Patent US6730444B2 successfully refreshed from Google Patents.
US6730444B2
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US
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Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same
Assignee: Mosaid Technologies Inc
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Filing: 2001-06-05
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Granted: 2004-05-04
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Expires: 2021-06-05
Abstract
Abstract Needle comb reticle patterns for use in both critical dimension analysis and registration analysis with a registration tool are disclosed. One embodiment of a needle comb reticle pattern includes a box-in-box feature flanked on two adjacent sides by needle combs with tapered flat-tipped needles. Another embodiment of a needle comb reticle pattern includes a box-in-box feature flanked on two adjacent sides by needle combs with tapered flat-tipped needles and flanked on the other two adjacent sides by reference bars. Yet another embodiment of a needle comb reticle pattern includes two complementary needle comb reticle subpatterns, each subpattern including a box-in-box feature with four flanking needle combs. A registration tool can be used with the needle combs and reference bars to measure critical dimension of a semiconductor process. The registration tool can also be used with the box-in-box feature to measure registration between two adjacent layers during semiconductor fabrication. Reticles, fields within reticles, masks and wafers including the needle comb reticle pattern of the present invention are also disclosed. Additionally, methods for analyzing critical dimension and registration and characterizing needle comb reticle measurements to critical dimension using the needle comb reticle patterns of the present invention are also disclosed.
Inventors
- 👤 Steve W. Bowes
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 19:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G03F7/70625; G03F1/00; G03F1/38; G03F1/44; G03F7/70633; H; H10; H10W; H10W46/00; H10W46/501
Claims Analysis
Total Claims: 61
Claim 1
Independent Claim
162 words
A needle comb reticle pattern for use in process measurement during semiconductor substrate processing comprising: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 2
Dependent Claim
162 words
A needle comb reticle pattern for use in process measurement during semiconductor substrate processing comprising: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 3
Dependent Claim
36 words
The needle comb reticle pattern of claim 1 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a respective solid bar base and pointing toward the box-in-box feature.
Claim 4
Dependent Claim
26 words
The needle comb reticle pattern of claim 2 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 5
Dependent Claim
29 words
The needle comb reticle pattern of claim 3 , wherein each of the plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 6
Dependent Claim
22 words
The needle comb reticle pattern of claim 2 , wherein each of the plurality of needles is approximately 1.5 μm in length.
Claim 7
Dependent Claim
24 words
The needle comb reticle pattern of claim 2 , wherein the plurality of needles is mutually spaced at a pitch of approximately 0.25 μm.
Claim 8
Dependent Claim
28 words
The needle comb reticle pattern of claim 1 , wherein the needle comb reticle pattern is substantially square in shape with sides of approximately 22 μm in length.
Claim 9
Dependent Claim
183 words
A semiconductor reticle used in semiconductor fabrication comprising: at least one active device pattern; and a needle comb reticle pattern adjacent to the at least one active device pattern, wherein the needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame;. wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 10
Dependent Claim
183 words
A semiconductor reticle used in semiconductor fabrication comprising: at least one active device pattern; and a needle comb reticle pattern adjacent to the at least one active device pattern, wherein the needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame;. wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 11
Dependent Claim
33 words
The semiconductor reticle of claim 8 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature.
Claim 12
Dependent Claim
24 words
The semiconductor reticle of claim 8 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 13
Dependent Claim
27 words
The semiconductor reticle of claim 9 , wherein each of the plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 14
Dependent Claim
184 words
A semiconductor wafer comprising: at least one active device patern; and at least one needle comb reticle pattern adjacent to the at least one active device pattern, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 15
Dependent Claim
184 words
A semiconductor wafer comprising: at least one active device patern; and at least one needle comb reticle pattern adjacent to the at least one active device pattern, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 16
Dependent Claim
33 words
The semiconductor wafer of claim 12 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature.
