US6110798A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of fabricating an isolation structure on a semiconductor substrate
Assignee: Micron Technology Inc
•
Filing: 1998-02-11
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Granted: 2000-08-29
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Expires: 2018-02-11
Abstract
Abstract A method of forming an isolated structure of sufficient size to permit the fabrication of an active device thereon is comprised of the steps of depositing a gate oxide layer on a substrate. Material, such as a polysilicon layer and a nitride layer, is deposited on the gate oxide layer to protect the gate oxide layer. An active area is defined, typically by patterning a layer of photoresist. The protective material, the layer of oxide, and finally the substrate are etched to form a trench around the active area. Spacers are formed on the sides of the active area. The substrate is etched to deepen the trench around the active area to a point below the spacers. The substrate is oxidized at the bottom of the trench and horizontally under the active area to at least partially isolate the active area from the substrate. Oxide spacers are formed on the sides of the active area to fill exposed curved oxide regions and the remainder of the trench may be filled with an oxide.
Inventors
- 👤 Fernando Gonzalez
- 👤 Chandra Mouli
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 01:47
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/05; H10B12/30; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/012; H10W10/0121; H10W10/10; H10W10/13; H10B12/31; H10B12/312
Claims Analysis
Total Claims: 37
Claim 1
Independent Claim
123 words
A method of forming an isolated structure on a substrate, comprising: depositing a protective material to protect the substrate; defining an active area; a first etching of the protective material and the substrate to form a trench around the active area; forming spacers on sides of the active area; etching the substrate to deepen the trench around the active area, wherein the trench has a bottom; oxidizing the substrate at the bottom of the trench and horizontally under the active area to form curved oxidized regions and to isolate at least a portion of the active area from the substrate; and forming oxide spacers on the sides of the isolated portion of the active area, said spacers formed on the curved oxidized regions.
Claim 2
Independent Claim
123 words
A method of forming an isolated structure on a substrate, comprising: depositing a protective material to protect the substrate; defining an active area; a first etching of the protective material and the substrate to form a trench around the active area; forming spacers on sides of the active area; etching the substrate to deepen the trench around the active area, wherein the trench has a bottom; oxidizing the substrate at the bottom of the trench and horizontally under the active area to form curved oxidized regions and to isolate at least a portion of the active area from the substrate; and forming oxide spacers on the sides of the isolated portion of the active area, said spacers formed on the curved oxidized regions.
Claim 3
Dependent Claim
17 words
The method of claim 1, further comprising after forming oxide spacers, filling the trench with a material.
Claim 4
Dependent Claim
16 words
The method of claim 2, wherein filling the trench includes filling the trench with an oxide.
Claim 5
Dependent Claim
17 words
The method of claim 2, further comprising after filling the trench, planarizing the material in the trench.
Claim 6
Dependent Claim
23 words
The method of claim 1, wherein oxidizing the substrate at the bottom of the trench includes forming curved oxidized regions that are protrusions.
Claim 7
Dependent Claim
23 words
The method of claim 1, wherein oxidizing the substrate at the bottom of the trench includes forming curved oxidized regions that are recesses.
Claim 8
Dependent Claim
34 words
The method of claim 1 further comprising depositing an oxide layer on the substrate before depositing the protective material, and wherein the first etching includes etching the protective material and the layer of oxide.
Claim 9
Dependent Claim
28 words
The method of claim 7 wherein depositing material includes depositing a layer of polysilicon on the oxide layer and depositing a layer of nitride on the polysilicon layer.
Claim 10
Dependent Claim
28 words
The method of claim 8 wherein defining an active area includes applying a layer of photoresist on the nitride layer and patterning the photoresist according to a mask.
Claim 11
Dependent Claim
18 words
The method of claim 1, wherein etching the substrate to deepen the trench includes performing an anisotropic etch.
Claim 12
Dependent Claim
18 words
The method of claim 1, wherein etching the substrate to deepen the trench includes performing an isotropic etch.
Claim 13
Dependent Claim
23 words
The method of claim 1, wherein etching the substrate to deepen the trench includes performing both an anisotropic etch and an isotropic etch.
Claim 14
Dependent Claim
24 words
The method of claim 1, wherein etching the substrate to deepen the trench includes undercutting the spacers on the sides of the active area.
Claim 15
Dependent Claim
37 words
The method of claim 13, wherein etching the substrate to deepen the trench includes: anisotropically etching the trench; forming an oxide layer in the bottom of the trench; and performing a wet etch to undercut the spacers.
Claim 16
Dependent Claim
51 words
The method of claim 14, wherein forming an oxide layer in the bottom of the trench includes: implanting oxygen in the bottom of the trench; and exposing the bottom of the trench to a temperature sufficient to cause the oxygen in the bottom of the trench to form the oxide layer.
Claim 17
Dependent Claim
22 words
The method of claim 1, further comprising, before depositing the protective material, forming an oxide layer on sides of the active area.
Claim 18
Dependent Claim
35 words
The method of claim 16, wherein forming an oxide layer on sides of the active area includes: forming an oxide layer on the substrate; and removing the oxide layer from horizontal surfaces of the substrate.
