Apparatus for heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.

Claim 2

Heating apparatus, comprising: (a) lamp means, (b) means to support a workpiece, and (c) means to optically couple said lamp means to a workpiece supported on said workpiece-support means, to effect relatively uniform heating of said workpiece, said optical coupling means being a hollow, integrating light pipe that extends at least substantially to said workpiece-support means and that causes the intensity of the light from said lamp means to be relatively uniform across said light pipe at said workpiece, said lamp means being disposed within said light pipe, the aspect ratio in said light pipe being at least 1.

Claim 3

The invention as claimed in claim 1, in which the aspect ratio in said light pipe is substantially greater than 1.

Claim 4

Heating apparatus, comprising: (a) a kaleidoscope, (b) a source of radiant thermal energy disposed within said kaleidoscope, and (c) workpiece-support means disposed in said kaleidoscope and spaced from said radiant source in a direction longitudinal to said kaleidoscope, the aspect ratio in said kaleidoscope being at least 1, said kaleidoscope and aspect ratio making substantially uniform the radiation from said radiant source at the region of said workpiece support means, whereby a workpiece disposed on said workpiece-support means will be substantially uniformly heated.

Claim 5

Heating apparatus, comprising: (a) a kaleidoscope, (b) a source of radiant thermal energy disposed within said kaleidoscope, and (c) workpiece-support means disposed in said kaleidoscope and spaced from said radiant source in a direction longitudinal to said kaleidoscope, the aspect ratio in said kaleidoscope being at least 1, said kaleidoscope and aspect ratio making substantially uniform the radiation from said radiant source at the region of said workpiece support means, whereby a workpiece disposed on said workpiece-support means will be substantially uniformly heated.

Claim 6

The invention as claimed in claim 3, in which the aspect ratio in said kaleidoscope is substantially greater than 1.

Claim 7

The invention as claimed in claim 3, in which said kaleidoscope is substantially uniform in cross-sectional area throughout its length.

Claim 8

Heating apparatus for a semiconductor wafer, said heating apparatus comprising: (a) a hollow, integrating light pipe that causes the intensity of light to become relatively uniform across said pipe by reflections and rereflections as the light moves along said pipe, (b) wall means to close one end of said light pipe, said wall means having an inwardly-facing reflector means that is diffusely reflective, (c) lamp means to create incoherent thermal radiation, said lamp means being disposed within said light pipe, and transmitting radiation in both directions along said pipe, (d) means to support a semiconductor wafer in such position as to be struck by radiation transmitted by said lamp means and directed by said light pipe, said support means being spaced sufficiently far from said lamp means, in a direction perpendicular to a cross-section of said light pipe, that a wafer supported by said support means will be relatively uniformly heated by radiation transmitted by said lamp means, reflected by said inwardly-facing diffuse reflector means of said wall means, and integrated by said light pipe, the aspect ratio in said light pipe being at least 1, (e) substantially nondiffusing window means disposed between said lamp means and wafer-supported means, and (f) means to provide a controlled atmosphere around said wafer, said controlled atmosphere being maintained, by said window means, out of contact with said lamp means.

Claim 9

Heating apparatus for a semiconductor wafer, said heating apparatus comprising: (a) a hollow, integrating light pipe that causes the intensity of light to become relatively uniform across said pipe by reflections and rereflections as the light moves along said pipe, (b) wall means to close one end of said light pipe, said wall means having an inwardly-facing reflector means that is diffusely reflective, (c) lamp means to create incoherent thermal radiation, said lamp means being disposed within said light pipe, and transmitting radiation in both directions along said pipe, (d) means to support a semiconductor wafer in such position as to be struck by radiation transmitted by said lamp means and directed by said light pipe, said support means being spaced sufficiently far from said lamp means, in a direction perpendicular to a cross-section of said light pipe, that a wafer supported by said support means will be relatively uniformly heated by radiation transmitted by said lamp means, reflected by said inwardly-facing diffuse reflector means of said wall means, and integrated by said light pipe, the aspect ratio in said light pipe being at least 1, (e) substantially nondiffusing window means disposed between said lamp means and wafer-supported means, and (f) means to provide a controlled atmosphere around said wafer, said controlled atmosphere being maintained, by said window means, out of contact with said lamp means.