Claim 17
Dependent Claim
24 words
The semiconductor wafer of claim 12 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 18
Dependent Claim
184 words
A semiconductor mask comprising: at least one active device pattern; and at least one needle comb reticle pattern adjacent to the at least one active device pattern, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box fame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 19
Dependent Claim
184 words
A semiconductor mask comprising: at least one active device pattern; and at least one needle comb reticle pattern adjacent to the at least one active device pattern, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box fame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 20
Dependent Claim
33 words
The semiconductor mask of claim 15 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature.
Claim 21
Dependent Claim
24 words
The semiconductor mask of claim 16 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 22
Dependent Claim
27 words
The semiconductor mask of claim 16 , wherein each of the plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 23
Dependent Claim
198 words
A needle comb reticle pattern for use in process measurement during semiconductor substrate processing comprising: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; and a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; a second reference bar proximately flanking the outer periphery of a fourth side of the outer box frame.
Claim 24
Dependent Claim
198 words
A needle comb reticle pattern for use in process measurement during semiconductor substrate processing comprising: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; and a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; a second reference bar proximately flanking the outer periphery of a fourth side of the outer box frame.
Claim 25
Dependent Claim
44 words
The needle comb reticle pattern of claim 19 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature and one of the first and second reference bars.
Claim 26
Dependent Claim
26 words
The needle comb reticle pattern of claim 20 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 27
Dependent Claim
29 words
The needle comb reticle pattern of claim 21 , wherein each of the plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 28
Dependent Claim
22 words
The needle comb reticle pattern of claim 20 , wherein each of the plurality of needles is approximately 1.5 μm in length.
Claim 29
Dependent Claim
26 words
The needle comb reticle pattern of claim 20 , wherein each of the plurality of needles is mutually spaced at a pitch of approximately 0.25 μm.
Claim 30
Dependent Claim
28 words
The needle comb reticle pattern of claim 19 , wherein the needle comb reticle pattern is substantially square in shape with sides of approximately 25 μm in length.
Claim 31
Dependent Claim
220 words
A semiconductor reticle used in semiconductor fabrication comprising: at least one active device pattern; and a needle comb reticle pattern adjacent to the at least one active device pattern, wherein the needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; and a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanging the outer periphery of a fourth side of the outer box frame.
Claim 32
Dependent Claim
220 words
A semiconductor reticle used in semiconductor fabrication comprising: at least one active device pattern; and a needle comb reticle pattern adjacent to the at least one active device pattern, wherein the needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; and a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanging the outer periphery of a fourth side of the outer box frame.
Claim 33
Dependent Claim
42 words
The semiconductor reticle of claim 26 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature and one of the first and second reference bars.
Claim 34
Dependent Claim
24 words
The semiconductor reticle of claim 27 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 35
Dependent Claim
27 words
The semiconductor reticle of claim 28 , wherein each of the plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 36
Dependent Claim
219 words
A semiconductor wafer comprising: at least one active device pattern; and at least one needle comb reticle pattern adjacent to the at least one active device pattern, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; a reference bar proximately flan the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanking the outer periphery of a fourth side of the outer box frame.
Claim 37
Dependent Claim
219 words
A semiconductor wafer comprising: at least one active device pattern; and at least one needle comb reticle pattern adjacent to the at least one active device pattern, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; a reference bar proximately flan the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanking the outer periphery of a fourth side of the outer box frame.
Claim 38
Dependent Claim
42 words
The semiconductor wafer of claim 30 , wherein each of the first and second needle combs comes a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature and one of the first and second reference bars.
Claim 39
Dependent Claim
24 words
The semiconductor wafer of claim 31 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 40
Dependent Claim
220 words
A semiconductor mask comprising: at least one active device pattern; and at least one needle comb reticle pattern adjacent to the at least one active device patter, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanking the outer periphery of a fourth side of the otter box frame.
Claim 41
Dependent Claim
220 words
A semiconductor mask comprising: at least one active device pattern; and at least one needle comb reticle pattern adjacent to the at least one active device patter, wherein the at least one needle comb reticle pattern comprises: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanking the outer periphery of a fourth side of the otter box frame.
