US6763514B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for controlling rippling during optical proximity correction
Assignee: Synopsys Inc
•
Filing: 2001-12-12
•
Granted: 2004-07-13
•
Expires: 2021-12-12
Abstract
Abstract One embodiment of the present invention provides a system that controls rippling caused by optical proximity correction during an optical lithography process for manufacturing an integrated circuit. During operation, the system selects an evaluation point for a given segment, wherein the given segment is located on an edge in the layout of the integrated circuit. The system also selects a supplemental evaluation point for the given segment. Next, the system computes a deviation from a target location for the given segment at the evaluation point. The system also computes a supplemental deviation at the supplemental evaluation point. Next, the system adjusts a bias for the given segment, if necessary, based upon the deviation at the evaluation point. The system also calculates a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation at the supplemental evaluation point. If this ripple exceeds a threshold value, the system performs a ripple control operation.
Inventors
- 👤 Youping Zhang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:44
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/82; G03F1/84; G03F1/36; G03F7/00; G03F7/70; G03F7/70425; G03F7/70433; G03F7/70441
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
138 words
A method for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; and if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 2
Independent Claim
138 words
A method for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; and if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 3
Dependent Claim
35 words
The method of claim 1 , further comprising adjusting the bias again, if necessary, and performing the ripple control operation, if necessary, for each segment that is part of the layout of the integrated circuit.
Claim 4
Dependent Claim
40 words
The method of claim 1 , wherein prior to selecting the evaluation point for the given segment, the method further comprises: receiving a specification of the layout; and dissecting edges in the layout into segments for optical proximity correction purposes.
Claim 5
Dependent Claim
74 words
The method of claim 1 , wherein performing the ripple control operation involves performing a refinement operation that involves: selecting additional dissection points for the edge that cause the given segment to be divided into multiple segments; selecting additional evaluation points for the multiple segments; selecting additional supplemental evaluation points for the multiple segments; and adjusting the bias, if necessary, and performing the ripple control operation, if necessary, for each of the multiple segments.
Claim 6
Dependent Claim
21 words
The method of claim 4 , wherein selecting additional evaluation points involves using supplemental evaluation points as the additional evaluation points.
Claim 7
Dependent Claim
64 words
The method of claim 1 , wherein performing the ripple control operation involves performing a regeneration operation that involves: changing the location of dissection points for the edge to cause the edge to be divided into a different set of segments; and adjusting the bias, if necessary, and performing the ripple control operation, if necessary, for each segment in the different set of segments.
Claim 8
Dependent Claim
24 words
The method of claim 6 , wherein changing the location of the dissection points involves swapping dissection points and evaluation points for the edge.
Claim 9
Dependent Claim
53 words
The method of claim 1 , wherein performing the ripple control operation involves controlling the bias for the given segment so that the ripple for the given segment does not exceed the threshold value, wherein as a consequence of controlling the bias a critical dimension for the given segment may not meet specification.
Claim 10
Dependent Claim
23 words
The method of claim 1 , wherein computing the deviation for the given segment involves using a model-based technique for computing the deviation.
Claim 11
Dependent Claim
157 words
A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, the method comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; and if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 12
Dependent Claim
157 words
A computer-readable storage medium storing instructions that when executed by a computer cause the computer to perform a method for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, the method comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; and if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 13
Dependent Claim
39 words
The computer-readable storage medium of claim 10 , wherein the method further comprises adjusting the bias, if necessary, and performing the ripple control operation, if necessary, for each segment that is part of the layout of the integrated circuit.
Claim 14
Dependent Claim
42 words
The computer-readable storage medium of claim 10 , wherein prior to selecting the evaluation point for the given segment, the method further comprises: receiving a specification of the layout; and dissecting edges in the layout into segments for optical proximity correction purposes.
Claim 15
Dependent Claim
76 words
The computer-readable storage medium of claim 10 , wherein performing the ripple control operation involves performing a refinement operation that involves: selecting additional dissection points for the edge that cause the given segment to be divided into multiple segments; selecting additional evaluation points for the multiple segments; selecting additional supplemental evaluation points for the multiple segments; and adjusting the bias, if necessary, and performing the ripple control operation, if necessary, for each of the multiple segments.
Claim 16
Dependent Claim
23 words
The computer-readable storage medium of claim 13 , wherein selecting additional evaluation points involves using supplemental evaluation points as the additional evaluation points.
Claim 17
Dependent Claim
66 words
The computer-readable storage medium of claim 10 , wherein performing the ripple control operation involves performing a regeneration operation that involves: changing the location of dissection points for the edge to cause the edge to be divided into a different set of segments; and adjusting the bias, if necessary, and performing the ripple control operation, if necessary, for each segment in the different set of segments.
Claim 18
Dependent Claim
26 words
The computer-readable storage medium of claim 15 , wherein changing the location of the dissection points involves swapping dissection points and evaluation points for the edge.
Claim 19
Dependent Claim
55 words
The computer-readable storage medium of claim 10 , wherein performing the ripple control operation involves controlling the bias for the given segment so that the ripple for the given segment does not exceed the threshold value, wherein as a consequence of controlling the bias a critical dimension for the given segment may not meet specification.
Claim 20
Dependent Claim
25 words
The computer-readable storage medium of claim 10 , wherein computing the deviation for the given segment involves using a model-based technique for computing the deviation.
Claim 21
Independent Claim
175 words
An apparatus for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising: a selection mechanism that is configured to, select an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit, and to select at least one supplemental evaluation point for the given segment; a deviation computing mechanism that is configured to, compute a deviation from a target location for the given segment at the evaluation point, and to compute a supplemental deviation for the given segment at the at least one supplemental evaluation point; a bias adjustment mechanism that is configured to adjust a bias for the given segment, if necessary, based upon the deviation at the evaluation point; and a ripple control mechanism that is configured to, calculate a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation, and to perform a ripple control operation if the ripple for the given segment exceeds a threshold value.
