaks and paravinyl phenols, and at least one o-quinone diazide, said method comprising contacting said photoresist coating with a stripping composition for sufficient time to strip photoresist coating from the substrate which comprises from about 3 to about 50% by weight of the composition of a hexa-alkyl disilazane and from about 50 to about 97% by weight of the composition of a solvent composition comprises both a propylene glycol mono-alkyl ether and a propylene glycol mono-alkyl ether acetate.
Claim 7
Dependent Claim
28 words
The method of claim 1 wherein both ether and acetate are present and wherein the ratio of ether to acetate is in the range of from about 10:1-1:10.
Claim 8
Dependent Claim
23 words
The method of claim 1 wherein both ether and acetate are present and wherein the ratio of ether to acetate is about 1:1.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-09-07 | 1991-03-09 | 1991-09-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-09-07 | 1995-03-09 | 1995-09-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-09-07 | 1999-03-09 | 1999-09-08 | $7700.00 | Window Closed / Lapsed |