US4433044A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dry developable positive photoresists
Assignee: Intersil Corp
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Filing: 1982-11-15
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Granted: 1984-02-21
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Expires: 2002-11-15
Abstract
Abstract Novel copolymers comprising a compound containing an acrylate moiety and a silicon-containing oxime ester of methacrylic acid having the formula ##STR1## are positive resist recording media which can be dry developed.
Inventors
- 👤 Wolfgang H. Meyer
- 👤 Bernard J. Curtis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 15:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758; C; C08; C08F; C08F230/00; C08F230/04; C08F230/08; C08F230/085
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
102 words
A method of forming a patterned layer on a substrate comprising: (a) coating the substrate with a composition comprising the copolymer of a silicon-containing oxime ester of methacrylic acid represented by the formula ##STR5## and an acrylate-containing monomer selected from the group consisting of acrylic acid, methacrylic acid and their esters, and a suitable solvent therefor; (b) drying the coating to form a resist film; (c) irradiating selected portions of the film with a source of ultraviolet radiation; (d) baking the film under vacuum; and (e) dry developing the film to remove the irradiated portions thereof by etching in an oxygen plasma.
Claim 2
Independent Claim
102 words
A method of forming a patterned layer on a substrate comprising: (a) coating the substrate with a composition comprising the copolymer of a silicon-containing oxime ester of methacrylic acid represented by the formula ##STR5## and an acrylate-containing monomer selected from the group consisting of acrylic acid, methacrylic acid and their esters, and a suitable solvent therefor; (b) drying the coating to form a resist film; (c) irradiating selected portions of the film with a source of ultraviolet radiation; (d) baking the film under vacuum; and (e) dry developing the film to remove the irradiated portions thereof by etching in an oxygen plasma.
Claim 3
Dependent Claim
13 words
A method in accordance with claim 1, wherein said monomer is methyl methacrylate
Claim 4
Dependent Claim
22 words
A method in accordance with claim 1, wherein said ultraviolet radiation has a wavelength of from about 250 to about 300 nm.
Claim 5
Dependent Claim
29 words
A method in accordance with claim 1, wherein etching is continued after the irradiated portions of said film have been removed whereby a pattern is formed in the substrate.
Claim 6
Dependent Claim
30 words
A method in accordance with claim 1, additionally including the step of forming a layer of a dielectric polyimide on the substrate prior to the coating thereof with said composition.
Claim 7
Dependent Claim
22 words
A method in accordance with claim 5 wherein said development is continued until portions of said layer of polyimide have been removed.
Claim 8
Dependent Claim
24 words
A method in accordance with claim 6, wherein etching is continued until portions of the substrate underlying the layer of polyimide have been removed.
Claim 9
Dependent Claim
45 words
A recording medium comprising a substrate having imposed thereon a positive photoresist comprising a copolymer of a silicon-containing oxime ester of methacrylic acid represented by the formula ##STR6## and an acrylate-containing monomer selected from the group consisting of acrylic acid, methacrylic acid and their esters.
Claim 10
Dependent Claim
45 words
A recording medium comprising a substrate having imposed thereon a positive photoresist comprising a copolymer of a silicon-containing oxime ester of methacrylic acid represented by the formula ##STR6## and an acrylate-containing monomer selected from the group consisting of acrylic acid, methacrylic acid and their esters.
Claim 11
Dependent Claim
35 words
A recording medium in accordance with claim 8, wherein said photoresist comprises a first layer of a dielectric polyimide on the substrate and a second layer of said copolymer and imposed on said dielectric layer.
Claim 12
Dependent Claim
32 words
A copolymer of a silicon-containing oxime ester of methacrylic acid represented by the formula ##STR7## and an acrylate-containing monomer selected from the group consisting of acrylic acid, methacrylic acid and their esters.
Claim 13
Dependent Claim
32 words
A copolymer of a silicon-containing oxime ester of methacrylic acid represented by the formula ##STR7## and an acrylate-containing monomer selected from the group consisting of acrylic acid, methacrylic acid and their esters.
References Cited (Backward Citations)
US3558311A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-02-20 | 1987-08-22 | 1988-02-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-02-20 | 1991-08-22 | 1992-02-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-02-20 | 1995-08-22 | 1996-02-21 | $7700.00 | Window Closed / Lapsed |