Radiation-sensitive mixture and its use

Claim 1

A radiation-sensitive mixture including a film-forming polymer functionalized with 1,2-dicarboxylic acid monoester groups, comprising an acid-labile, hydrolysis-stable polymer unit (A) of structure: ##STR7## a thermally stable polymer unit (B) of structure: ##STR8## a second thermally stable polymer unit (C) of structure ##STR9## and a polymer unit (D) bearing reactive groups and having a structure ##STR10## in which the amount of (A) is from 1 to 99 mol %, the amount of (B) is from 1 to 99 mol %, the amount of (C) is from 0 to 50 mol %, and the amount of (D) is from 0 to 50 mol %, provided that the amounts of (A), (B), (C), and (D) total 100 mol %; and in which n=0, 1, 2 or 3; R 1 is a hydrocarbon radical bonded via a tertiary C atom to the O atom and having a total of 4 to 10 C atoms, or a 2-tetrahydrofuranyl or 2-tetrahydropyranyl radical; R 2 , R 3 and R 4 --independently of one another--are C 1- to C 6- alkyl or C 1- to C 6- alkoxy, C 6- to C 18- aryl or C 6- to C 18- aryloxy or aralkyl having a C 6- to C 18- aryl group and a C 1- to C 4- alkylene radical; R 5 is H or C 1- to C 6- alkyl; R 6 , R 7 , R 8 and R 9 --independently of one another--are H, C 1- to C 6- alkyl, C 6- to C 18- aryl, halogen, CN, methoxyphenyl or a radical of structure ##STR11## where R 15 is H, C 1- to C 6- alkyl, C 6- to C 18- aryl, CH 2 ═CH--, CH 2 ═CH--CH 2 --, or CH 2 ═CH--CO--; R 10 is H, C 1- to C 6- alkyl, C 2- to C 6- alkenyl, C 6- to C 18- aryl, halogen or halogen-substituted C 1- to C 6- alkyl; R 11 and R 12 --independently of one another--are linear C 1- to C 18- alkyl; R 13 and R 14 --independently of one another--are linear C 1- to C 18- alkyl or tert-butyl; X is Si or Sn, and Y is O or NH; a radiation sensitive compound liberating an acid upon irradiation, a solvent, and optionally at least one additive.