Claim 10

The invention as claimed in claim 6, in which said integrating light pipe is a kaleidoscope.

Claim 11

Apparatus for effecting double-sided and relatively uniform heating of a semiconductor wafer, said apparatus comprising: (a) a hollow, integrating light pipe that causes the intensity of light to become relatively uniform across said pipe by reflections and rereflections as the light moves along said pipe, (b) means to close one end of said pipe, said closure means incorporating inwardly-facing highly-reflective means over substantially the entire area thereof, (c) means to support a semiconductor wafer within said pipe at an intermediate region thereof, said support means being in only small-area contact with said wafer, said support means and the wafer held thereby having such size and such characteristics as to permit a substantial percentage of radiant thermal energy within said pipe to pass along said pipe past said support means and said wafer, the aspect ratio in said light pipe being at least 1, and (d) means to supply radiant thermal energy to said pipe at a region farther from said closure means than is said support means, whereby a wafer supported by said support means is heated relatively uniformly on both sides, one side being heated by radiant thermal energy from said means (d) and directed and integrated by said pipe, the other side being heated by radiant thermal energy from said means (d), directed and integrated by said pipe, then passing past said support means and the wafer supported thereby, then reflecting off said closure means, and then being directed and integrated by said pipe back to said other side of said wafer.

Claim 12

Apparatus for effecting double-sided and relatively uniform heating of a semiconductor wafer, said apparatus comprising: (a) a hollow, integrating light pipe that causes the intensity of light to become relatively uniform across said pipe by reflections and rereflections as the light moves along said pipe, (b) means to close one end of said pipe, said closure means incorporating inwardly-facing highly-reflective means over substantially the entire area thereof, (c) means to support a semiconductor wafer within said pipe at an intermediate region thereof, said support means being in only small-area contact with said wafer, said support means and the wafer held thereby having such size and such characteristics as to permit a substantial percentage of radiant thermal energy within said pipe to pass along said pipe past said support means and said wafer, the aspect ratio in said light pipe being at least 1, and (d) means to supply radiant thermal energy to said pipe at a region farther from said closure means than is said support means, whereby a wafer supported by said support means is heated relatively uniformly on both sides, one side being heated by radiant thermal energy from said means (d) and directed and integrated by said pipe, the other side being heated by radiant thermal energy from said means (d), directed and integrated by said pipe, then passing past said support means and the wafer supported thereby, then reflecting off said closure means, and then being directed and integrated by said pipe back to said other side of said wafer.

Claim 13

The invention as claimed in claim 8, in which said light pipe is a kaleidoscope, and said closure means is perpendicular to the longitudinal axis of aid kaleidoscope.

Claim 14

Apparatus for effecting double-sided and relatively uniform heating of a semiconductor wafer, said apparatus comprising: (a) a hollow, integrating light pipe that operates, by reflections and rereflections, to cause the intensity of light to become substantially uniform across said pipe as the light moves along said pipe, (b) means to close one end of said pipe, (c) means to close another end of said pipe, said closure means (b) and (c) being reflective in an inward direction, (d) means to support a semiconductor wafer within said pipe at an intermediate region thereof, said support means being in only small area contact with said wafer, said means (d) and the wafer held thereby having such size and such characteristics as to permit a substantial percentage of radiant thermal energy within said pipe to pass along said pipe past said means (d) and said wafer, (e) lamp means disposed within said pipe relatively adjacent said closure means (b) and adapted to radiate both toward and away from said closure means (b), whereby a wafer supported by said support means (d) is heated relatively uniformly on both sides, one side being heated by radiant thermal energy from said means (e) and directed and integrated by said pipe, another side being heated by radiant thermal energy from said means (e), directed and integrated by said pipe, then passing past said means (d) and the wafer supported thereby, then reflecting off said closure means (c), and then being directed and integrated by said pipe back to the other side of said wafer, the aspect ratio in said light pipe being at least 1, and (f) nondiffusing window means disposed between said wafer-support means (d) and said lamp means (e).

