US4657845A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive tone oxygen plasma developable photoresist
Assignee: International Business Machines Corp
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Filing: 1986-01-14
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Granted: 1987-04-14
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Expires: 2006-01-14
Abstract
Abstract A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, the resist is treated with an organometallic reagent containing an element which forms a non-volatile oxide. It is then developed by means of oxygen reactive ion etching.
Inventors
- 👤 Jean M. J. Frechet
- 👤 Hiroshi Ito
- 👤 Scott A. MacDonald
- 👤 Carlton G. Willson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/265; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
114 words
A process for producing a positive tone oxygen plasma developable photoresist, said process comprising the steps of: (1) coating a substrate with a polymer containing a masked reactive functionality, (2) exposing to radiation and processing said polymer in an imagewise manner to unmask selected portions of said reactive functionality, (3) treating the polymer with a non-organometallic species which reacts with the unmasked functionality, (4) flood exposing to radiation the polymer and processing it to unmask the reactive functionality which remains in the polymer, (5) treating the polymer with an organometallic material containing an element which forms a non-volatile oxide, and (6) developing the system by oxygen etching to obtain a positive tone relief image.
Claim 2
Dependent Claim
114 words
A process for producing a positive tone oxygen plasma developable photoresist, said process comprising the steps of: (1) coating a substrate with a polymer containing a masked reactive functionality, (2) exposing to radiation and processing said polymer in an imagewise manner to unmask selected portions of said reactive functionality, (3) treating the polymer with a non-organometallic species which reacts with the unmasked functionality, (4) flood exposing to radiation the polymer and processing it to unmask the reactive functionality which remains in the polymer, (5) treating the polymer with an organometallic material containing an element which forms a non-volatile oxide, and (6) developing the system by oxygen etching to obtain a positive tone relief image.
Claim 3
Dependent Claim
21 words
A process as claimed in claim 1, wherein the polymer with masked reactive functionality has recurrent pendant groups that undergo acidolysis.
Claim 4
Dependent Claim
14 words
A process as claimed in claim 1, wherein the non-organometallic species is an isocyanate.
Claim 5
Dependent Claim
15 words
A process as claimed in claim 1, wherein the organometallic species is a silicon compound.
Claim 6
Dependent Claim
15 words
A process as claimed in claim 1, wherein the organometallic species is a tin compound.
Claim 7
Dependent Claim
13 words
A process as claimed in claim 4, wherein the silicon compound is hexamethyldisilazane.
Claim 8
Dependent Claim
13 words
A process as claimed in claim 4, wherein the silicon compound is N,N-Dimethylaminotrimethylsilane.
Claim 9
Dependent Claim
15 words
A process as claimed in claim 1, wherein the polymer is baked after imagewise exposure.
Claim 10
Dependent Claim
25 words
A process as claimed in claim 1, wherein a photoinitiator is added to the polymer resist to assist in the unmasking of the reactive functionality.
Claim 11
Dependent Claim
15 words
A process as in claim 9, wherein the photoinitiator is triphenylsulfonium hexafluoroarsenate or tripheylsulfonium hexafluoroantimonate.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-04-13 | 1990-10-13 | 1991-04-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-04-13 | 1994-10-13 | 1995-04-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-04-13 | 1998-10-13 | 1999-04-14 | $7700.00 | Window Closed / Lapsed |