Patent US6358361B1 successfully refreshed from Google Patents.
US6358361B1
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US
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Plasma processor
Assignee: Tokyo Electron Ltd
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Filing: 1999-06-21
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Granted: 2002-03-19
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Expires: 2019-06-21
Abstract
Abstract The reactor 1 has an upper end portion attached with a ring member 10 supporting an annular seal plate 4 . The ring member 10 has an upper surface attached with a cylindrical block member 25 screwed to the ring member 10 . The block member 25 has a portion opposing the annular seal plate 4 , the portion being formed with an annular waveguide antenna portion 12 . The annular waveguide antenna portion 12 has a bottom portion fitted by an annular plate member 16 formed with a plurality of slits 15, 15 . . . at a predetermined circumferential interval. A heating block 26 made of aluminum shaped into a cylindrical form is embedded detachably within the block member 25 . The heating block 26 has a bottom surface detachably attached with an electrode 18 by screws. The electrode 18 is earthed. According to the plasma processing apparatus with such a constitution as above, even if the reactor 1 has a large diameter, an overall size of the apparatus can be made as small as possible, making possible to install within a small space. Further, directivity of ions entering into a work is improved, and life of the reactor 1 becomes long.
Inventors
- 👤 Naoki Matsumoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 09:08
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/24; H05H1/46; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32247; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/511
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
123 words
A plasma processing apparatus characterized by comprising: an antenna emitting a microwave, a container into which the microwave emitted from the antenna is to be introduced, a table being provided in the container, being connected to an electrical power source for application of a high frequency wave, for placing a work to be processed by plasma generated by the microwave introduced into the container, and an electrode being provided in the container, facing the table, wherein the container has a sealing member provided at a location surrounding a perimeter of the electrode, the antenna is faced with the sealing member, and the plasma processing apparatus is adapted that the microwave emitted from the antenna is introduced into the container through the sealing member.
Claim 2
Dependent Claim
123 words
A plasma processing apparatus characterized by comprising: an antenna emitting a microwave, a container into which the microwave emitted from the antenna is to be introduced, a table being provided in the container, being connected to an electrical power source for application of a high frequency wave, for placing a work to be processed by plasma generated by the microwave introduced into the container, and an electrode being provided in the container, facing the table, wherein the container has a sealing member provided at a location surrounding a perimeter of the electrode, the antenna is faced with the sealing member, and the plasma processing apparatus is adapted that the microwave emitted from the antenna is introduced into the container through the sealing member.
Claim 3
Dependent Claim
21 words
The plasma processing apparatus according to claim 1 , wherein the electrode is made of a material of a silicon family.
Claim 4
Dependent Claim
36 words
The plasma processing apparatus according to claim 1 , wherein the electrode is connected to a path for introducing a gas into the container, being formed with a hole for supplying the gas into the container.
Claim 5
Dependent Claim
22 words
The plasma processing apparatus according to claim 3 , wherein the path is provided with a space for diffusing the introduced gas.
Claim 6
Dependent Claim
22 words
The plasma processing apparatus according to any of claim 1 , further comprising a device for controlling a temperature of the electrode.
Claim 7
Dependent Claim
25 words
The plasma processing apparatus according to any of claim 1 , further comprising a power source for applying a high frequency wave to the electrode.
Claim 8
Dependent Claim
49 words
The plasma processing apparatus according to any of claim 1 , wherein the antenna has a waveguide path for introducing the microwave, being formed in an annular shape, a C-shape or a spiral shape, and the waveguide path having a portion formed with a slit facing the sealing member.
Claim 9
Dependent Claim
17 words
The plasma processing apparatus according to claim 7 , wherein the waveguide is embedded with a dielectric.
Claim 10
Dependent Claim
123 words
A plasma processing apparatus characterized by comprising: an antenna emitting a microwave, a container into which the microwave emitted from the antenna is to be introduced, a table being provided in the container for placing a work to be processed by plasma generated by the microwave introduced into the container, and an electrode being provided in the container, being connected to an electrical power source for application of a high frequency wave, facing the table, wherein the container has a sealing member provided at a location surrounding a perimeter of the electrode, the antenna is faced with the sealing member, and the plasma processing apparatus is adapted that the microwave emitted from the antenna is introduced into the container through the sealing member.
Claim 11
Dependent Claim
123 words
A plasma processing apparatus characterized by comprising: an antenna emitting a microwave, a container into which the microwave emitted from the antenna is to be introduced, a table being provided in the container for placing a work to be processed by plasma generated by the microwave introduced into the container, and an electrode being provided in the container, being connected to an electrical power source for application of a high frequency wave, facing the table, wherein the container has a sealing member provided at a location surrounding a perimeter of the electrode, the antenna is faced with the sealing member, and the plasma processing apparatus is adapted that the microwave emitted from the antenna is introduced into the container through the sealing member.
Claim 12
Dependent Claim
21 words
The plasma processing apparatus according to claim 9 , wherein the electrode is made of a material of a silicon family.
Claim 13
Dependent Claim
36 words
The plasma processing apparatus according to claim 9 , wherein the electrode is connected to a path for introducing a gas into the container, being formed with a hole for supplying the gas into the container.
Claim 14
Dependent Claim
22 words
The plasma processing apparatus according to claim 11 , wherein the path is provided with a space for diffusing the introduced gas.
Claim 15
Dependent Claim
23 words
The plasma processing apparatus according to any of claim 9 , further comprising a device for controlling of a temperature of the electrode.
Claim 16
Dependent Claim
25 words
The plasma processing apparatus according to any of claim 9 , further comprising a power source for applying a high frequency wave to the table.
Claim 17
Dependent Claim
48 words
The plasma processing apparatus according to any of claims 9 , wherein the antenna has a waveguide path for introducing the microwave, being formed in a annular shape, a C-shape or spiral shape, and the waveguide path having a portion formed with a slit, facing the sealing member.
Claim 18
Dependent Claim
17 words
The plasma processing apparatus according to claim 15 , wherein the waveguide is embedded with a dielectric.
References Cited (Backward Citations)
JPS625600A
Cited
JPS6299481A
Cited
US5134965A
Cited
JPH0543097A
Cited
US5538699A
Cited
JPH05345982A
Cited
US5487875A
Cited
JPH05129095A
Cited
JPH06112141A
Cited
JPH06112138A
Cited
JPH07335633A
Cited
JPH097793A
Cited
JPH08273894A
Cited
TW328617B
Cited
JPH10242124A
Cited
JPH1140397A
Cited
JPH1197424A
Cited
JPH11121196A
Cited
US6076484A
Cited
JPH11204295A
Cited
JPH10233295A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-03-18 | 2005-09-17 | 2006-03-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-03-18 | 2009-09-17 | 2010-03-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-03-18 | 2013-09-17 | 2014-03-19 | $7700.00 | Window Closed / Lapsed |