US7317507B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
•
Filing: 2005-05-03
•
Granted: 2008-01-08
•
Expires: 2025-05-03
Abstract
Abstract A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.
Inventors
- 👤 Alexander Straaijer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 00:18
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/20; G03F7/2041; G03F7/708; G03F7/7095
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
117 words
A lithographic projection apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; and a liquid supply system configured to supply a first liquid to a space between the projection system and the substrate, the liquid supply system comprising: a liquid confinement structure substantially surrounding the space and adapted to confine a liquid to a volume around the space; a first liquid supply arranged to supply the first liquid to the space; and a second liquid supply arranged to supply a second liquid, to the volume, to at least partly confine the first liquid within the space, the second liquid having a different composition from the first liquid.
Claim 2
Dependent Claim
117 words
A lithographic projection apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; and a liquid supply system configured to supply a first liquid to a space between the projection system and the substrate, the liquid supply system comprising: a liquid confinement structure substantially surrounding the space and adapted to confine a liquid to a volume around the space; a first liquid supply arranged to supply the first liquid to the space; and a second liquid supply arranged to supply a second liquid, to the volume, to at least partly confine the first liquid within the space, the second liquid having a different composition from the first liquid.
Claim 3
Dependent Claim
18 words
The apparatus according to claim 1 , wherein the first liquid is substantially immiscible in the second liquid.
Claim 4
Dependent Claim
19 words
The apparatus according to claim 2 , wherein the first liquid is non-polar and the second liquid is polar.
Claim 5
Dependent Claim
31 words
The apparatus according to claim 3 , wherein the first liquid is selected from the group comprising: cycloalkane, other high-index hydrocarbon, perfluoropolyether, perfluoroalkane, and hydrofluoroether; and the second liquid comprises water.
Claim 6
Dependent Claim
23 words
The apparatus according to claim 1 , wherein the first liquid is selected from the group comprising: cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane.
Claim 7
Dependent Claim
16 words
The apparatus according to claim 1 , wherein the first liquid is perfluoro-N-methylmorpholine or perfluoro E2.
Claim 8
Dependent Claim
13 words
The apparatus according to claim 1 , wherein the first liquid is perfluorohexane.
Claim 9
Dependent Claim
26 words
The apparatus according to claim 1 , wherein the liquid confinement structure has a hydrophilic surface bordering the volume and a hydrophobic surface bordering the space.
Claim 10
Dependent Claim
19 words
The apparatus according to claim 1 , wherein the volume is between the liquid confinement structure and the substrate.
Claim 11
Dependent Claim
12 words
The apparatus according to claim 1 , wherein the volume is annular.
Claim 12
Dependent Claim
18 words
The apparatus according to claim 1 , wherein the second liquid is in contact with the first liquid.
Claim 13
Dependent Claim
28 words
The apparatus according to claim 1 , configured to project patterned radiation beam through the first liquid onto the target portion without substantially passing through the second liquid.
Claim 14
Independent Claim
62 words
A device manufacturing method comprisinging: projecting an image of a pattern through a first liquid onto a target portion of a substrate using a projection system, and at least partly confining the first liquid to a space between the projection system and the substrate by a volume of a second liquid, the second liquid having a different composition from the first liquid.
Claim 15
Independent Claim
62 words
A device manufacturing method comprisinging: projecting an image of a pattern through a first liquid onto a target portion of a substrate using a projection system, and at least partly confining the first liquid to a space between the projection system and the substrate by a volume of a second liquid, the second liquid having a different composition from the first liquid.
Claim 16
Dependent Claim
18 words
The method according to claim 13 , wherein the first liquid is substantially immiscible in the second liquid.
Claim 17
Dependent Claim
19 words
The method according to claim 14 , wherein the first liquid is non-polar and the second liquid is polar.
Claim 18
Dependent Claim
31 words
The method according to claim 15 , wherein the first liquid is selected from the group comprising: cycloalkane, other high-index hydrocarbon, perfluoropolyether, perfluoroalkane, and hydrofluoroether; and the second liquid comprises water.
Claim 19
Dependent Claim
23 words
The method according to claim 13 , wherein the first liquid is selected from the group comprising: cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane.
Claim 20
Dependent Claim
16 words
The method according to claim 13 , wherein the first liquid is perfluoro-N-methylmorpholine or perfluoro E2.
Claim 21
Dependent Claim
13 words
The method according to claim 13 , wherein the first liquid is perfluorohexane.
Claim 22
Dependent Claim
43 words
The method according to claim 13 , wherein the first liquid is confined to the space using at least in part a liquid confinement structure, the liquid confinement structure having a hydrophilic surface bordering the volume and a hydrophobic surface bordering the space.
Claim 23
Dependent Claim
33 words
The method according to claim 13 , wherein the volume is between the substrate and a liquid confinement structure used at least part in part to confine the first liquid in the space.
Claim 24
Dependent Claim
12 words
The method according to claim 13 , wherein the volume is annular.
Claim 25
Dependent Claim
18 words
The method according to claim 13 , wherein the second liquid is in contact with the first liquid.
Claim 26
Dependent Claim
123 words
A lithographic projection apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; and a liquid supply system configured to supply a first liquid to a space that extends between the projection system and the substrate, the liquid supply system comprising a liquid confinement structure substantially surrounding the space; a first liquid supply arranged to supply the first liquid to the space; and a second liquid supply arranged to supply a second liquid to confine the first liquid within the space such that, in use, the first liquid remains substantially in contact with a final lens of the projection system and the substrate, the second liquid having a different composition from the first liquid.
Claim 27
Dependent Claim
123 words
A lithographic projection apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; and a liquid supply system configured to supply a first liquid to a space that extends between the projection system and the substrate, the liquid supply system comprising a liquid confinement structure substantially surrounding the space; a first liquid supply arranged to supply the first liquid to the space; and a second liquid supply arranged to supply a second liquid to confine the first liquid within the space such that, in use, the first liquid remains substantially in contact with a final lens of the projection system and the substrate, the second liquid having a different composition from the first liquid.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2011-01-07 | 2011-07-09 | 2012-01-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2015-01-07 | 2015-07-09 | 2016-01-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2019-01-07 | 2019-07-09 | 2020-01-08 | $7700.00 | Window Closed / Lapsed |