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Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge

Assignee: Canon Anelva Corp
•
Filing: 1974-08-08
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Granted: 1976-10-05
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Expires: 1994-08-08
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Abstract

Abstract On sputter-etching a substrate, fluorochloro- or fluorobromohydrocarbon gas is used as an etching gas in a chamber evacuated to a pressure of at least as low as 10<->5 Torr. The etching gas is introduced at a pressure between 5 x 10<->3 and 5 x 10<->2 Torr. Use is also made of a planar electrode for supporting the substrate and responsive to an r.f. power supplied thereto for producing a glow discharge.

Inventors

  • 👤 Reisaku Matsuzaki
  • 👤 Naokichi Hosokawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 21:07
CPC Classifications
C; C23; C23F; C23F4/00; H; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H10P50/28; H10P50/282; H10P50/283

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 90 words
A method of sputter-etching a substrate, comprising the steps of placing said substrate on planar electrode means disposed in an exhaustible space, evacuating said exhaustible space to a first predetermined pressure lower than about 10.sup. -5 Torr, introducing an etching gas comprising fluorohalogenohydrocarbon gas into the now evacuated space at a second predetermined pressure between about 5 × 10.sup. -3 and 5 × 10.sup. -2 Torr, and supplying radio-frequency electric power to said planar electrode means to produce a glow discharge in the etching-gas filled space, thereby sputter-etching said substrate.
Claim 2
Independent Claim 90 words
A method of sputter-etching a substrate, comprising the steps of placing said substrate on planar electrode means disposed in an exhaustible space, evacuating said exhaustible space to a first predetermined pressure lower than about 10.sup. -5 Torr, introducing an etching gas comprising fluorohalogenohydrocarbon gas into the now evacuated space at a second predetermined pressure between about 5 × 10.sup. -3 and 5 × 10.sup. -2 Torr, and supplying radio-frequency electric power to said planar electrode means to produce a glow discharge in the etching-gas filled space, thereby sputter-etching said substrate.
Claim 3
Dependent Claim 14 words
A method as claimed in claim 1, wherein said fluorohalogenohydrocarbon gas is fluorochlorohydrocarbon gas.
Claim 4
Dependent Claim 28 words
A method as claimed in claim 2, wherein said fluorochlorohydrocarbon gas is at least one member selected from the group consisting of difluorodichloromethane, 1-fluorodichloro-2-difluorochloroethane, fluorotrichloromethane, difluorochloromethane, and 1,2-fluorodichloroethane.
Claim 5
Dependent Claim 14 words
A method as claimed in claim 1, wherein said fluorohalogenohydrocarbon gas is fluorobromohydrocarbon gas.
Claim 6
Dependent Claim 13 words
A method as claimed in claim 4, wherein said fluorobromohydrocarbon gas is 1,2-fluorodibromoethane.
Claim 7
Dependent Claim 28 words
A method as claimed in claim 1, wherein said etching gas further comprises at least one member selected from the group consisting of oxygen, argon, nitrogen, and air.
Claim 8
Dependent Claim 19 words
A method as claimed in claim 1, wherein said first pressure is between 10.sup. -5 and 10.sup. -7 Torr.
Claim 9
Dependent Claim 24 words
A method as claimed in claim 1, wherein said electrode means comprises a planar electrode and an etching table placed on said planar electrode.
Claim 10
Dependent Claim 60 words
A method as claimed in claim 8, further comprising the steps of placing dielectric plate means on said substrate disposed on said etching table before supplying said electric power to said electrode means to protect said substrate against said discharge, and placing said dielectric plate means at a predetermined distance from said substrate after said discharge reached a stable state.

References Cited (Backward Citations)

US3271286A Cited
US3474021A Cited
US3598710A Cited
US3477936A Cited
US3730873A Cited
US3640812A Cited
US3676317A Cited
US3849276A Cited
US3795557A Cited
US3867216A Cited
US3880684A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1979-10-05 1980-04-05 1980-10-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1983-10-05 1984-04-05 1984-10-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1987-10-05 1988-04-05 1988-10-05 $7700.00 Window Closed / Lapsed

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