Abstract A print bias target is imaged in a single layer of light-sensitive material. The print bias target is made up of a pair of concentric geometric shapes in which a plurality of target regions forms a plurality of isolated edges. Each target region is of a different image structure than each other target region immediately adjacent thereto. The positioning of a given isolated edge in the print bias target is determined relative to a corresponding isolated edge in the design image from which the print bias target was imaged. Focus setting and/or exposure setting for a lithographic system to minimize print bias may be determined using print bias information obtained from a print bias target matrix of varying exposure and focus. An imaging aberration may also be identified using print bias information from a print bias target matrix, such as lithographic astigmatism, lithographic coma and vibration. A slope of an imaging profile may also be determined from print bias information. Overlay may be determined by imaging a print bias target on top of a prior level image to create an overlay target, determining a center of the prior level image, determining an average center of the print bias target and determining a location of the average center relative to the prior level image center, thereby determining the overlay.
A mask comprising a design image for imaging a print bias target in a single layer of light-sensitive material for determining print bias in a lithographic system, said design image comprising a plurality of target regions, each of said plurality of target regions having an image structure different from that of each other of said plurality of target regions immediately adjacent thereto, said plurality of target regions forming a plurality of isolated edges in said print bias target, wherein said design image comprises a binary design image, wherein said plurality of target regions comprise a first region having a positive polarity image structure and a second region having a negative polarity image structure, wherein said plurality of target regions comprises a first L-shaped region of a first polarity, a second triangular-shaped region of a second polarity immediately adjacent to said first L-shaped region, a third triangular-shaped region of said first polarity immediately adjacent to said second triangular-shaped region, a fourth L-shaped region of said second polarity immediately adjacent to said third triangular-shaped region and a fifth L-shaped region of said first polarity immediately adjacent to said fourth L-shaped region.
Claim 2
Dependent Claim
189 words
A mask comprising a design image for imaging a print bias target in a single layer of light-sensitive material for determining print bias in a lithographic system, said design image comprising a plurality of target regions, each of said plurality of target regions having an image structure different from that of each other of said plurality of target regions immediately adjacent thereto, said plurality of target regions forming a plurality of isolated edges in said print bias target, wherein said design image comprises a binary design image, wherein said plurality of target regions comprise a first region having a positive polarity image structure and a second region having a negative polarity image structure, wherein said plurality of target regions comprises a first L-shaped region of a first polarity, a second triangular-shaped region of a second polarity immediately adjacent to said first L-shaped region, a third triangular-shaped region of said first polarity immediately adjacent to said second triangular-shaped region, a fourth L-shaped region of said second polarity immediately adjacent to said third triangular-shaped region and a fifth L-shaped region of said first polarity immediately adjacent to said fourth L-shaped region.