Claim 15

Apparatus for effecting double-sided and relatively uniform heating of a semiconductor wafer, said apparatus comprising: (a) a hollow, integrating light pipe that operates, by reflections and rereflections, to cause the intensity of light to become substantially uniform across said pipe as the light moves along said pipe, (b) means to close one end of said pipe, (c) means to close another end of said pipe, said closure means (b) and (c) being reflective in an inward direction, (d) means to support a semiconductor wafer within said pipe at an intermediate region thereof, said support means being in only small area contact with said wafer, said means (d) and the wafer held thereby having such size and such characteristics as to permit a substantial percentage of radiant thermal energy within said pipe to pass along said pipe past said means (d) and said wafer, (e) lamp means disposed within said pipe relatively adjacent said closure means (b) and adapted to radiate both toward and away from said closure means (b), whereby a wafer supported by said support means (d) is heated relatively uniformly on both sides, one side being heated by radiant thermal energy from said means (e) and directed and integrated by said pipe, another side being heated by radiant thermal energy from said means (e), directed and integrated by said pipe, then passing past said means (d) and the wafer supported thereby, then reflecting off said closure means (c), and then being directed and integrated by said pipe back to the other side of said wafer, the aspect ratio in said light pipe being at least 1, and (f) nondiffusing window means disposed between said wafer-support means (d) and said lamp means (e).

Claim 16

The invention as claimed in claim 10, in which said light pipe is a kaleidoscope.

Claim 17

Apparatus for treating semiconductor wafers by means of heat, said apparatus comprising: (a) a hollow integrating light pipe that causes the intensity of light, by reflections and rereflections of the light, to become substantially uniform across said pipe as the light moves therealong, said pipe having a diameter sufficiently large to receive a semiconductor wafer therein, (b) means to mount a semiconductor wafer generally in a plane perpendicular to the longitudinal axis of said pipe, and (c) CW lamp means and pulsed lamp means cooperating with said light pipe to effect combined and substantially uniform isothermal and thermal flux heating of said wafer, said wafer and said CW lamp means being disposed within said light pipe, the aspect ratio in said light pipe being at least 1.

Claim 18

Apparatus for treating semiconductor wafers by means of heat, said apparatus comprising: (a) a hollow integrating light pipe that causes the intensity of light, by reflections and rereflections of the light, to become substantially uniform across said pipe as the light moves therealong, said pipe having a diameter sufficiently large to receive a semiconductor wafer therein, (b) means to mount a semiconductor wafer generally in a plane perpendicular to the longitudinal axis of said pipe, and (c) CW lamp means and pulsed lamp means cooperating with said light pipe to effect combined and substantially uniform isothermal and thermal flux heating of said wafer, said wafer and said CW lamp means being disposed within said light pipe, the aspect ratio in said light pipe being at least 1.

Claim 19

The invention as claimed in claim 12, in which said mounting means (b) mounts said wafer in said pipe and spaced from both ends thereof.

Claim 20

The invention as claimed in claim 12, in which said CW lamp means is disposed on one side of said wafer, and said pulsed lamp means is disposed on another side thereof.

Claim 21

The invention as claimed in claim 12, in which said CW lamp means and said pulsed lamp means are disposed within said light pipe.

Claim 22

The invention as claimed in claim 12, in which said light pipe is a kaleidoscope.

Claim 23

Apparatus for heating a semiconductor wafer, comprising: (a) a kaleidoscope having a diameter at least as large as that of a semiconductor wafer to be heated, (b) means to close one end of said kaleidoscope by means of a reflective wall substantially all portions of which are perpendicular to the axis of said kaleidoscope, (c) a plurality of lamps disposed in said kaleidoscope relatively adjacent said reflective wall, said lamps directing radiant energy both toward and away from said reflective wall, and (d) means to mount a semiconductor wafer, having two parallel surfaces, generally in a plane perpendicular to the axis of said kaleidoscope, said mounting means being at a location spaced sufficiently far from said lamps, in a direction parallel to said axis, that the radiant energy from said lamps is relatively uniform at one of said surfaces of said wafer, said mounting means being a plurality of elongate small-area contact elements adapted to engage said wafer at the ends of said contact elements, the aspect ratio in said kaleidoscope being at least 1.

