Method for making complementary MOS semiconductor devices

Claim 2

A process for making a complementary metal oxide semiconductor (CMOS) with a high impurity density contact region between elements at a boundary between respective drain regions of a p-channel metal oxide semiconductor (MOS) transistor and an n-channel MOS transistor comprising: forming at least two gate electrodes over an oxide layer on a semiconductive layer; removing a portion of the semiconductive layer between the gate electrodes so that the thickness of the portion of the semiconductive layer between the gate electrodes is less than that of the semiconductor layer under the gate electrodes; and doping n type and p type impurities in respective predetermined portions of the semiconductive layer to form drain and source regions for the respective n-channel and p-channel MOS transistors constructed using the gate electrodes as masks so that the respective drain regions extend to the substrate under where said portion of the semiconductor layer was removed.

Claim 3

The process for making CMOS according to claim 1 wherein the step for removing at least the portion of the semiconductive layer between the gate electrodes is accomplished by using resist patterns produced by photolithography.

Claim 4

The process for making CMOS according to claim 1 wherein the step for removing at least the portion of the semiconductive layer existing between the gate electrodes is accomplished by using the gate electrodes and resist patterns, which cover part of the gate electrodes, and the semiconductive layer except the surface of the semiconductive layer existing between the gate electrodes.

Claim 5

The process for making CMOS according to claim 3 wherein the gate electrode is made of one selected from the group consisting of aluminum, molybdenum, tungsten, titanium, platinum, palladium, and metallic silicide.

Claim 6

The process for making the CMOS according to claim 1 wherein the step for removing at least the portion of the semiconductive layer existing between the gate electrodes is done by using resist patterns, which are used for patterning the gate electrodes, as a mask.

Claim 7

A process for making a complementary metal oxide semiconductor (CMOS) with a high impurity density contact region between elements at a boundary between respective drain regions of a p-channel metal oxide semiconductor (MOS) transistor and an n-channel MOS transistor comprising: forming a first conductive layer on a substrate; forming a first thin oxide layer on said semiconductor layer; forming at least two gate electrodes on said semiconductor layer over said thin oxide layer; covering said gate electrodes with a thick oxide layer, removing the thin oxide layer covering the semiconductive layer and part of the thick oxide layer leaving a thin oxide layer on the gate electrodes; removing at least a portion of the semiconductor layer between said gate electrodes by using the gate electrodes covered with the oxide layer as a mask so that the thickness of the portion of the semiconductive layer between the gate electrode is less than that of the semiconductive layer under the gate electrodes; and doping n type and p type impurities in respective predetermined portions of the semiconductive layer to form drain and source regions for the respective n-channel and p-channel MOS transistors constructed using the gate electrodes as masks.

Claim 8

A process for making a complementary metal oxide semiconductor (CMOS) with a high impurity density contact region between elements at a boundary between respective drain regions of a p-channel metal oxide semiconductor (MOS) transistor and an n-channel MOS transistor comprising: forming a first conductive layer on a substrate; forming a first thin oxide layer on said semiconductor layer; forming at least two gate electrodes on said semiconductor layer over said thin oxide layer; covering said gate electrodes with a thick oxide layer, removing the thin oxide layer covering the semiconductive layer and part of the thick oxide layer leaving a thin oxide layer on the gate electrodes; removing at least a portion of the semiconductor layer between said gate electrodes by using the gate electrodes covered with the oxide layer as a mask so that the thickness of the portion of the semiconductive layer between the gate electrode is less than that of the semiconductive layer under the gate electrodes; and doping n type and p type impurities in respective predetermined portions of the semiconductive layer to form drain and source regions for the respective n-channel and p-channel MOS transistors constructed using the gate electrodes as masks.

Claim 9

The process for making CMOS according to claim 6, wherein the step for removing at least the portion of the semiconductive layer existing between the gate electrode is done by anisotropic etching.