Claim 42
Dependent Claim
42 words
The semiconductor mask of claim 33 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature and one of the first and second reference bars.
Claim 43
Dependent Claim
24 words
The semiconductor mask of claim 34 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 44
Dependent Claim
27 words
The semiconductor mask of claim 34 , wherein each of the plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 45
Independent Claim
255 words
A method of analyzing critical dimension and registration with needle comb reticle patterns using a registration tool, the method comprising: providing a semiconductor wafer with at least one needle comb reticle pattern, including configuring the at least one needle comb reticle pattern to include: a box-in-box feature including an solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; providing a registration tool including: a registration tool stage; an optical registration tool; and a monitor electrically coupled to the optical registration tool; placing the semiconductor wafer on the registration tool stage; aligning the optical registration tool with the at least one needle comb reticle pattern; and analyzing critical dimension and registration from lengths measured from the at least one needle comb reticle pattern.
Claim 46
Independent Claim
255 words
A method of analyzing critical dimension and registration with needle comb reticle patterns using a registration tool, the method comprising: providing a semiconductor wafer with at least one needle comb reticle pattern, including configuring the at least one needle comb reticle pattern to include: a box-in-box feature including an solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; providing a registration tool including: a registration tool stage; an optical registration tool; and a monitor electrically coupled to the optical registration tool; placing the semiconductor wafer on the registration tool stage; aligning the optical registration tool with the at least one needle comb reticle pattern; and analyzing critical dimension and registration from lengths measured from the at least one needle comb reticle pattern.
Claim 47
Dependent Claim
54 words
The method of claim 37 , further comprising configuring the at least one needle comb reticle pattern to include a first reference bar flanking the outer periphery of a third side of the outer box frame and a second reference bar flanking the outer periphery of a fourth side of the outer box frame.
Claim 48
Dependent Claim
41 words
The method of claim 38 , wherein each of the first and second needle combs comprises a plurality of needles emanating from a solid bar base and pointing toward the box-in-box feature and one of the first and second reference bars.
Claim 49
Dependent Claim
23 words
The method of claim 39 , wherein each of the plurality of needles tapers in width in stair-step fashion to a flat tip.
Claim 50
Dependent Claim
26 words
The method of claim 40 , wherein each of tie plurality of needles tapers in width from larger than stepper resolution to smaller than stepper resolution.
Claim 51
Dependent Claim
27 words
The method of claim 37 , further comprising repeating the aligning and the analyzing for the at least one needle comb reticle pattern on the semiconductor wafer.
Claim 52
Dependent Claim
196 words
A field of a reticle comprising: a rectangular window encompassing a plurality of active device patterns; and a plurality of needle comb reticle patterns encompassed within the rectangular window and adjacent to the plurality of active device patterns, wherein each of the plurality of needle comb reticle patterns includes: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 53
Dependent Claim
196 words
A field of a reticle comprising: a rectangular window encompassing a plurality of active device patterns; and a plurality of needle comb reticle patterns encompassed within the rectangular window and adjacent to the plurality of active device patterns, wherein each of the plurality of needle comb reticle patterns includes: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; and a second needle comb proximately flanking the outer periphery of a second side of the outer box frame.
Claim 54
Dependent Claim
35 words
The field of a reticle of claim 43 , wherein the plurality of needle comb reticle patterns comprises four needle comb reticle patterns, each of which is located near a comer of the rectangular window.
Claim 55
Dependent Claim
232 words
A field of a reticle comprising: a rectangular window encompassing a plurality of active device patterns; and a plurality of needle comb reticle patterns encompassed within the rectangular window and adjacent to the plurality of active device patterns, wherein each of the plurality of needle comb reticle patterns includes: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box fame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanking the outer periphery of a fourth side of the outer box frame.