Claim 24

Apparatus for heating a semiconductor wafer, comprising: (a) a kaleidoscope having a diameter at least as large as that of a semiconductor wafer to be heated, (b) means to close one end of said kaleidoscope by means of a reflective wall substantially all portions of which are perpendicular to the axis of said kaleidoscope, (c) a plurality of lamps disposed in said kaleidoscope relatively adjacent said reflective wall, said lamps directing radiant energy both toward and away from said reflective wall, and (d) means to mount a semiconductor wafer, having two parallel surfaces, generally in a plane perpendicular to the axis of said kaleidoscope, said mounting means being at a location spaced sufficiently far from said lamps, in a direction parallel to said axis, that the radiant energy from said lamps is relatively uniform at one of said surfaces of said wafer, said mounting means being a plurality of elongate small-area contact elements adapted to engage said wafer at the ends of said contact elements, the aspect ratio in said kaleidoscope being at least 1.

Claim 25

The invention as claimed in claim 17, in which said lamps are closely-packed, parallel tubes lying in at least one plane perpendicular to the axis of said kaleidoscope.

Claim 26

The invention as claimed in claim 17 in which nondiffusing window means are provided between said lamps and said mounting means.

Claim 27

The invention as claimed in claim 17, in which said lamps are relatively closely-packed parallel tubes lying in at least one plane perpendicular to the axis of said kaleidoscope, in which another end of said kaleidoscope is closed by a reflective wall substantially all portions of which are perpendicular to the axis of said kaleidoscope, and in which said mounting means (d) mounts said wafer in a position spaced from both of said reflective walls in a direction parallel to said axis.

Claim 28

The invention as claimed in claim 14, in which a second bank of relatively closely packed lamps is mounted adjacent said other end.

Claim 29

The invention as claimed in claim 21, in which said lamps are CW lamps in said second bank.

Claim 30

The invention as claimed in in claim 21, in which said lamps are pulsed lamps in said second bank.

Claim 31

Apparatus for heating semiconductor wafers, comprising: (a) an elongate, hollow, integrating light pipe that causes the intensity of light, by reflections and rereflections of the light, to become substantially uniform across said pipe as the light moves therealong, (b) means to provide high-power radiant thermal energy in at least one end of said pipe, and (c) automatic means to introduce and withdraw large-diameter semiconductor wafers from a region of said pipe spaced substantial distances from both ends thereof, the aspect ratio in said light pipe being at least 1.

Claim 32

Apparatus for heating semiconductor wafers, comprising: (a) an elongate, hollow, integrating light pipe that causes the intensity of light, by reflections and rereflections of the light, to become substantially uniform across said pipe as the light moves therealong, (b) means to provide high-power radiant thermal energy in at least one end of said pipe, and (c) automatic means to introduce and withdraw large-diameter semiconductor wafers from a region of said pipe spaced substantial distances from both ends thereof, the aspect ratio in said light pipe being at least 1.

Claim 33

The invention as claimed in claim 24, in which means, having an inwardly-facing reflective surface, are provided to close at least one of said pipe.

Claim 34

The invention as claimed in claim 24, in which said pipe comprises first and second sections adapted to separate from each other, and in which said automatic means (c) comprises means to separate said sections from each other, then to shift a semiconductor wafer through the space between said separated sections until said wafer is generally coaxial with said sections, and then to close said sections and thus cause said shifted wafer to be disposed in a substantially continuous light pipe.

Claim 35

The invention as claimed in claim 26, in which said means to shift said wafer comprises a support element for a plurality of wafers, and further comprises means to actuate said support element to cause said wafers to shift sequentially into and out of said light pipe.

Claim 36

The invention as claimed in claim 26, in which said wafers are supported on quartz rings, said rings having inner diameters, said inner diameters being substantially larger than the diameters of said wafers, each ring having support elements formed of quartz and in small-area contact with said wafers.