Claim 19
Dependent Claim
22 words
The method of claim 17, wherein removing the oxide layer from horizontal surfaces of the substrate includes anisotropically etching the oxide layer.
Claim 20
Dependent Claim
28 words
The method of claim 8 wherein forming an oxide layer on the sides of the active area includes forming nitride spacers on the sides of the active area.
Claim 21
Dependent Claim
31 words
The method of claim 1 wherein etching the substrate to deepen the trench includes leaving the spacers on a ledge formed around a periphery of the substrate supporting the active area.
Claim 22
Dependent Claim
20 words
The method of claim 1 wherein oxidizing the substrate at the bottom of the trench includes thermally oxidizing the substrate.
Claim 23
Dependent Claim
18 words
The method of claim 1 wherein forming oxide spacers includes forming oxide spacers using a triethylene oxysilisilane gas.
Claim 24
Dependent Claim
26 words
The method of claim 8 wherein filling the trench with oxide includes depositing a layer of oxide and removing the oxide down to the polysilicon layer.
Claim 25
Dependent Claim
27 words
The method of claim 23 further comprising etching the oxide filling the trench to about a level of the oxide layer, and stripping the layer of polysilicon.
Claim 26
Dependent Claim
19 words
The method of claim 1 further comprising fabricating an active device in the isolated portion of the active area.
Claim 27
Dependent Claim
19 words
The method of claim 1 wherein oxidizing is performed until the active area is completely isolated from the substrate.
Claim 28
Dependent Claim
19 words
The method of claim 1 wherein oxidizing is terminated before the active area is completely isolated from the substrate.
Claim 29
Independent Claim
139 words
A method of forming a plurality of isolated structures on a substrate, comprising: depositing an oxide layer on a substrate; depositing a layer of polysilicon on the oxide layer; depositing a layer of nitride on the polysilicon layer; defining active areas; etching the nitride layer, polysilicon layer, oxide layer, and the substrate to form trenches surrounding each of the active areas; forming nitride spacers on sides of the active areas; etching the substrate to deepen the trenches around the active areas; thermally oxidizing the substrate at a bottom of the trenches and horizontally under the active areas to form curved oxidized regions and to isolate at least a portion of the active areas from the substrate; and forming oxide spacers on the sides of the isolated portion of the active area, said spacers formed on the curved oxidized regions.
Claim 30
Independent Claim
139 words
A method of forming a plurality of isolated structures on a substrate, comprising: depositing an oxide layer on a substrate; depositing a layer of polysilicon on the oxide layer; depositing a layer of nitride on the polysilicon layer; defining active areas; etching the nitride layer, polysilicon layer, oxide layer, and the substrate to form trenches surrounding each of the active areas; forming nitride spacers on sides of the active areas; etching the substrate to deepen the trenches around the active areas; thermally oxidizing the substrate at a bottom of the trenches and horizontally under the active areas to form curved oxidized regions and to isolate at least a portion of the active areas from the substrate; and forming oxide spacers on the sides of the isolated portion of the active area, said spacers formed on the curved oxidized regions.
Claim 31
Dependent Claim
17 words
The method of claim 28, further comprising after forming oxide spacers, filling the trench with a material.
Claim 32
Dependent Claim
16 words
The method of claim 29, wherein filling the trench includes filling the trench with an oxide.
Claim 33
Dependent Claim
17 words
The method of claim 29, further comprising after filling the trench, planarizing the material in the trench.
Claim 34
Dependent Claim
26 words
The method of claim 30 wherein filling the trench with oxide includes: depositing a layer of oxide; and removing the oxide down to the polysilicon layer.
Claim 35
Dependent Claim
27 words
The method of claim 30 further comprising: etching the oxide filling the trench to about a level of the oxide layer; and stripping the layer of polysilicon.
Claim 36
Dependent Claim
18 words
The method of claim 33 further comprising fabricating active devices in the isolated portions of the active areas.
Claim 37
Dependent Claim
21 words
The method of claim 34 wherein fabricating active devices includes fabricating PN junctions in the isolated portions of the active areas.
References Cited (Backward Citations)
US4222792A
Cited
JPS57154856A
Cited
JPS57154855A
Cited
US4407851A
Cited
US4361600A
Cited
US4604162A
Cited
JPS59232437A
Cited
US4814287A
Cited
JPS6074452A
Cited
US4615746A
Cited
US4689872A
Cited
JPS61201444A
Cited
US5176789A
Cited
US5084130A
Cited
US4735821A
Cited
US4845048A
Cited
US4974060A
Cited
JPH02222160A
Cited
JPH0389532A
Cited
US5331197A
Cited
US5214603A
Cited
US5336629A
Cited
US5629539A
Cited
US5453396A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-08-29 | 2004-02-28 | 2004-08-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-08-29 | 2008-02-28 | 2008-08-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-08-29 | 2012-02-28 | 2012-08-29 | $7700.00 | Window Closed / Lapsed |