Claim 56
Dependent Claim
232 words
A field of a reticle comprising: a rectangular window encompassing a plurality of active device patterns; and a plurality of needle comb reticle patterns encompassed within the rectangular window and adjacent to the plurality of active device patterns, wherein each of the plurality of needle comb reticle patterns includes: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box fame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; a first reference bar proximately flanking the outer periphery of a third side of the outer box frame; and a second reference bar proximately flanking the outer periphery of a fourth side of the outer box frame.
Claim 57
Dependent Claim
35 words
The field of a reticle of claim 45 , wherein the plurality of needle comb reticle patterns comprises four needle comb reticle patterns, each of which is located near a comer of the rectangular window.
Claim 58
Dependent Claim
180 words
A needle comb reticle pattern for use in process measurement during semiconductor substrate processing comprising: a first needle comb reticle subpattern comprising: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; first and second needle combs proximately flanking the outer box frame on two opposite peripheral sides of the outer box frame having needles aligned with an axis connecting the first and second needle combs and the inner box; and third and fourth needle combs flanking the outer box frame on two other opposite peripheral sides of the outer box frame having needles aligned with an axis connecting the third and fourth needle combs and the inner box; and a second needle comb reticle subpattern adjacent to a single side of the first needle comb reticle subpattern having substantially identically dimensioned complementary features relative to the first needle comb reticle subpattern.
Claim 59
Dependent Claim
180 words
A needle comb reticle pattern for use in process measurement during semiconductor substrate processing comprising: a first needle comb reticle subpattern comprising: a box-in-box feature including a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; first and second needle combs proximately flanking the outer box frame on two opposite peripheral sides of the outer box frame having needles aligned with an axis connecting the first and second needle combs and the inner box; and third and fourth needle combs flanking the outer box frame on two other opposite peripheral sides of the outer box frame having needles aligned with an axis connecting the third and fourth needle combs and the inner box; and a second needle comb reticle subpattern adjacent to a single side of the first needle comb reticle subpattern having substantially identically dimensioned complementary features relative to the first needle comb reticle subpattern.
Claim 60
Independent Claim
258 words
A method of characterizing measurements from a needle comb reticle pattern to pattern critical dimension comprising: generating a focus-exposure matrix; defining a process window for actual pattern critical dimension; defining an equivalent window for a needle comb reticle mark wherein the needle comb reticle mark includes a box-in-box feature including: a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; determining whether the needle comb reticle mark is within the equivalent window; and if the needle comb reticle mark is inside the equivalent window, then critical dimension will also be within the process window, indicating process is in control; and if the needle comb reticle mark is outside the equivalent window, then critical dimension will also be outside the process window, indicating the process needs adjustment.
Claim 61
Independent Claim
258 words
A method of characterizing measurements from a needle comb reticle pattern to pattern critical dimension comprising: generating a focus-exposure matrix; defining a process window for actual pattern critical dimension; defining an equivalent window for a needle comb reticle mark wherein the needle comb reticle mark includes a box-in-box feature including: a solid inner box having an outer periphery substantially defined by four substantially straight sides and an outer box frame having an inner periphery substantially defined by four inner substantially straight sides and an outer periphery substantially defined by four outer substantially straight sides; wherein the outer box frame surrounds the inner box and a gap separates the outer periphery of the inner box and inner periphery of the outer box frame; wherein the gap between the outer periphery of the inner box and the inner periphery of the outer box frame is substantially uniform along each side of the inner box and outer box frame; a first needle comb proximately flanking the outer periphery of a first side of the outer box frame; a second needle comb proximately flanking the outer periphery of a second side of the outer box frame; determining whether the needle comb reticle mark is within the equivalent window; and if the needle comb reticle mark is inside the equivalent window, then critical dimension will also be within the process window, indicating process is in control; and if the needle comb reticle mark is outside the equivalent window, then critical dimension will also be outside the process window, indicating the process needs adjustment.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2007-05-04 | 2007-11-03 | 2008-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-05-04 | 2011-11-03 | 2012-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-05-04 | 2015-11-03 | 2016-05-04 | $7700.00 | Window Closed / Lapsed |