US6046487A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Shallow trench isolation with oxide-nitride/oxynitride liner
Assignee: Qimonda AG
•
Filing: 1997-12-12
•
Granted: 2000-04-04
•
Expires: 2017-12-12
Abstract
Abstract Disclosed is an improved process and liner for trench isolation which includes either a single oxynitride layer or a dual oxynitride (or oxide)/nitride layer. Such a process and liner has an improved process window as well as being an effective O 2 diffusion barrier and resistant to hot phosphoric and hydrofluoric acids.
Inventors
- 👤 John Preston Benedict
- 👤 David Mark Dobuzinsky
- 👤 Philip Lee Flaitz
- 👤 Erwin N. Hammerl
- 👤 Herbert Ho
- 👤 James F. Moseman
- 👤 Herbert Palm
- 👤 Seiko Yoshida
- 👤 Hiroshi Takato
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 16:47
CPC Classifications
H; H10; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/014; H10W10/0145; H10W10/10; H10W10/17
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
84 words
An isolation member embedded in a silicon layer of an integrated circuit comprising: a silicon layer on a substrate having at least one isolation trench; a conformal layer in said at least one isolation trench, said conformal layer consisting of a first layer of silicon nitride followed by a second layer of silicon oxide and has a thickness of 5 to 10 nm.; and an oxide filler over said conformal layer and having a thickness sufficient to fill said at least one isolation trench.
Claim 2
Dependent Claim
84 words
An isolation member embedded in a silicon layer of an integrated circuit comprising: a silicon layer on a substrate having at least one isolation trench; a conformal layer in said at least one isolation trench, said conformal layer consisting of a first layer of silicon nitride followed by a second layer of silicon oxide and has a thickness of 5 to 10 nm.; and an oxide filler over said conformal layer and having a thickness sufficient to fill said at least one isolation trench.
Claim 3
Dependent Claim
19 words
The isolation member of claim 1 further comprising a thermal oxide layer between said conformal layer and said trench.
Claim 4
Dependent Claim
84 words
An isolation member embedded in a silicon layer of an integrated circuit comprising: a silicon layer on a substrate having at least one isolation trench; a conformal layer in said at least one isolation trench, said conformal layer consisting of a first layer of silicon nitride followed by a second layer of silicon oxynitride and has a thickness of 5 to 10 nm.; and an oxide filler over said conformal layer and having a thickness sufficient to fill said at least one isolation trench.
Claim 5
Dependent Claim
84 words
An isolation member embedded in a silicon layer of an integrated circuit comprising: a silicon layer on a substrate having at least one isolation trench; a conformal layer in said at least one isolation trench, said conformal layer consisting of a first layer of silicon nitride followed by a second layer of silicon oxynitride and has a thickness of 5 to 10 nm.; and an oxide filler over said conformal layer and having a thickness sufficient to fill said at least one isolation trench.
Claim 6
Dependent Claim
19 words
The isolation member of claim 3 further comprising a thermal oxide layer between said conformal layer and said trench.
References Cited (Backward Citations)
US4631803A
Cited
US4855804A
Cited
US5189501A
Cited
US5099304A
Cited
US5206182A
Cited
US5384280A
Cited
US5190889A
Cited
US5387540A
Cited
US5429977A
Cited
US5492858A
Cited
US5447884A
Cited
US5747866A
Cited
US5811347A
Cited
US5780346A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-04-04 | 2003-10-04 | 2004-04-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-04-04 | 2007-10-04 | 2008-04-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-04-04 | 2011-10-04 | 2012-04-04 | $7700.00 | Window Closed / Lapsed |