TW328617B
Expired / Lapsed
TW
⏱️ 0.0 years remaining
Plasma processing device and plasma processing method
Assignee: Sumitomo Metal Ind
•
Filing: 1997-03-27
•
Granted: 1998-03-21
•
Expires: 2017-03-27
Abstract
Abstract A plasma processing device, which comprises microwave supply means, a reaction container having a microwave introducing window and a specimen platform opposite the microwave introducing window, means for introducing a high frequency wave to the specimen platform, and corresponding electrodes opposite the specimen platform and with the circuit earthed; which is characterized in that: the corresponding electrodes are installed on the periphery of the microwave introducing window on the inside of the reaction container.
Inventors
- 👤 Hirotsugu Umabuchi
- 👤 Toshiyasu Hayamizu
- 👤 Tomomi Murakami
- 👤 Naohiko Takeda
- 👤 Masumi Tsuyuguchi
- 👤 Katsuo Katayama
Bibliographic Details
Application Number
—
Jurisdiction
TW
Data Source
google_patents
Last Synchronized
2026-11-09 09:10
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/24; H05H1/46; B; B05; B05D; B05D1/00; B05D1/62; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/50; C23C16/511; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32238; H01J2237/00; H01J2237/02; H01J2237/022
Claims Analysis
Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.