Patent US6037252A successfully refreshed from Google Patents.
US6037252A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of titanium nitride contact plug formation
Assignee: Tokyo Electron Ltd
•
Filing: 1997-11-05
•
Granted: 2000-03-14
•
Expires: 2017-11-05
Abstract
Abstract A method of filling a via less than about 0.16 μm in diameter in an oxide layer of a substrate with a TiN plug deposited by CVD and capping the plug with TiN only. In one embodiment, a first layer of TiN is deposited on a substrate by thermal CVD, and a second layer of TiN is deposited on the first layer by PECVD. Alternatively, a one-step process is used to deposit a TiN layer using either thermal CVD or PECVD. The method eliminates a tungsten layer, and thus eliminates a processing step.
Inventors
- 👤 Joseph T. Hillman
- 👤 Michael S. Ameen
- 👤 Robert F. Foster
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:03
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/032; H10W20/038; C; C23; C23C; C23C16/00; C23C16/04; C23C16/045; C23C16/22; C23C16/30; C23C16/34; H10W20/056; H10W20/40; H10W20/41; H10W20/44; H10W20/4403; H10W20/4437; H10W20/4441
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
53 words
A method of filling a via in an oxide layer of a substrate with a TiN plug and capping, comprising: depositing a first TiN layer on the oxide layer to form a plug to fill a via, and depositing a second TiN layer on the first TiN layer to cap the first layer.
Claim 2
Independent Claim
53 words
A method of filling a via in an oxide layer of a substrate with a TiN plug and capping, comprising: depositing a first TiN layer on the oxide layer to form a plug to fill a via, and depositing a second TiN layer on the first TiN layer to cap the first layer.
Claim 3
Dependent Claim
26 words
The method of claim 1 comprising depositing the first TiN layer to form a plug in a via having a diameter less than about 0.16 μm.
Claim 4
Dependent Claim
23 words
The method of claim 1 further comprising depositing the first TiN layer by thermal CVD and depositing the second TiN layer by PECVD.
Claim 5
Dependent Claim
31 words
The method of claim 1 wherein the first TiN layer deposited is about 800 Å thick and the second TiN layer deposited is about 700 Å to about 1200 Å thick.
Claim 6
Dependent Claim
37 words
The method of claim 1 wherein the depositing of the first TiN layer and the depositing of the second TiN layer is performed in a single reaction chamber at a fixed susceptor temperature of about 650° C.
Claim 7
Independent Claim
52 words
A method of filling a via having a diameter less than about 0.16 μm in an oxide layer of a substrate with a TiN plug, comprising depositing a single TiN layer of about 1500 Å to about 2000 Å to the via and the oxide layer of the substrate by thermal CVD.
Claim 8
Independent Claim
52 words
A method of filling a via having a diameter less than about 0.16 μm in an oxide layer of a substrate with a TiN plug, comprising depositing a single TiN layer of about 1500 Å to about 2000 Å to the via and the oxide layer of the substrate by thermal CVD.
Claim 9
Independent Claim
51 words
A method of filling a via having a diameter less than about 0.16 μm in an oxide layer of a substrate with a TiN plug, comprising depositing a single TIN layer of about 1500 Å to about 2000 Å to the via and the oxide layer of the substrate by PECVD.
Claim 10
Independent Claim
51 words
A method of filling a via having a diameter less than about 0.16 μm in an oxide layer of a substrate with a TiN plug, comprising depositing a single TIN layer of about 1500 Å to about 2000 Å to the via and the oxide layer of the substrate by PECVD.
References Cited (Backward Citations)
EP0478233A2
Cited
US5502008A
Cited
JPH06283605A
Cited
US5573978A
Cited
US5665640A
Cited
US5567243A
Cited
US5628829A
Cited
US5716870A
Cited
US5747116A
Cited
EP0730297A1
Cited
US5610106A
Cited
GB2306777A
Cited
US5654233A
Cited
US5863835A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-03-14 | 2003-09-13 | 2004-03-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-03-14 | 2007-09-13 | 2008-03-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-03-14 | 2011-09-13 | 2012-03-14 | $7700.00 | Window Closed / Lapsed |