Claim 22
Independent Claim
175 words
An apparatus for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising: a selection mechanism that is configured to, select an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit, and to select at least one supplemental evaluation point for the given segment; a deviation computing mechanism that is configured to, compute a deviation from a target location for the given segment at the evaluation point, and to compute a supplemental deviation for the given segment at the at least one supplemental evaluation point; a bias adjustment mechanism that is configured to adjust a bias for the given segment, if necessary, based upon the deviation at the evaluation point; and a ripple control mechanism that is configured to, calculate a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation, and to perform a ripple control operation if the ripple for the given segment exceeds a threshold value.
Claim 23
Dependent Claim
47 words
The apparatus of claim 19 , wherein for each segment that is part of the layout of the integrated circuit the bias adjustment mechanism is configured to adjust the bias, if necessary, and the ripple control mechanism is configured to perform the ripple control operation, if necessary.
Claim 24
Dependent Claim
35 words
The apparatus of claim 19 , further comprising a dissection mechanism that is configured to: receive a specification of the layout; and to dissect edges in the layout into segments for optical proximity correction purposes.
Claim 25
Dependent Claim
81 words
The apparatus of claim 19 , wherein while performing the ripple control operation, the ripple control mechanism is configured to: select additional dissection points for the edge that cause the given segment to be divided into multiple segments; select additional evaluation points for the multiple segments; select additional supplemental evaluation points for the multiple segments; adjust the bias, if necessary, for each of the multiple segments; and to perform the ripple control operation, if necessary, for each of the multiple segments.
Claim 26
Dependent Claim
21 words
The apparatus of claim 22 , wherein selecting additional evaluation points involves using supplemental evaluation points as the additional evaluation points.
Claim 27
Dependent Claim
74 words
The apparatus of claim 19 , wherein while performing the ripple control operation, the ripple control mechanism is configured to: change the location of dissection points for the edge to cause the edge to be divided into a different set of segments; adjust the bias, if necessary, for each segment in the different set of segments; and to perform the ripple control operation, if necessary, for each segment in the different set of segments.
Claim 28
Dependent Claim
24 words
The apparatus of claim 24 , wherein changing the location of the dissection points involves swapping dissection points and evaluation points for the edge.
Claim 29
Dependent Claim
60 words
The apparatus of claim 19 , wherein while performing the ripple control operation, the ripple control mechanism is configured to control the bias for the given segment so that the ripple for the given segment does not exceed the threshold value, wherein as a consequence of controlling the bias a critical dimension for the given segment may not meet specification.
Claim 30
Dependent Claim
25 words
The apparatus of claim 19 , wherein the deviation computing mechanism is configured to compute the deviation for the given segment using a model-based technique.
Claim 31
Dependent Claim
149 words
A mask to be used in an optical lithography process for manufacturing an integrated circuit, wherein the mask is created through a process that controls rippling caused by optical proximity correction, the process comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 32
Dependent Claim
149 words
A mask to be used in an optical lithography process for manufacturing an integrated circuit, wherein the mask is created through a process that controls rippling caused by optical proximity correction, the process comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 33
Dependent Claim
144 words
An integrated circuit created through a process that controls rippling caused by optical proximity correction during an optical lithography process used in manufacturing the integrated circuit, the process comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 34
Dependent Claim
144 words
An integrated circuit created through a process that controls rippling caused by optical proximity correction during an optical lithography process used in manufacturing the integrated circuit, the process comprising: selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit; selecting at least one supplemental evaluation point for the given segment; computing a deviation from a target location for the given segment at the evaluation point; computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation; if the ripple for the given segment exceeds a threshold value, performing a ripple control operation.
Claim 35
Dependent Claim
163 words
A means for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising: a selection means for, selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit, and for selecting at least one supplemental evaluation point for the given segment; a deviation computing means for, computing a deviation from a target location for the given segment at the evaluation point, and for computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; a bias adjustment means for adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; and a ripple control means for, calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation, and for performing a ripple control operation if the ripple for the given segment exceeds a threshold value.
Claim 36
Dependent Claim
163 words
A means for controlling rippling caused by optical proximity correction during an optical lithography process used in manufacturing an integrated circuit, comprising: a selection means for, selecting an evaluation point for a given segment that is part of an edge in a layout of the integrated circuit, and for selecting at least one supplemental evaluation point for the given segment; a deviation computing means for, computing a deviation from a target location for the given segment at the evaluation point, and for computing a supplemental deviation for the given segment at the at least one supplemental evaluation point; a bias adjustment means for adjusting a bias for the given segment, if necessary, based upon the deviation at the evaluation point; and a ripple control means for, calculating a ripple for the given segment based upon the deviation at the evaluation point and the supplemental deviation, and for performing a ripple control operation if the ripple for the given segment exceeds a threshold value.
References Cited (Backward Citations)
JPH0380525A
Cited
US5631110A
Cited
US5815685A
Cited
US5682323A
Cited
US5825647A
Cited
US6014456A
Cited
US6249597B1
Cited
US6154563A
Cited
US5723233A
Cited
US5991006A
Cited
GB2324169A
Cited
US6243855B1
Cited
US6081658A
Cited
US6289499B1
Cited
US6298473B1
Cited
WO2000067074A1
Cited
US6584609B1
Cited
US20020100004A1
Cited
US6453457B1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2007-07-13 | 2008-01-12 | 2008-07-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-07-13 | 2012-01-12 | 2012-07-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-07-13 | 2016-01-12 | 2016-07-13 | $7700.00 | Window Closed / Lapsed |