Claim 37

Semiconductor wafer-heating apparatus, comprising: (a) a kaleidoscope, the cross-sectional shape of the reflective surfaces of said kaleiodoscope being a regular hexagon, (b) lamp means provided in said kaleidoscope, (c) wafer-support means provided in said kaleidoscope and spaced from said lamp means in a direction perpendicular to a cross section of said kaleidoscope, the amount of said spacing being such that a wafer supported on said means (c) will be relatively uniformly heated, the aspect ratio in said kaleidoscope being at least 1, (d) window means disposed between said means (b) and (c) to thus cooperate with the wall means of said kaleidoscope in defining a lamp chamber and a wafer chamber, and (e) means to provide a controlled atmosphere in said wafer chamber during operation of said lamp means to heat a wafer.

Claim 38

Semiconductor wafer-heating apparatus, comprising: (a) a kaleidoscope, the cross-sectional shape of the reflective surfaces of said kaleiodoscope being a regular hexagon, (b) lamp means provided in said kaleidoscope, (c) wafer-support means provided in said kaleidoscope and spaced from said lamp means in a direction perpendicular to a cross section of said kaleidoscope, the amount of said spacing being such that a wafer supported on said means (c) will be relatively uniformly heated, the aspect ratio in said kaleidoscope being at least 1, (d) window means disposed between said means (b) and (c) to thus cooperate with the wall means of said kaleidoscope in defining a lamp chamber and a wafer chamber, and (e) means to provide a controlled atmosphere in said wafer chamber during operation of said lamp means to heat a wafer.

Claim 39

Semiconductor wafer-heating apparatus, comprising: (a) means to define an optical cavity having a substantially nesting cross-sectional shape, said means having sidewalls that have inwardly-facing reflective surfaces, said reflective surfaces being highly reflective, (b) lamp means forming a source of radiant heat energy, said lamp means including both CW lamps and pulsed lamps, said lamp means being disposed in said optical cavity, and (c) means to support a semiconductor wafer in said cavity in spaced relationship from said lamp means, the direction of said spacing being perpendicular to a cross section of said cavity, said wafer-supporting means being such that when a wafer is supported thereon the radiant energy from said lamp means, and passing through said optical cavity, will strike and heat said wafer, the shape of said optical cavity and the amount of spacing of said semiconductor wafer from said lamp means being such that said wafer is relatively uniformly heated, the aspect ratio in said optical cavity being at least 1.

Claim 40

Semiconductor wafer-heating apparatus, comprising: (a) means to define an optical cavity having a substantially nesting cross-sectional shape, said means having sidewalls that have inwardly-facing reflective surfaces, said reflective surfaces being highly reflective, (b) lamp means forming a source of radiant heat energy, said lamp means including both CW lamps and pulsed lamps, said lamp means being disposed in said optical cavity, and (c) means to support a semiconductor wafer in said cavity in spaced relationship from said lamp means, the direction of said spacing being perpendicular to a cross section of said cavity, said wafer-supporting means being such that when a wafer is supported thereon the radiant energy from said lamp means, and passing through said optical cavity, will strike and heat said wafer, the shape of said optical cavity and the amount of spacing of said semiconductor wafer from said lamp means being such that said wafer is relatively uniformly heated, the aspect ratio in said optical cavity being at least 1.

Claim 41

The invention as claimed in claim 30, in which said lamp means includes a bank of closely nested tubular CW lamps.

Claim 42

The invention as claimed in claim 30 in which said reflective surfaces of said sidewalls of said cavity are nondiffusely reflective.

Claim 43

The invention as claimed in claim 30 in which said reflective surfaces of said sidewalls of said cavity are diffusely reflective.

Claim 44

The invention as claimed in claim 30 in which a closure wall is provided across said optical cavity on the side of said CW lamps remote from said wafer-supporting means, an inwardly-facing surface of said closure wall being reflective, said inwardly-facing surface of said closure wall being planar and parallel to a wafer supported on said wafer-supporting means.

Claim 45

The invention as claimed in claim 30, in which said lamp means includes a relatively closely-packed array of many CW lamps.

