Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
178 words
A method of fabricating a monolithic bulk acoustic wave (BAW) duplexer having a transmitter section as a first component filter and a receiver section as a second component filter, both component filters fabricated on a single substrate and both including at least one shunt BAW resonator and one series BAW resonator, each BAW resonator including a resonator section atop an isolation structure provided so as to separate the resonator section from the substrate, the method comprising the steps of: a) depositing and patterning bottom electrode material for use as the bottom electrode of each of the resonators of the duplexer; b) depositing and patterning piezoelectric material for use as the piezolayer of each of the resonators of the duplexer; c) depositing and patterning top electrode material for use as the top electrode of each of the resonators of the duplexer; d) providing a tuning layer for the shunt resonator of each of the two component duplexer filters; and e) providing a tuning layer for both the series and shunt resonators of one of the two component duplexer filters.
Claim 2
Independent Claim
178 words
A method of fabricating a monolithic bulk acoustic wave (BAW) duplexer having a transmitter section as a first component filter and a receiver section as a second component filter, both component filters fabricated on a single substrate and both including at least one shunt BAW resonator and one series BAW resonator, each BAW resonator including a resonator section atop an isolation structure provided so as to separate the resonator section from the substrate, the method comprising the steps of: a) depositing and patterning bottom electrode material for use as the bottom electrode of each of the resonators of the duplexer; b) depositing and patterning piezoelectric material for use as the piezolayer of each of the resonators of the duplexer; c) depositing and patterning top electrode material for use as the top electrode of each of the resonators of the duplexer; d) providing a tuning layer for the shunt resonator of each of the two component duplexer filters; and e) providing a tuning layer for both the series and shunt resonators of one of the two component duplexer filters.
Claim 3
Dependent Claim
55 words
The method of claim 1 , wherein the shunt tuning layer is deposited in a location in each shunt resonator selected from the group consisting of: between the isolation structure and the bottom electrode; between the bottom electrode and the piezolayer; between the top electrode and the piezolayer; and on top of the top electrode.
Claim 4
Dependent Claim
75 words
The method of claim 1 , wherein the tuning layer for both the series and shunt resonators of one of the two component filters is deposited in a location, in both the series and shunt resonators of the component filter, selected from the group consisting of: between the isolation structure and the bottom electrode; between the bottom electrode and the piezolayer; between the top electrode and the piezolayer; and on top of the top electrode.
Claim 5
Dependent Claim
14 words
The method of claim 1 , wherein each isolation structure is an acoustic mirror.
Claim 6
Dependent Claim
196 words
The method of claim 4 , further comprising the step of providing the acoustic mirror and also providing at least one planar spiral inductor having coils spiraling outward substantially in a plane from an innermost coil to an outermost coil, the step of providing the acoustic mirror and planar spiral inductor comprising in turn the steps of: a) depositing on the substrate, over the entire surface of the substrate, a first metallic material; b) removing the first metallic material everywhere except where the coils are to be provided, and where the first layer of the acoustic mirror for each BAW resonator is to be provided; c) depositing a first dielectric material over the entire exposed surface; d) providing a via directed to the beginning of the innermost coil; e) depositing a second metallic material over the entire exposed surface and so as to fill the via and come into contact with the first metallic material; and f) removing the second metallic material everywhere except where an arm connecting the innermost coil to a terminal is to be provided, and where a second metallic layer of the acoustic mirror for each BAW resonator is to be provided.
Claim 7
Dependent Claim
164 words
A monolithic bulk acoustic wave (BAW) duplexer having a transmitter section as a first component filter and a receiver section as a second component filter, both component filters fabricated on a single substrate and both including at least one shunt BAW resonator and one series BAW resonator, each BAW resonator including a resonator section atop an isolation structure provided so as to separate the resonator section from the substrate, comprising: a) a patterned bottom electrode material for use as the bottom electrode of each of the resonators of the duplexer; b) a patterned piezoelectric material for use as the piezolayer of each of the resonators of the duplexer; c) a patterned top electrode material for use as the top electrode of each of the resonators of the duplexer; d) a tuning layer for the shunt resonator of each of the two component duplexer filters; and e) a tuning layer for both the series and shunt resonators of one of the two component duplexer filters.
Claim 8
Dependent Claim
164 words
A monolithic bulk acoustic wave (BAW) duplexer having a transmitter section as a first component filter and a receiver section as a second component filter, both component filters fabricated on a single substrate and both including at least one shunt BAW resonator and one series BAW resonator, each BAW resonator including a resonator section atop an isolation structure provided so as to separate the resonator section from the substrate, comprising: a) a patterned bottom electrode material for use as the bottom electrode of each of the resonators of the duplexer; b) a patterned piezoelectric material for use as the piezolayer of each of the resonators of the duplexer; c) a patterned top electrode material for use as the top electrode of each of the resonators of the duplexer; d) a tuning layer for the shunt resonator of each of the two component duplexer filters; and e) a tuning layer for both the series and shunt resonators of one of the two component duplexer filters.
Claim 9
Dependent Claim
57 words
The monolithic BAW duplexer of claim 6 , wherein the shunt tuning layer is provided in a location in each shunt resonator selected from the group consisting of: between the isolation structure and the bottom electrode; between the bottom electrode and the piezolayer; between the top electrode and the piezolayer; and on top of the top electrode.
Claim 10
Dependent Claim
77 words
The monolithic BAW duplexer of claim 6 , wherein the tuning layer for both the series and shunt resonators of one of the two component filters is provided in a location, in both the series and shunt resonators of the component filter, selected from the group consisting of: between the isolation structure and the bottom electrode; between the bottom electrode and the piezolayer; between the top electrode and the piezolayer; and on top of the top electrode.
Claim 11
Dependent Claim
16 words
The monolithic BAW duplexer of claim 6 , wherein each isolation structure is an acoustic mirror.
Claim 12
Dependent Claim
49 words
The monolithic BAW duplexer of claim 6 , further comprising at least one planar spiral inductor included in one or another layer of material deposited on the single substrate, the planar spiral inductor having coils spiraling outward substantially in a plane from an innermost coil to an outermost coil.