Claim 46

The invention as claimed in claim 30 in which the accuracy of manufacture of said optical cavity, the characteristics of said lamp means, and the aspect ratio in said optical cavity are all such that the uniformity of heating across said wafer is in the range of plus or minus a few percent.

Claim 47

The invention as claimed in claim 36 in which the accuracy of manufacture of said optical cavity, the characteristics of said lamp means, and the aspect ratio in said optical cavity are all such that the uniformity of heating across said wafer is in the range of plus or minus 2%.

Claim 48

The invention as claimed in claim 30, in which there is no diffuser means between said lamp means and a wafer supported on said wafer-supporting means.

Claim 49

The invention as claimed in claim 30, in which there is no susceptor associated with a wafer supported on said wafer-supporting means.

Claim 50

The invention as claimed in any of claims 30-39, inclusive, in which said nesting cross-sectional shape is a square.

Claim 51

The invention as claimed in any of claims 30-39, inclusive, in which said nesting cross-sectional shape is a regular hexagon.

Claim 52

The invention as claimed in any of claims 30-34, inclusive, in which said nesting cross-sectional shape is an equilateral triangle.

Claim 53

The invention as claimed in any of claims 30-39, inclusive, in which said nesting cross-sectional shape is a rectangle.

Claim 54

The invention as claimed in claim 30, in which said wafer supporting means is a plurality of elongate support elements, the ends of which are in small-area contact with said wafer, said elongate support elements maintaining said wafer in a plane parallel to a cross-section of said cavity, and also maintaining said wafer spaced from any wall means.

Claim 55

The invention as claimed in claim 30, in which a nondiffusing window is provided in said optical cavity between at least some of said lamp means and said wafer-supporting means, said window aiding in maintaining the wafer in a controlled atmosphere.

Claim 56

The invention as claimed in claim 30, in which said lamp means includes many uniformly spaced tubular CW lamps, said lamps being substantially in a plane parallel to a cross section of said cavity, in which a nondiffusing window is provided between said CW lamps and said wafer-supporting means, in which means are provided to introduce gas into the region between said window and wafer-supporting means to maintain the wafer in a controlled atmosphere, and in which means are provided to feed wafers into and out of said optical cavity.

Claim 57

The invention as claimed in claim 46, in which said substantially nesting cross-sectional shape is a substantial square.

Claim 58

Apparatus for heating a workpiece, which comprises: (a) means to define an optical cavity having highly reflective inwardly-facing surfaces and having a substantially nesting cross-sectional shape, (b) incoherent source means of radiant-heat energy disposed in a region of said cavity, and (c) means to support a workpiece at a target region in said cavity, the aspect ratio in said cavity being at least 1, said inwardly-facing surfaces being so constructed and related to each other and to said source means and said workpiece-support means that: (1) much of the incoherent radiant heat energy from said source means will be reflected and re-reflected many times before traveling from said source means to said workpiece, and (2) the radiant heat energy from said source that reaches said workpiece will be distributed across said workpiece with a degree of uniformity within plus or minus 2 percent.

Claim 59

Apparatus for heating a workpiece, which comprises: (a) means to define an optical cavity having highly reflective inwardly-facing surfaces and having a substantially nesting cross-sectional shape, (b) incoherent source means of radiant-heat energy disposed in a region of said cavity, and (c) means to support a workpiece at a target region in said cavity, the aspect ratio in said cavity being at least 1, said inwardly-facing surfaces being so constructed and related to each other and to said source means and said workpiece-support means that: (1) much of the incoherent radiant heat energy from said source means will be reflected and re-reflected many times before traveling from said source means to said workpiece, and (2) the radiant heat energy from said source that reaches said workpiece will be distributed across said workpiece with a degree of uniformity within plus or minus 2 percent.

Claim 60

The invention as claimed in claim 48 in which said cavity is elongated, and in which both ends of said cavity are closed by closures having reflective inwardly-facing surfaces substantially all portions of which are substantially perpendicular to the longitudinal axis of said cavity, and in which said workpiece-support means supports said workpiece in said cavity in spaced relationship from both of said closures.